JPS61230607A - Magnetic head core - Google Patents

Magnetic head core

Info

Publication number
JPS61230607A
JPS61230607A JP7121285A JP7121285A JPS61230607A JP S61230607 A JPS61230607 A JP S61230607A JP 7121285 A JP7121285 A JP 7121285A JP 7121285 A JP7121285 A JP 7121285A JP S61230607 A JPS61230607 A JP S61230607A
Authority
JP
Japan
Prior art keywords
laminate
magnetic
thickness
films
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7121285A
Other languages
Japanese (ja)
Inventor
Mihiro Sumiyama
隅山 望洋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP7121285A priority Critical patent/JPS61230607A/en
Publication of JPS61230607A publication Critical patent/JPS61230607A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers
    • G11B5/3143Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding
    • G11B5/3146Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers
    • G11B5/3153Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers including at least one magnetic thin film coupled by interfacing to the basic magnetic thin film structure

Landscapes

  • Magnetic Heads (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)

Abstract

PURPOSE:To improve the soft magnetic characteristic of a laminate of multilayered films and simultaneously to prevent a decrease in effective permeability in the high-frequency region by providing >=2 layers of insulating substance thin films having different thicknesses in the laminate of multilayered films. CONSTITUTION:A soft magnetic thin film 7 having <=2mum thickness and an insulating substance thin film 8 having <=0.05mum thickness are alternately deposited to form a laminate of from several to several tens layers of films. An insulating substance thin film 9 having 0.2-0.3mum thickness sufficient for completely insulating between magnetic thin films is deposited on the laminate. The multilayered laminate 10 is further laminated and deposited thereon in from several to several tens layers. A laminate of multilayered films having specified film thickness is obtained by repeating the process. A magnetic head core element is cut out from the laminate of multilayered films and a couple of elements are bonded to obtain a magnetic head core having high effective permeability in the high-frequency region.

Description

【発明の詳細な説明】 [産業上の利用分野] 本化θ目は、磁気へ9ドコアに係り、特に軟磁性合金薄
膜と絶縁物質の薄膜を、交互に沈着して積層する多層膜
積層体を用いた磁気へラド」アの、高周波領域の磁気特
性を向上さけるに好適な多層膜V4N体の構造に関ター
るものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a magnetic field, and in particular, to a multilayer film laminate in which soft magnetic alloy thin films and insulating material thin films are alternately deposited and laminated. The present invention relates to the structure of a multilayer film V4N body suitable for improving the magnetic properties in the high frequency region of a magnetic helder using a magnetic helder.

し従来の技術] 従来の磁気へラドコアは主どしてフエライ1〜焼結体、
もしくは単結晶から切り出されたWJ)”+を接合して
形成されでいIこ。最近遷移金属とガラス化元索を、種
々組み合せた非晶質合金が軟磁性44利としで適りるこ
とか注目され、非晶質磁性合金の薄帯を積層した磁気ヘ
ッドコアが市販されている。
[Conventional technology] Conventional magnetic helad cores are mainly made of ferrite 1, sintered bodies,
Alternatively, it can be formed by joining WJ) cut from a single crystal.Recently, amorphous alloys made of various combinations of transition metals and vitrified metals have been found to be suitable for soft magnetic properties. This has attracted attention, and magnetic head cores made of laminated ribbons of amorphous magnetic alloy are now commercially available.

