JPS6124577A - ヒドロキシフエニルトリアジンとその製造方法ならびに紫外線吸収剤としてのその使用 - Google Patents

ヒドロキシフエニルトリアジンとその製造方法ならびに紫外線吸収剤としてのその使用

Info

Publication number
JPS6124577A
JPS6124577A JP13583985A JP13583985A JPS6124577A JP S6124577 A JPS6124577 A JP S6124577A JP 13583985 A JP13583985 A JP 13583985A JP 13583985 A JP13583985 A JP 13583985A JP S6124577 A JPS6124577 A JP S6124577A
Authority
JP
Japan
Prior art keywords
formula
formulas
alkyl
carbon atoms
tables
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13583985A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0517226B2 (enExample
Inventor
マリオ　フライバーグ
ジエラルド　ジヤン
ラウル　マリアカ
エツクハード　クランプ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS6124577A publication Critical patent/JPS6124577A/ja
Publication of JPH0517226B2 publication Critical patent/JPH0517226B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D413/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
    • C07D413/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/22—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to two ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Plural Heterocyclic Compounds (AREA)
JP13583985A 1984-06-22 1985-06-21 ヒドロキシフエニルトリアジンとその製造方法ならびに紫外線吸収剤としてのその使用 Granted JPS6124577A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH302884 1984-06-22
CH3028/84-4 1984-06-22

Publications (2)

Publication Number Publication Date
JPS6124577A true JPS6124577A (ja) 1986-02-03
JPH0517226B2 JPH0517226B2 (enExample) 1993-03-08

Family

ID=4247017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13583985A Granted JPS6124577A (ja) 1984-06-22 1985-06-21 ヒドロキシフエニルトリアジンとその製造方法ならびに紫外線吸収剤としてのその使用

Country Status (3)

Country Link
EP (1) EP0165608B1 (enExample)
JP (1) JPS6124577A (enExample)
DE (1) DE3581002D1 (enExample)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000063366A (ja) * 1998-04-09 2000-02-29 Ciba Specialty Chem Holding Inc ジレゾルシニル―アルコキシ―および―アリ―ルオキシ―ｓ―トリアジン
US6042092A (en) * 1996-12-06 2000-03-28 Inoac Corporation Bellows cylinder
JP2007186516A (ja) * 1994-07-23 2007-07-26 Ciba Specialty Chem Holding Inc 紫外線吸収特性を有する化合物
WO2009148040A1 (ja) * 2008-06-04 2009-12-10 株式会社Adeka ２，４，６－トリス（ヒドロキシフェニル）－１，３，５－トリアジン化合物の製造方法
JP2009292753A (ja) * 2008-06-04 2009-12-17 Adeka Corp ２，４，６−トリス（ヒドロキシフェニル）−１，３，５−トリアジン化合物の製造方法
JP2011105859A (ja) * 2009-11-18 2011-06-02 Seiko Epson Corp インク組成物
WO2012066923A1 (ja) * 2010-11-19 2012-05-24 富士フイルム株式会社 太陽電池封止材及びそれを用いた太陽電池モジュール
WO2016080259A1 (ja) * 2014-11-17 2016-05-26 株式会社Adeka 紫外線吸収剤及び合成樹脂組成物
JP2016102199A (ja) * 2014-11-17 2016-06-02 株式会社Adeka 紫外線吸収剤及び合成樹脂組成物
JP2024045108A (ja) * 2018-10-05 2024-04-02 三星ディスプレイ株式會社 表示装置及び表示装置に含まれる光吸収剤

