JPS62141609A - Manufacture of magnetic head - Google Patents

Manufacture of magnetic head

Info

Publication number
JPS62141609A
JPS62141609A JP28208685A JP28208685A JPS62141609A JP S62141609 A JPS62141609 A JP S62141609A JP 28208685 A JP28208685 A JP 28208685A JP 28208685 A JP28208685 A JP 28208685A JP S62141609 A JPS62141609 A JP S62141609A
Authority
JP
Japan
Prior art keywords
magnetic
core
glass
pair
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28208685A
Other languages
Japanese (ja)
Other versions
JPH0792900B2 (en
Inventor
Terumasa Sawai
瑛昌 沢井
Nobumasa Kaminaka
紙中 伸征
Shunsaku Muraoka
俊作 村岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60282086A priority Critical patent/JPH0792900B2/en
Publication of JPS62141609A publication Critical patent/JPS62141609A/en
Publication of JPH0792900B2 publication Critical patent/JPH0792900B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)

Abstract

PURPOSE:To reduce sputter time by half, to decrease internal stress of a magnetic film, to heighten accuracy of core flatness and to prevent coming off by joining a pair of core elements made by coating a metallic magnetic layer on an auxiliary substrate by sputtering with crystallized glass to constitute a pair of magnetic head core half bodies, and after opposing them to become desired head track width, and joining integrally the two core half bodies in a body by noncrystallized glass in a winding groove. CONSTITUTION:Magnetic layers 11, 11' are formed by sputtering on one face of two auxiliary substrates 10, 10' made of nonmagnetic material to make the total thickness desired head track width W, and at the same time, and joined with crystallized glass by heating at a temperature lower than crystallization temperature of the magnetic layer, and a laminated body 13 is constituted. Further, a pair of core half bodies 15a, 15b are formed by working a winding groove 14 formed by cutting the laminated body 13 along a line B-B'. Such pair of core half bodies 15a, 15b are butted on a magnetic gap face (g), and joining glass 16 on and near the magnetic gap face or in the winding groove 14 is heated at low temperature. Thus, a magnetic head 17 joined integrally in a body is obtained.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、VTRやDATなどの磁気記録再生装置に用
いて効果のある金属コア積層型磁気ヘッドの製造法に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a metal core laminated magnetic head that is effective for use in magnetic recording and reproducing devices such as VTRs and DATs.

(従来の技術) 近年VTRは高密度記録に伴い、高抗磁力を持ったいわ
ゆる金属テープが実用化されている。
(Prior Art) In recent years, with the trend toward high-density recording in VTRs, so-called metal tapes with high coercive force have been put into practical use.

従って、これに対応する磁気ヘットも飽和磁束密度の大
きい金属磁性材料、例えば、アモルファスやセンダスト
などのいわゆる金属コアが用いられている。
Therefore, the corresponding magnetic head also uses a metal magnetic material with a high saturation magnetic flux density, for example, a so-called metal core such as amorphous or sendust.

金属コアはバルク状態では高周波における渦電流損失が
大きく、この損失を防ぐため、金属コアはスパッタリン
グや蒸着などの膜形成技術によって補助基板上に層状に
形成している。
In a bulk state, the metal core has a large eddy current loss at high frequencies, and to prevent this loss, the metal core is formed in a layered manner on an auxiliary substrate using a film forming technique such as sputtering or vapor deposition.

第2図は従来の金属ヘッドとその製造法の一例を示す図
である。
FIG. 2 is a diagram showing an example of a conventional metal head and its manufacturing method.

第2図(a)はヘッド前面から見た概略図であり、ヘッ
ドトラック幅Wを成す磁気コアは上下から補助基板で挟
まれ、かつ、接着ガラスにより結合したコア半体対によ
って磁気ギャップgを構成している。
FIG. 2(a) is a schematic diagram seen from the front of the head, in which the magnetic core forming the head track width W is sandwiched between upper and lower auxiliary substrates, and the magnetic gap g is formed by a pair of core halves bonded together by adhesive glass. It consists of

具体的な製造工程を第2図(b) 、 (c)を用いて
説明する。
The specific manufacturing process will be explained using FIGS. 2(b) and 2(c).

即ち、第2図(b)の如く、一つの補助基板1上に必要
なヘッドトラック幅Wに相当する厚みの金属磁性材料、
例えば、アモルファスをスパッタリングによって層状に
設けた磁性層2を形成する。
That is, as shown in FIG. 2(b), a metal magnetic material with a thickness corresponding to the necessary head track width W is placed on one auxiliary substrate 1,
For example, the magnetic layer 2 is formed by sputtering amorphous material.