又、非晶質合金磁気ヘッドコアの製造方法としては、非
晶質合金を薄膜の形態で得、これを予め、別途用意した
非磁性10ツクとの間に挟着し、積層体を形成し、これ
をコア形状に加工し、公知の方法で磁気ヘッド」アを製
造するか、又は、非磁性基板上に非晶質磁性合金と、5
i02やスピネル等の絶縁物質の薄膜を、スパッタリン
グ等の方法を用い、交互に沈着して#1層することによ
り得られた多層膜積層体を用いで、公知の方法により磁
気ヘッドコアを製造し−Cいる(特開昭59−1177
29)。これ、らの方法は、磁性台金薄膜を絶縁物質の
薄膜を介して積層することにより、多層膜積層体の軟磁
気特性(特に高周波領域にお(〕る)の向上を狙ったも
のであり、いずれも、−・様4T膜厚の磁性合金を、一
様な膜厚の絶縁物質とを、交互に積層しで得た多層膜積
層体を用いている。この場合、磁性合金薄膜の間に積層
されでいる絶縁物質の薄膜の膜厚は、薄い方が多層膜積
層体の軟磁気特性は向上するが、部分的に絶縁が不4−
分となり、高周波領域(MHz領域)において、渦電流
損失が増大し、実効透磁率の低下防止に関し、所期の目
的を達し難い欠点がある。しかるに積層される絶縁物質
の膜厚が厚いと、多層膜積層体の軟磁気特性が改善され
ない欠点がある。しかしこの絶縁物質の膜厚を変化させ
る点については、いずれも何ら開示されていない。
Further, as a method for manufacturing an amorphous alloy magnetic head core, an amorphous alloy is obtained in the form of a thin film, and this is sandwiched between ten non-magnetic plates prepared separately in advance to form a laminate. Either process this into a core shape and manufacture a magnetic head by a known method, or place an amorphous magnetic alloy on a non-magnetic substrate.
A magnetic head core is manufactured by a known method using a multilayer film laminate obtained by depositing thin films of an insulating material such as i02 or spinel alternately to form #1 layer using a method such as sputtering. C (Japanese Unexamined Patent Publication No. 59-1177)
29). These methods aim to improve the soft magnetic properties (particularly in the high frequency region) of a multilayer film stack by laminating a magnetic base metal thin film via a thin film of an insulating material. , all of them use a multilayer film laminate obtained by alternately laminating a magnetic alloy with a film thickness of 4T and an insulating material with a uniform film thickness.In this case, between the magnetic alloy thin films, The soft magnetic properties of the multilayer film stack will improve as the thickness of the thin film of the insulating material stacked on the multilayer film stack improves.
This has the drawback that eddy current loss increases in the high frequency region (MHz region), making it difficult to achieve the desired objective in preventing a decrease in effective magnetic permeability. However, if the layered insulating material is thick, the soft magnetic properties of the multilayer film stack cannot be improved. However, none of them disclose anything about changing the film thickness of this insulating material.

[籠明が解決しようとする問題点] 従来の方法による磁性薄膜の間に沈犠積層されている絶
縁物質の膜厚では、多層膜積層体の軟磁気特性は向上す
るが、部分的に絶縁が不十分となり、渦電流損失の増大
が生じ、高周波領域(M Hz領域)での実効透磁率の
低下防止に関し、所期の目的を達し難い。しかるに、積
層される絶縁物質の膜厚が厚ずぎると、多層膜@病体の
軟磁気特性が改善されない欠点がある。
[Problems that Kagomei tries to solve] The thickness of the insulating material sacrificially laminated between the magnetic thin films by the conventional method improves the soft magnetic properties of the multilayer film stack, but it is difficult to partially insulate the film. is insufficient, resulting in an increase in eddy current loss, making it difficult to achieve the desired objective of preventing a decrease in effective magnetic permeability in a high frequency region (MHz region). However, if the thickness of the laminated insulating material is too thick, there is a drawback that the soft magnetic properties of the multilayer film@pathological body cannot be improved.

本靴明の目的は、これらの問題を解決し、高周波領域で
の実効透磁率の低下の少ない磁気へラドコアを提供する
ことにある。
The object of the present invention is to solve these problems and provide a magnetic rad core with less reduction in effective magnetic permeability in a high frequency region.