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4775386A (en) * 1986-05-05 1988-10-04 Ciba-Geigy Corporation Process for photochemical stabilization of undyed and dyed polyamide fibre material and blends thereof with other fibres: copper complex and light stabilizer treatment
US4826978A (en) * 1987-12-29 1989-05-02 Milliken Research Corporation Reactive, non-yellowing triazine compounds useful as UV screening agents for polymers
AU621082B2 (en) * 1988-02-08 1992-03-05 Ciba-Geigy Ag Tetramethylpiperidino-s-triazines
US5096781A (en) * 1988-12-19 1992-03-17 Ciba-Geigy Corporation Water-soluble compounds as light stabilizers
DE59008517D1 (de) * 1989-08-25 1995-03-30 Ciba Geigy Ag Lichtstabilisierte Tinten.
EP0475905B1 (de) * 1990-09-13 1998-01-14 Ciba SC Holding AG Photochemisches Stabilisieren von Wolle
DE4112971A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Sulfonsaeureester von 2,4,6-tris-(2-hydroxy-ethoxy)-(1,3,5)triazin, ein damit hergestelltes positiv arbeitendes strahlungsempfindliches gemisch und aufzeichnungsmaterial
EP0512946B1 (de) * 1991-05-02 1995-09-13 Ciba-Geigy Ag Verfahren zur Verbesserung der Lichtechtheit von Leder
FR2717809B1 (fr) * 1994-03-24 1997-09-19 Sandoz Sa Dérivés de la s-triazine, leur préparation et leur utilisation comme absorbeurs UV.
US5556973A (en) * 1994-07-27 1996-09-17 Ciba-Geigy Corporation Red-shifted tris-aryl-s-triazines and compositions stabilized therewith
BR9607477A (pt) * 1995-03-15 1997-12-23 Ciba Geigy Ag Triazinas substituídas por befenila como estabilazantes de luz
US6255483B1 (en) 1995-03-15 2001-07-03 Ciba Specialty Chemicals Corporation Biphenyl-substituted triazines
US5585422A (en) * 1995-09-20 1996-12-17 Ciba-Geigy Corporation Hybrid s-triazine light stabilizers substituted by benzotriazole or benzophenone moieties and compositions stabilized therewith
DE19543730A1 (de) * 1995-11-23 1997-05-28 Ciba Geigy Ag Bis-Resorcinyl-Triazine
US5726309A (en) * 1996-08-27 1998-03-10 Ciba Specialty Chemicals Corporation Tris-aryls-triazines substituted with biphenylyl groups
BE1012529A3 (fr) * 1996-09-13 2000-12-05 Ciba Sc Holding Ag Melange de triaryltriazines et son utilisation pour la stabilisation de materiaux organiques.
GB2319523B (en) 1996-11-20 2000-11-08 Ciba Sc Holding Ag Hydroxyphenyltriazines
FR2757163B1 (fr) * 1996-12-13 1999-02-05 Oreal Nouveaux derives insolubles de s-triazine, leur procede de preparation, compositions les contenant et leurs utilisations
TW432055B (en) * 1997-05-16 2001-05-01 Ciba Sc Holding Ag Resorcinyl-triazines, their preparation process and a cosmetic composition containing them
EP0878469B1 (de) * 1997-05-16 2004-10-27 Ciba SC Holding AG Resorcinyl-Triazine
DE19735900A1 (de) * 1997-08-19 1999-02-25 Beiersdorf Ag Kosmetische oder dermatologische Lichtschutzmittel, welche gelöste Triazinderivate und polymere UV-Filtersubstanzen auf Siliconbasis enthalten
DE19735901A1 (de) * 1997-08-19 1999-02-25 Beiersdorf Ag Kosmetische oder dermatologische Lichtschutzmittel, welche als Festkörper vorliegende UV-Filtersubstanzen und polymere UV-Filtersubstanzen auf Siliconbasis enthalten
EP0941989B1 (en) * 1998-03-02 2009-07-08 Ciba Holding Inc. Process for the preparation of 2,4-diaryl-6-o-hydroxyphenyl-1,3,5-triazine derivatives in the presence of a protic acid catalyst
TWI259182B (en) * 1998-11-17 2006-08-01 Cytec Tech Corp Process for preparing triazines using a combination of Lewis acids with reaction promoters
ES2264624B1 (es) * 2004-12-16 2007-11-01 Isdin, S.A. Nuevos derivados de triazina, asi como procedimientos para su obtencion y su utilizacion como agentes protectores contra la radiacion uv.
ES2272164B1 (es) * 2005-06-03 2008-04-01 Isdin, S.A. Nuevos derivados de pirroliltriazina asi como procedimientos para su obtencion y su utilizacion como agentes protectores contra la radiacionuv.
WO2008067928A1 (en) * 2006-12-04 2008-06-12 Isdin S.A. Uv absorbing compositions containing a pyrrolyltriazine
BRPI0808446A2 (pt) 2007-03-15 2014-08-05 Basf Se Composição de revestimento, processo para a preparação da mesma, substrato, processo para a preparação de um substrato marcado, e, composto.
ATE538185T1 (de) 2007-08-22 2012-01-15 Datalase Ltd Laserempfindliche beschichtungszusammensetzung
WO2009059888A1 (en) 2007-11-07 2009-05-14 Basf Se New fiber products
JP5645832B2 (ja) 2008-10-27 2014-12-24 データレース リミテッドＤａｔａｌａｓｅ Ｌｔｄ． 基材にマーキングするためのレーザー感受性水性組成物
EP2387600B1 (en) 2009-01-19 2014-04-02 Basf Se Organic black pigments and their preparation
KR20220075336A (ko) 2019-10-02 2022-06-08 바스프 에스이 중합체성 또는 올리고머성 히드록시 페닐 트리아진 uv 필터를 갖는 조성물
CN111072580B (zh) * 2019-12-26 2021-04-16 杭州天马思宏数码科技有限公司 反应型水溶性耐晒牢度增进剂及其制备方法
CN118084811B (zh) * 2024-04-23 2024-07-30 安庆科思化学有限公司 一种防晒剂中间体ret的绿色环保制备方法
CN120590593B (zh) * 2025-08-04 2025-10-24 湖南工程学院 一种杂原子修饰的自具微孔聚合物材料、制备方法和应用

