JPH0327106B2 - - Google Patents
Info
- Publication number
- JPH0327106B2 JPH0327106B2 JP58212262A JP21226283A JPH0327106B2 JP H0327106 B2 JPH0327106 B2 JP H0327106B2 JP 58212262 A JP58212262 A JP 58212262A JP 21226283 A JP21226283 A JP 21226283A JP H0327106 B2 JPH0327106 B2 JP H0327106B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- resin composition
- groups
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21226283A JPS60103344A (ja) | 1983-11-10 | 1983-11-10 | 感光性樹脂組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21226283A JPS60103344A (ja) | 1983-11-10 | 1983-11-10 | 感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60103344A JPS60103344A (ja) | 1985-06-07 |
JPH0327106B2 true JPH0327106B2 (enrdf_load_stackoverflow) | 1991-04-12 |
Family
ID=16619663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21226283A Granted JPS60103344A (ja) | 1983-11-10 | 1983-11-10 | 感光性樹脂組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60103344A (enrdf_load_stackoverflow) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3131448A1 (de) * | 1981-08-07 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse |
-
1983
- 1983-11-10 JP JP21226283A patent/JPS60103344A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60103344A (ja) | 1985-06-07 |
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