[問題点を解決するための手段] 本化叩の磁気へラドコアにおける多層膜積層体の構造に
ついては、軟磁性薄膜ど、該軟磁性薄膜の軟磁気特性を
向上させるに十分な膜厚の絶縁物質の薄膜とを交互に沈
着して、数層から数十層の多層膜積層体を形成した部分
と、積層された上下の磁性薄膜間を完全に絶縁し、渦電
流損失の増大を防止するに十分な膜厚の絶縁物質の薄膜
を一層又は数層を沈着した部分を組み合せて積層し、所
定の膜厚の多層膜積層体を形成したものである。
[Means for solving the problem] Regarding the structure of the multilayer film laminate in the magnetic herad core of this company, it is necessary to use an insulating material such as a soft magnetic thin film with a thickness sufficient to improve the soft magnetic properties of the soft magnetic thin film. Thin films of the substance are deposited alternately to completely insulate the area where a multilayer film stack of several to tens of layers is formed and the upper and lower stacked magnetic thin films, thereby preventing an increase in eddy current loss. A multilayer film laminate having a predetermined film thickness is formed by combining and laminating one or several thin films of an insulating material having a sufficient film thickness.

本売明において、沈着する軟磁性合金は、結晶質合金で
も非晶質合金でもよい。又、該磁性合金は高周波領域で
使用されるので、渦電流損失を少なくして、高周波領域
での実効透磁率の低下を防ぐため、数ミクロン以下の膜
厚であることが有利である。この場合、磁性合金の膜厚
は2μm以下、好ましくは1μm前後である。積層する
磁性薄膜の軟磁気特性を向上さぼるだめの絶縁物質の膜
厚は、0.05μ肌以下、好ましくは0.02μmn前
後である。本考案においては多層膜積層体中に厚さの異
なる絶縁物薄膜を設番ノたことを最大の特徴とするもの
である。すなわち上記膜厚の軟磁性薄膜および絶縁物質
の薄膜を交互に沈着して、数層から数十層の多層膜積層
体を形成した上に、磁性薄膜間を完全に絶縁するに十分
な膜厚の絶縁物質薄膜を沈着する。こめ絶縁物質の膜厚
は082〜03μmあれば十分である。この絶縁物質簿
膜を沈着した上に、さらに前記の軟磁気特性を改善する
方法の多層膜積層体を数層〜数十層を積層して沈着する
。又、その上に膜厚が0,2〜0.3μmの絶縁物質薄
膜の層を積層する。これらの操作を繰り返すことにより
、所定の膜厚の多層lN!積層体を得る。この0.2〜
0.3μmの膜厚の絶縁物質の薄膜は、積層体中におい
て数層又は十数層毎に一層を積層すれば十分であるが、
軟磁性薄膜の膜厚が03μm以下の場合には、積層され
た総膜厚が1〜2μmになる毎に−・層を積層するよう
にすればよい。これらの軟磁性合金及び絶縁物質の薄膜
の総数は磁気ヘッドのトラック幅に応じて決定され、V
TRヘッドでは30〜・60μmになるようにする。
In this application, the deposited soft magnetic alloy may be a crystalline alloy or an amorphous alloy. Furthermore, since the magnetic alloy is used in a high frequency range, it is advantageous for the film thickness to be several microns or less in order to reduce eddy current loss and prevent a decrease in effective magnetic permeability in the high frequency range. In this case, the thickness of the magnetic alloy is 2 μm or less, preferably around 1 μm. The thickness of the insulating material to improve the soft magnetic properties of the laminated magnetic thin film is less than 0.05 μm, preferably around 0.02 μm. The main feature of the present invention is that insulating thin films of different thicknesses are provided in the multilayer film stack. In other words, soft magnetic thin films and insulating thin films of the above thickness are alternately deposited to form a multilayer film stack of several to several tens of layers, and the film is also thick enough to completely insulate between the magnetic thin films. depositing a thin film of insulating material. It is sufficient that the film thickness of the insulating material is 082 to 03 μm. After depositing this insulating material film, several to several dozen layers of the multilayer film stack of the method for improving the soft magnetic properties described above are further deposited. Moreover, a layer of an insulating material thin film having a film thickness of 0.2 to 0.3 μm is laminated thereon. By repeating these operations, a multilayer lN! of a predetermined film thickness is formed. Obtain a laminate. This 0.2~
For a thin film of an insulating material with a thickness of 0.3 μm, it is sufficient to laminate one layer every few or ten layers in a laminate.
When the thickness of the soft magnetic thin film is 0.3 μm or less, a - layer may be laminated every time the total thickness of the laminated films becomes 1 to 2 μm. The total number of these thin films of soft magnetic alloy and insulating material is determined according to the track width of the magnetic head, and V
For the TR head, the thickness should be 30 to 60 μm.

