JPS61235832A - 感光性組成物及び感光性平版印刷版 - Google Patents

感光性組成物及び感光性平版印刷版

Info

Publication number
JPS61235832A
JPS61235832A JP7721185A JP7721185A JPS61235832A JP S61235832 A JPS61235832 A JP S61235832A JP 7721185 A JP7721185 A JP 7721185A JP 7721185 A JP7721185 A JP 7721185A JP S61235832 A JPS61235832 A JP S61235832A
Authority
JP
Japan
Prior art keywords
photosensitive
photosensitive composition
diazonium salt
compound
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7721185A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0533789B2 (enrdf_load_stackoverflow
Inventor
Sei Goto
聖 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP7721185A priority Critical patent/JPS61235832A/ja
Publication of JPS61235832A publication Critical patent/JPS61235832A/ja
Publication of JPH0533789B2 publication Critical patent/JPH0533789B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP7721185A 1985-04-10 1985-04-10 感光性組成物及び感光性平版印刷版 Granted JPS61235832A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7721185A JPS61235832A (ja) 1985-04-10 1985-04-10 感光性組成物及び感光性平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7721185A JPS61235832A (ja) 1985-04-10 1985-04-10 感光性組成物及び感光性平版印刷版

Publications (2)

Publication Number Publication Date
JPS61235832A true JPS61235832A (ja) 1986-10-21
JPH0533789B2 JPH0533789B2 (enrdf_load_stackoverflow) 1993-05-20

Family

ID=13627493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7721185A Granted JPS61235832A (ja) 1985-04-10 1985-04-10 感光性組成物及び感光性平版印刷版

Country Status (1)

Country Link
JP (1) JPS61235832A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105807563A (zh) * 2016-05-16 2016-07-27 京东方科技集团股份有限公司 光刻胶组合物及其制备方法和构图方法
CN107145037A (zh) * 2017-07-07 2017-09-08 京东方科技集团股份有限公司 一种光刻胶组合物及制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5336222A (en) * 1976-09-13 1978-04-04 Hoechst Ag Photosensitive composition
JPS5784450A (en) * 1980-11-13 1982-05-26 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS5785049A (en) * 1980-11-18 1982-05-27 Konishiroku Photo Ind Co Ltd Photosensitive composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5336222A (en) * 1976-09-13 1978-04-04 Hoechst Ag Photosensitive composition
JPS5784450A (en) * 1980-11-13 1982-05-26 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS5785049A (en) * 1980-11-18 1982-05-27 Konishiroku Photo Ind Co Ltd Photosensitive composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105807563A (zh) * 2016-05-16 2016-07-27 京东方科技集团股份有限公司 光刻胶组合物及其制备方法和构图方法
CN105807563B (zh) * 2016-05-16 2020-01-14 京东方科技集团股份有限公司 光刻胶组合物及其制备方法和构图方法
CN107145037A (zh) * 2017-07-07 2017-09-08 京东方科技集团股份有限公司 一种光刻胶组合物及制备方法
CN107145037B (zh) * 2017-07-07 2020-05-12 京东方科技集团股份有限公司 一种光刻胶组合物及制备方法

Also Published As

Publication number Publication date
JPH0533789B2 (enrdf_load_stackoverflow) 1993-05-20

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