JPS6125139A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS6125139A
JPS6125139A JP14662784A JP14662784A JPS6125139A JP S6125139 A JPS6125139 A JP S6125139A JP 14662784 A JP14662784 A JP 14662784A JP 14662784 A JP14662784 A JP 14662784A JP S6125139 A JPS6125139 A JP S6125139A
Authority
JP
Japan
Prior art keywords
compound
compd
photosensitive resin
resin composition
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14662784A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0313582B2 (enrdf_load_stackoverflow
Inventor
Kunio Yanagisawa
柳沢 邦夫
Yasuhiko Araki
泰彦 荒木
Hajime Shiyoubi
初 松扉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP14662784A priority Critical patent/JPS6125139A/ja
Publication of JPS6125139A publication Critical patent/JPS6125139A/ja
Publication of JPH0313582B2 publication Critical patent/JPH0313582B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP14662784A 1984-07-13 1984-07-13 感光性樹脂組成物 Granted JPS6125139A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14662784A JPS6125139A (ja) 1984-07-13 1984-07-13 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14662784A JPS6125139A (ja) 1984-07-13 1984-07-13 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6125139A true JPS6125139A (ja) 1986-02-04
JPH0313582B2 JPH0313582B2 (enrdf_load_stackoverflow) 1991-02-22

Family

ID=15412007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14662784A Granted JPS6125139A (ja) 1984-07-13 1984-07-13 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6125139A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4787314A (en) * 1986-06-09 1988-11-29 Kabushiki Kaisha Tokyo Kikai Seisakusho Device for removing water from meshed roll
US4790243A (en) * 1986-07-04 1988-12-13 Koenig & Bauer Aktiengesellschaft Offset short inking unit with dampening fluid separation
US7511876B2 (en) 2002-05-30 2009-03-31 Canon Kabushiki Kaisha Dispersion for electrophoretic display, and electrophoretic display device
JP2012241127A (ja) * 2011-05-20 2012-12-10 Hitachi Chemical Co Ltd 光硬化性樹脂組成物及びこれを用いた光硬化性樹脂組成物ワニス、光硬化性樹脂組成物硬化物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60103346A (ja) * 1983-11-10 1985-06-07 Sekisui Chem Co Ltd 感光性樹脂組成物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60103346A (ja) * 1983-11-10 1985-06-07 Sekisui Chem Co Ltd 感光性樹脂組成物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4787314A (en) * 1986-06-09 1988-11-29 Kabushiki Kaisha Tokyo Kikai Seisakusho Device for removing water from meshed roll
US4790243A (en) * 1986-07-04 1988-12-13 Koenig & Bauer Aktiengesellschaft Offset short inking unit with dampening fluid separation
US7511876B2 (en) 2002-05-30 2009-03-31 Canon Kabushiki Kaisha Dispersion for electrophoretic display, and electrophoretic display device
JP2012241127A (ja) * 2011-05-20 2012-12-10 Hitachi Chemical Co Ltd 光硬化性樹脂組成物及びこれを用いた光硬化性樹脂組成物ワニス、光硬化性樹脂組成物硬化物

Also Published As

Publication number Publication date
JPH0313582B2 (enrdf_load_stackoverflow) 1991-02-22

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees