JPS6126775A - 堆積膜形成方法 - Google Patents

堆積膜形成方法

Info

Publication number
JPS6126775A
JPS6126775A JP14602984A JP14602984A JPS6126775A JP S6126775 A JPS6126775 A JP S6126775A JP 14602984 A JP14602984 A JP 14602984A JP 14602984 A JP14602984 A JP 14602984A JP S6126775 A JPS6126775 A JP S6126775A
Authority
JP
Japan
Prior art keywords
carrier
gas
raw material
film
material gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14602984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH058268B2 (enrdf_load_stackoverflow
Inventor
Shunichi Ishihara
俊一 石原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP14602984A priority Critical patent/JPS6126775A/ja
Publication of JPS6126775A publication Critical patent/JPS6126775A/ja
Publication of JPH058268B2 publication Critical patent/JPH058268B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP14602984A 1984-07-16 1984-07-16 堆積膜形成方法 Granted JPS6126775A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14602984A JPS6126775A (ja) 1984-07-16 1984-07-16 堆積膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14602984A JPS6126775A (ja) 1984-07-16 1984-07-16 堆積膜形成方法

Publications (2)

Publication Number Publication Date
JPS6126775A true JPS6126775A (ja) 1986-02-06
JPH058268B2 JPH058268B2 (enrdf_load_stackoverflow) 1993-02-01

Family

ID=15398493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14602984A Granted JPS6126775A (ja) 1984-07-16 1984-07-16 堆積膜形成方法

Country Status (1)

Country Link
JP (1) JPS6126775A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS644244A (en) * 1987-06-24 1989-01-09 Japan Synthetic Rubber Co Ltd High temperature reaction treatment device
US5589514A (en) * 1992-01-16 1996-12-31 Hoechst Aktiengesellschaft Arylcycloalkyl derivatives, their production and their use
US7001831B2 (en) 2002-03-12 2006-02-21 Kyocera Corporation Method for depositing a film on a substrate using Cat-PACVD

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785221A (en) * 1980-11-18 1982-05-27 Seiko Epson Corp Manufacture of amorphous semiconductor thin film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785221A (en) * 1980-11-18 1982-05-27 Seiko Epson Corp Manufacture of amorphous semiconductor thin film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS644244A (en) * 1987-06-24 1989-01-09 Japan Synthetic Rubber Co Ltd High temperature reaction treatment device
US5589514A (en) * 1992-01-16 1996-12-31 Hoechst Aktiengesellschaft Arylcycloalkyl derivatives, their production and their use
US5776977A (en) * 1992-01-16 1998-07-07 Hoechst Aktiengesellschaft Arylcycloalkyl derivatives, their production and their use
US7001831B2 (en) 2002-03-12 2006-02-21 Kyocera Corporation Method for depositing a film on a substrate using Cat-PACVD

Also Published As

Publication number Publication date
JPH058268B2 (enrdf_load_stackoverflow) 1993-02-01

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term