この場合、0.2〜0.3μmの絶縁物質の薄膜数は1
5〜30層になる。
In this case, the number of thin films of insulating material with a thickness of 0.2 to 0.3 μm is 1
There will be 5 to 30 layers.

このようにして得られた多層側積層体から第4図に示す
ような磁気へラドコア素子を切出し、一対を接合して第
5図に示すような磁気ヘッドコアとする。
Magnetic RAD core elements as shown in FIG. 4 are cut out from the multilayer laminate thus obtained, and a pair are joined to form a magnetic head core as shown in FIG. 5.

[実施例] 第2図に示すスパッタ装置を用いて第1図に示すような
多層膜積層体をスパッター法により沈着させて形成した
。十分平滑な表面を有するガラス基板40表面にC08
7Z「5Nb8の組成を有する非晶質合金を薄膜7−1
として1,0μmの厚さに沈着した。スパッタリング条
件は 入力電力  500W A「ガス圧  3 X 10−3Torrであった。次
に同一装置を用いて絶縁物質のスパッタリングを行ない
、非晶質合金薄膜7−1の上に高周波スパッタ法により
0.015μ711の膜厚を有するSiO2絶縁体8−
1を形成した。この操作を交互に繰り返し、非晶質合金
薄膜を3層(7−1,7−2,7−3)、Si 02絶
縁体を2層(8−1,8−2)を積層したところ(”、
膜厚0.2μmのSiO2絶縁体9を=一層を沈着した
[Example] Using the sputtering apparatus shown in FIG. 2, a multilayer film laminate as shown in FIG. 1 was deposited and formed by sputtering. C08 on the surface of the glass substrate 40 having a sufficiently smooth surface.
7Z "A thin film 7-1 of an amorphous alloy having a composition of 5Nb8
It was deposited to a thickness of 1.0 μm. The sputtering conditions were an input power of 500 W and a gas pressure of 3 x 10-3 Torr. Next, using the same equipment, an insulating material was sputtered, and a 0.000. SiO2 insulator 8- with a film thickness of 015μ711
1 was formed. By repeating this operation alternately, three layers of amorphous alloy thin film (7-1, 7-2, 7-3) and two layers of Si02 insulator (8-1, 8-2) were laminated ( ”,
A single layer of SiO2 insulator 9 with a thickness of 0.2 μm was deposited.

このようにして非晶質合金薄膜と絶縁体との単位積層体
10−1を作った。この上にさらに非晶質合金薄膜を3
層、膜厚0.015μynのSiO2絶縁体を2層を交
互に積層した非晶質合金薄膜の上にi!膜厚、2μmの
SiO2絶縁膜を沈着して、単位積層体10−2を作っ
た。この操作を繰り返し、単位@屠体を8層積み重ね、
最終的に非晶質合金薄膜を24層、膜厚0.015μH
のSiO2絶縁膜を16層、膜厚0,2μmのSiO2
絶縁膜9層の多層膜積層体11を得た。この多層膜積層
体11から超音波加工により所定寸法の磁気へラド」ア
を切り出し、回転磁場中で390℃1時間の熱処理をし
て磁気異方性を除去した。こうして得られた磁気へラド
コアの磁気特性を、同一組成で膜厚1.0/17nの非
晶質合金薄膜24層、膜厚o、oi5μmのSiO2絶
縁膜23層を積層して得た比較例の磁気ヘッドコアと比
較Jると第3図のようであり、高周波領域において、明
らかに実効透磁率が高い。
In this way, a unit laminate 10-1 of an amorphous alloy thin film and an insulator was produced. On top of this, three more amorphous alloy thin films are applied.
The i! A 2 μm thick SiO2 insulating film was deposited to form a unit laminate 10-2. Repeat this operation and stack the units @carcasses in 8 layers,
Finally, 24 layers of amorphous alloy thin film, film thickness 0.015μH
16 layers of SiO2 insulating film, 0.2 μm thick SiO2
A multilayer film laminate 11 having nine insulating films was obtained. A magnetic radiator of a predetermined size was cut out from this multilayer film laminate 11 by ultrasonic machining, and heat treated at 390° C. for 1 hour in a rotating magnetic field to remove magnetic anisotropy. A comparative example of the magnetic properties of the magnetic herad core thus obtained was obtained by laminating 24 layers of amorphous alloy thin film of the same composition with a film thickness of 1.0/17n and 23 layers of SiO2 insulating film with a film thickness of o, oi 5 μm. A comparison with the magnetic head core shown in FIG. 3 shows that the effective magnetic permeability is clearly high in the high frequency range.