そして、前記磁性層2上からガラス薄膜3を介在させ、
もう一つの補助基板1′を重ね、そのガラス薄膜3を融
着させることにより、上下面から補助基板1,1′で挟
持した金属コア積層体4を構成する。
Then, a glass thin film 3 is interposed from above the magnetic layer 2,
By stacking another auxiliary substrate 1' and fusing the glass thin film 3, a metal core laminate 4 sandwiched between the auxiliary substrates 1 and 1' from above and below is constructed.

第2図(c)は、この様な金属コア積層体4をA−A’
で切断することによって、コア半体5aと5bを製造し
ていた。
FIG. 2(c) shows such a metal core laminate 4 at A-A'
The core halves 5a and 5b were manufactured by cutting the core halves 5a and 5b.

即ち、従来ヘッドはこの様なコア半体5aと5bを用い
、必要な巻線溝6の加工と磁気ギャップ形成面の加工を
行い、前記第2図(a)に示したような磁気ヘッド体7
を製造していたものである。
That is, the conventional head uses such core halves 5a and 5b, and the necessary winding grooves 6 and magnetic gap forming surfaces are machined to form a magnetic head body as shown in FIG. 2(a). 7
It was manufactured.

(発明が解決しようとする問題点) 以上述べた従来の製造法では、補助基板1,1′間に挟
持したヘッドトラック幅W相当の厚みの金属磁性層(磁
気コア)2の形成を、補助基板の一つである補助基板1
上にその全厚をスパッタリングにより膜形成する製造法
である。
(Problems to be Solved by the Invention) In the conventional manufacturing method described above, the formation of the metal magnetic layer (magnetic core) 2 having a thickness equivalent to the head track width W sandwiched between the auxiliary substrates 1 and 1' is Auxiliary board 1 which is one of the boards
This is a manufacturing method in which a film is formed over the entire thickness by sputtering.

しかしながら、この様なスパッタリング法は、その膜形
成速度が極めて遅く時間がかかる。このことは、磁気コ
ア2の製造に時間を要し、製造コストが高くつくもので
あった。
However, such a sputtering method has an extremely slow film formation rate and is time consuming. This requires time to manufacture the magnetic core 2 and increases the manufacturing cost.

更に、補助基板1上に形成する磁性膜厚が厚くなる程、
その膜厚内部のストレスが内在して磁性層2から補助基
板1に応力が加わり、反りが発生し、平面度が悪くなる
Furthermore, as the thickness of the magnetic film formed on the auxiliary substrate 1 becomes thicker,
Stress within the film thickness is inherent and stress is applied from the magnetic layer 2 to the auxiliary substrate 1, causing warpage and poor flatness.

従って、ガラス層2を介して、もう一方の接着補助基板
1″との間に間隙8が生じ、極端な場合には補助基板1
′が接着不良を起したり加工途中で剥離する等の問題が
あった。
Therefore, a gap 8 is created between the glass layer 2 and the other adhesion auxiliary substrate 1'', and in extreme cases, the auxiliary substrate 1
' had problems such as poor adhesion or peeling during processing.

更に、前記同様、補助基板1の一つに金属磁性F!J2
の全厚を形成する従来技術では、その基板1上での場所
による膜厚分布に差異を生じ、前記反りと同じ構造で間
隙8を生じる問題があった。
Furthermore, as above, one of the auxiliary substrates 1 is made of metal magnetic F! J2
In the conventional technique of forming the entire thickness of the film, there is a problem in that the film thickness distribution differs depending on the location on the substrate 1, and a gap 8 is created in the same structure as the warpage.

以上の如き磁性層2の応力や膜厚分布のバラツキは磁性
層2の磁気特性の劣化を招き、これによって構成される
磁気ヘットの電磁変換特性と、ヘット1−ラック幅Wな
どの機械的寸法精度不良など、の磁気ヘットの品質も低
下させる問題があった。
The above-mentioned variations in the stress and film thickness distribution of the magnetic layer 2 lead to deterioration of the magnetic properties of the magnetic layer 2, which deteriorates the electromagnetic conversion characteristics of the magnetic head and the mechanical dimensions such as head 1 - rack width W. There were also problems such as poor accuracy that degraded the quality of the magnetic head.

