JPS6124462B2 - - Google Patents
Info
- Publication number
- JPS6124462B2 JPS6124462B2 JP54110555A JP11055579A JPS6124462B2 JP S6124462 B2 JPS6124462 B2 JP S6124462B2 JP 54110555 A JP54110555 A JP 54110555A JP 11055579 A JP11055579 A JP 11055579A JP S6124462 B2 JPS6124462 B2 JP S6124462B2
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- discharge
- vapor deposition
- magnetic field
- wire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007740 vapor deposition Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 10
- 239000000843 powder Substances 0.000 claims description 5
- 230000005284 excitation Effects 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 description 18
- 239000002184 metal Substances 0.000 description 18
- 239000003990 capacitor Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000004880 explosion Methods 0.000 description 6
- 238000005019 vapor deposition process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11055579A JPS5635768A (en) | 1979-08-30 | 1979-08-30 | Vapor depositing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11055579A JPS5635768A (en) | 1979-08-30 | 1979-08-30 | Vapor depositing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5635768A JPS5635768A (en) | 1981-04-08 |
| JPS6124462B2 true JPS6124462B2 (enExample) | 1986-06-11 |
Family
ID=14538790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11055579A Granted JPS5635768A (en) | 1979-08-30 | 1979-08-30 | Vapor depositing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5635768A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1990015888A1 (fr) * | 1989-06-16 | 1990-12-27 | Litovskaya Selskokhozyaistvennaya Akademia | Installation d'application de revetements sur des articles par explosion d'un conducteur |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58136775A (ja) * | 1982-02-08 | 1983-08-13 | Hitachi Ltd | 蒸着方法及び装置 |
| JPS59146623U (ja) * | 1983-03-22 | 1984-10-01 | 東海ゴム工業株式会社 | 弾性継手 |
| IL74360A (en) * | 1984-05-25 | 1989-01-31 | Wedtech Corp | Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase |
| JPS62250168A (ja) * | 1986-04-23 | 1987-10-31 | Hitachi Ltd | マイクロ波プラズマ成膜装置 |
| AUPM365594A0 (en) * | 1994-02-02 | 1994-02-24 | Australian National University, The | Method and apparatus for coating a substrate |
| US7608151B2 (en) * | 2005-03-07 | 2009-10-27 | Sub-One Technology, Inc. | Method and system for coating sections of internal surfaces |
-
1979
- 1979-08-30 JP JP11055579A patent/JPS5635768A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1990015888A1 (fr) * | 1989-06-16 | 1990-12-27 | Litovskaya Selskokhozyaistvennaya Akademia | Installation d'application de revetements sur des articles par explosion d'un conducteur |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5635768A (en) | 1981-04-08 |
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