[も明の効果コ 本発明によれば、多層膜積層体中の絶縁物質薄膜の膜厚
を目的に応じて変えることにJ:す、該多層膜積層体の
軟磁気特性を向上させると同時に、高周波領域での実効
透磁率の低下を防ぐ効果があり、高周波領域で使用され
る磁気ヘッドコアとして、きわめて有用である。
According to the present invention, the thickness of the insulating thin film in the multilayer film stack can be changed depending on the purpose, thereby improving the soft magnetic properties of the multilayer film stack and at the same time improving the soft magnetic properties of the multilayer film stack. This has the effect of preventing a decrease in effective magnetic permeability in a high frequency range, and is extremely useful as a magnetic head core used in a high frequency range.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は多層膜積層体の断面図を示す説明図。 第2図はスパッタ装置の概念図を示す。 第3図は実効透磁率−周波数特性を示すグラフであって
、図中の(A)は実施例に、(B)は比較例に対応する
ものである。 第4図、第5図は磁気へラドコアの斜視図。
FIG. 1 is an explanatory diagram showing a cross-sectional view of a multilayer film stack. FIG. 2 shows a conceptual diagram of the sputtering apparatus. FIG. 3 is a graph showing effective magnetic permeability-frequency characteristics, in which (A) corresponds to the example and (B) corresponds to the comparative example. FIGS. 4 and 5 are perspective views of the magnetic herad core.

Claims (1)

【特許請求の範囲】[Claims] 1、非磁性基板上に軟磁性合金と絶縁物質の薄膜を、交
互に沈着させて多層膜積層体となし、該多層膜積層体か
ら一対のコア形状を形成し、このコア形状体をギャップ
を介して接合して製造する磁気ヘッドコアにおいて、多
層膜積層体中に少なくとも2層以上の厚さの異なる絶縁
物薄膜を有することを特徴とする磁気ヘッドコア。
1. Thin films of soft magnetic alloy and insulating material are alternately deposited on a non-magnetic substrate to form a multilayer film stack, a pair of core shapes are formed from the multilayer film stack, and a gap is formed between the core shapes. What is claimed is: 1. A magnetic head core manufactured by bonding through a multilayer film laminate, the magnetic head core having at least two layers of insulating thin films having different thicknesses in a multilayer film laminate.
JP7121285A 1985-04-05 1985-04-05 Magnetic head core Pending JPS61230607A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7121285A JPS61230607A (en) 1985-04-05 1985-04-05 Magnetic head core

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7121285A JPS61230607A (en) 1985-04-05 1985-04-05 Magnetic head core

Publications (1)

Publication Number Publication Date
JPS61230607A true JPS61230607A (en) 1986-10-14

Family

ID=13454147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7121285A Pending JPS61230607A (en) 1985-04-05 1985-04-05 Magnetic head core

Country Status (1)

Country Link
JP (1) JPS61230607A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5452167A (en) * 1993-03-31 1995-09-19 Matsushita Electric Industrial Co., Ltd. Soft magnetic multilayer films for magnetic head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5452167A (en) * 1993-03-31 1995-09-19 Matsushita Electric Industrial Co., Ltd. Soft magnetic multilayer films for magnetic head

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