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3278534A (en) * 1964-07-17 1966-10-11 Ciba Ltd New hydroxyphenyl-1, 3, 5-triazines
CH478589A (de) * 1965-09-24 1969-09-30 Ciba Geigy Verwendung von Aryl-1,3,5-triazinen als Stabilisierungsmittel gegen Ultraviolettstrahlung und Hitzeeinwirkung ausserhalb der Textilindustrie
FR1581866A (enExample) * 1967-09-13 1969-09-19

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007186516A (ja) * 1994-07-23 2007-07-26 Ciba Specialty Chem Holding Inc 紫外線吸収特性を有する化合物
US6042092A (en) * 1996-12-06 2000-03-28 Inoac Corporation Bellows cylinder
JP2000063366A (ja) * 1998-04-09 2000-02-29 Ciba Specialty Chem Holding Inc ジレゾルシニル―アルコキシ―および―アリ―ルオキシ―ｓ―トリアジン
US8716474B2 (en) 2008-06-04 2014-05-06 Adeka Corporation Method for producing 2,4,6-tris(hydroxyphenyl)-1,3,5-triazine compound
JP2009292753A (ja) * 2008-06-04 2009-12-17 Adeka Corp ２，４，６−トリス（ヒドロキシフェニル）−１，３，５−トリアジン化合物の製造方法
KR20110026432A (ko) * 2008-06-04 2011-03-15 가부시키가이샤 아데카 2,4,6-트리스(하이드록시페닐)-1,3,5-트리아진 화합물의 제조 방법
WO2009148040A1 (ja) * 2008-06-04 2009-12-10 株式会社Adeka ２，４，６－トリス（ヒドロキシフェニル）－１，３，５－トリアジン化合物の製造方法
JP2011105859A (ja) * 2009-11-18 2011-06-02 Seiko Epson Corp インク組成物
WO2012066923A1 (ja) * 2010-11-19 2012-05-24 富士フイルム株式会社 太陽電池封止材及びそれを用いた太陽電池モジュール
WO2016080259A1 (ja) * 2014-11-17 2016-05-26 株式会社Adeka 紫外線吸収剤及び合成樹脂組成物
JP2016102199A (ja) * 2014-11-17 2016-06-02 株式会社Adeka 紫外線吸収剤及び合成樹脂組成物
KR20170086460A (ko) * 2014-11-17 2017-07-26 가부시키가이샤 아데카 자외선 흡수제 및 합성 수지 조성물
US10144814B2 (en) 2014-11-17 2018-12-04 Adeka Corporation Ultraviolet absorber and synthetic resin composition
TWI665191B (zh) * 2014-11-17 2019-07-11 日商艾迪科股份有限公司 紫外線吸收劑及合成樹脂組合物
JP2024045108A (ja) * 2018-10-05 2024-04-02 三星ディスプレイ株式會社 表示装置及び表示装置に含まれる光吸収剤
US12289992B2 (en) 2018-10-05 2025-04-29 Samsung Display Co., Ltd. Display apparatus and light absorber included in display apparatus

Also Published As

Publication number Publication date
EP0165608A3 (en) 1986-12-03
DE3581002D1 (de) 1991-02-07
EP0165608A2 (de) 1985-12-27
EP0165608B1 (de) 1991-01-02
JPH0517226B2 (enExample) 1993-03-08

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