JPS61248563A - C―mosトランジスタ - Google Patents
C―mosトランジスタInfo
- Publication number
- JPS61248563A JPS61248563A JP60090325A JP9032585A JPS61248563A JP S61248563 A JPS61248563 A JP S61248563A JP 60090325 A JP60090325 A JP 60090325A JP 9032585 A JP9032585 A JP 9032585A JP S61248563 A JPS61248563 A JP S61248563A
- Authority
- JP
- Japan
- Prior art keywords
- channel
- region
- source
- oxide film
- width
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 22
- 239000012535 impurity Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 abstract description 10
- 230000000694 effects Effects 0.000 abstract description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 3
- 238000009826 distribution Methods 0.000 abstract description 2
- 230000005669 field effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60090325A JPS61248563A (ja) | 1985-04-26 | 1985-04-26 | C―mosトランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60090325A JPS61248563A (ja) | 1985-04-26 | 1985-04-26 | C―mosトランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61248563A true JPS61248563A (ja) | 1986-11-05 |
| JPH0550864B2 JPH0550864B2 (OSRAM) | 1993-07-30 |
Family
ID=13995368
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60090325A Granted JPS61248563A (ja) | 1985-04-26 | 1985-04-26 | C―mosトランジスタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61248563A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5675164A (en) * | 1995-06-07 | 1997-10-07 | International Business Machines Corporation | High performance multi-mesa field effect transistor |
-
1985
- 1985-04-26 JP JP60090325A patent/JPS61248563A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5675164A (en) * | 1995-06-07 | 1997-10-07 | International Business Machines Corporation | High performance multi-mesa field effect transistor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0550864B2 (OSRAM) | 1993-07-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4703552A (en) | Fabricating a CMOS transistor having low threshold voltages using self-aligned silicide polysilicon gates and silicide interconnect regions | |
| US6163053A (en) | Semiconductor device having opposite-polarity region under channel | |
| US4395726A (en) | Semiconductor device of silicon on sapphire structure having FETs with different thickness polycrystalline silicon films | |
| US4891326A (en) | Semiconductor device and a process for manufacturing the same | |
| US4178605A (en) | Complementary MOS inverter structure | |
| JPH0637305A (ja) | Ldd構造を有する半導体装置及びその製造方法 | |
| JPH0228270B2 (OSRAM) | ||
| US5623154A (en) | Semiconductor device having triple diffusion | |
| US4713329A (en) | Well mask for CMOS process | |
| JPH0758791B2 (ja) | Mos型半導体装置 | |
| JP2845493B2 (ja) | 半導体装置 | |
| JPH0237777A (ja) | 縦型電界効果トランジスタ | |
| JP3380117B2 (ja) | 半導体装置とその製造方法 | |
| JPH08293598A (ja) | 半導体装置とその製造方法 | |
| JPH0391247A (ja) | Mosfet空乏デバイス | |
| JPS61248563A (ja) | C―mosトランジスタ | |
| US5796145A (en) | Semiconductor device composed of MOSFET having threshold voltage control section | |
| JPS62262462A (ja) | 半導体装置 | |
| JP2549657B2 (ja) | 半導体装置およびその製造方法 | |
| JPH0571189B2 (OSRAM) | ||
| JP2572658B2 (ja) | インテリジェントパワー半導体装置の製造方法 | |
| JPH04313238A (ja) | 半導体素子 | |
| KR950003238B1 (ko) | 다중-전극을 이용한 논리소자의 구조 | |
| JPH01286367A (ja) | 縦型電界効果トランジスタ | |
| KR0165381B1 (ko) | 고전압용 모스 트랜지스터를 갖는 반도체장치의 제조방법 |