JPS6126591A - 結晶成長方法 - Google Patents
結晶成長方法Info
- Publication number
- JPS6126591A JPS6126591A JP14910684A JP14910684A JPS6126591A JP S6126591 A JPS6126591 A JP S6126591A JP 14910684 A JP14910684 A JP 14910684A JP 14910684 A JP14910684 A JP 14910684A JP S6126591 A JPS6126591 A JP S6126591A
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- melt
- impurity
- type
- pulling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14910684A JPS6126591A (ja) | 1984-07-18 | 1984-07-18 | 結晶成長方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14910684A JPS6126591A (ja) | 1984-07-18 | 1984-07-18 | 結晶成長方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6126591A true JPS6126591A (ja) | 1986-02-05 |
JPH0362679B2 JPH0362679B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-09-26 |
Family
ID=15467825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14910684A Granted JPS6126591A (ja) | 1984-07-18 | 1984-07-18 | 結晶成長方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6126591A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62226890A (ja) * | 1986-03-27 | 1987-10-05 | Komatsu Denshi Kinzoku Kk | 単結晶及びその製造方法 |
JPH01215789A (ja) * | 1988-02-25 | 1989-08-29 | Toshiba Corp | 半導体の結晶引上げ方法 |
JP2010189253A (ja) * | 2009-01-05 | 2010-09-02 | Commissariat A L'energie Atomique & Aux Energies Alternatives | 結晶化中にドープ半導体チャージを添加する半導体の凝固方法 |
JP2015226066A (ja) * | 2014-05-28 | 2015-12-14 | インフィネオン テクノロジーズ アーゲーInfineon Technologies Ag | 半導体素子、シリコンウエハ、及びシリコンインゴット |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5266372A (en) * | 1975-11-28 | 1977-06-01 | Nec Home Electronics Ltd | Manufacture of silicon single crystal |
JPS55130894A (en) * | 1979-03-28 | 1980-10-11 | Hitachi Ltd | Single crystal picking up apparatus |
-
1984
- 1984-07-18 JP JP14910684A patent/JPS6126591A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5266372A (en) * | 1975-11-28 | 1977-06-01 | Nec Home Electronics Ltd | Manufacture of silicon single crystal |
JPS55130894A (en) * | 1979-03-28 | 1980-10-11 | Hitachi Ltd | Single crystal picking up apparatus |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62226890A (ja) * | 1986-03-27 | 1987-10-05 | Komatsu Denshi Kinzoku Kk | 単結晶及びその製造方法 |
JPH01215789A (ja) * | 1988-02-25 | 1989-08-29 | Toshiba Corp | 半導体の結晶引上げ方法 |
JP2010189253A (ja) * | 2009-01-05 | 2010-09-02 | Commissariat A L'energie Atomique & Aux Energies Alternatives | 結晶化中にドープ半導体チャージを添加する半導体の凝固方法 |
JP2015226066A (ja) * | 2014-05-28 | 2015-12-14 | インフィネオン テクノロジーズ アーゲーInfineon Technologies Ag | 半導体素子、シリコンウエハ、及びシリコンインゴット |
US9786748B2 (en) | 2014-05-28 | 2017-10-10 | Infineon Technologies Ag | Semiconductor device, silicon wafer and silicon ingot |
JP2020074381A (ja) * | 2014-05-28 | 2020-05-14 | インフィネオン テクノロジーズ アーゲーInfineon Technologies Ag | 半導体素子、シリコンウエハ、及びシリコンインゴット |
US10910475B2 (en) | 2014-05-28 | 2021-02-02 | Infineon Technologies Ag | Method of manufacturing a silicon wafer |
Also Published As
Publication number | Publication date |
---|---|
JPH0362679B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-09-26 |
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