(問題点を解決するための手段) 本発明は、前記問題を解決するため、金属磁性層2を挟
持する上下の補助基板1,1′のそれぞれに、必要なヘ
ッドトラック幅Wを分割してスパッタリング膜を形成す
る。
(Means for solving the problem) In order to solve the above problem, the present invention divides the necessary head track width W into each of the upper and lower auxiliary substrates 1 and 1' which sandwich the metal magnetic layer 2. Form a sputtering film.

(作用) 本発明は上記手段と構成により、金属磁性層2のスパッ
タ時間を半減させて製造時間を短縮させ。
(Function) The present invention reduces the sputtering time of the metal magnetic layer 2 by half and shortens the manufacturing time by using the above means and structure.

しかも、磁性膜内部ストレスの減少と、膜厚分布改善に
よるコア平面度の精度を高めて、金属コア積層体4を強
固に接着し、剥離等の悪影響を防止し、信頼性の高いヘ
ッドを確保する。
Furthermore, by reducing the internal stress of the magnetic film and increasing the accuracy of core flatness by improving the film thickness distribution, the metal core laminate 4 is firmly bonded, preventing negative effects such as peeling, and ensuring a highly reliable head. do.

(実施例) 第1図は本発明による磁気ヘッドとその製造工程を示す
一実施例図であり、ビデオヘッド製造法の一例を示すも
のである。
(Embodiment) FIG. 1 is an embodiment diagram showing a magnetic head according to the present invention and its manufacturing process, and shows an example of a video head manufacturing method.

ここで、第1図(a)は磁気ヘッド、 第1図(b)〜(e)は積層コアの製造工程図である。Here, FIG. 1(a) shows a magnetic head, FIGS. 1(b) to 1(e) are manufacturing process diagrams of the laminated core.

一対のコア半体15a、15bは、二つの補助基板10
゜10′のそれぞれに磁性層11.11’をスパッタリ
ングし、結晶化された接着ガラス層12で接着一体化す
る。
The pair of core halves 15a and 15b are connected to the two auxiliary substrates 10.
Magnetic layers 11 and 11' are sputtered onto each of the magnetic layers 10' and bonded together with a crystallized adhesive glass layer 12.

また、前記コア半体対は、磁気ギャップgを境として、
接着ガラス層12よりも低融点ガラスで結合している。
Further, the core half pair has a magnetic gap g as a boundary,
They are bonded using glass with a lower melting point than the adhesive glass layer 12.

以下、本発明の実施例の製造法について説明する。Hereinafter, a manufacturing method of an example of the present invention will be explained.

第1図(b)は、非磁性材から成る二つの補助基板to
、to’の一面に、磁性層11.11’をスパッタリン
グによって、その合計厚さが所望のヘッドトラック幅W
になる様につけると共に、少なくとも片方の磁性層11
上に接着ガラス層12として、結晶化ガラスをスパッタ
リングによって介在させた後、前記、磁性層の結晶化温
度よりも低い温度で加熱して磁性層11.11″を接着
し、補助基板で挟持された磁性層を有する積層体13を
構成する。
Figure 1(b) shows two auxiliary substrates made of non-magnetic material.
, to' by sputtering the magnetic layers 11, 11' so that the total thickness is the desired head track width W.
At least one of the magnetic layers 11
Crystallized glass is interposed thereon as an adhesive glass layer 12 by sputtering, and then the magnetic layer 11.11'' is bonded by heating at a temperature lower than the crystallization temperature of the magnetic layer, and is sandwiched between the auxiliary substrates. A laminated body 13 having a magnetic layer is constructed.

更に、積層体13をB−B’線でダイヤモンド刃で切断
し、更に砥石などで成形した巻線溝14を加工すること
により1通常にコア半体対15a、15bを構成するも
のである。
Further, the laminated body 13 is cut along the line B-B' with a diamond blade, and the winding grooves 14 are formed using a grindstone or the like, thereby forming a pair of core halves 15a and 15b.

この様なコア半体対15a、15bを用い、磁気ギャッ
プ面gで突き合わせ、磁気ギャップ面とその近傍あるい
は巻線溝14中の配した結合ガラス16を、前記磁性層
及び磁性層接着ガラス層12の両方の結晶化温度に比べ
同等もしくは低温で過熱して一体に結合した磁気ヘッド
17を得るものである。
Using such a pair of core halves 15a and 15b, the magnetic gap surfaces g are butted together, and the bonding glass 16 disposed on and near the magnetic gap surface or in the winding groove 14 is bonded to the magnetic layer and the magnetic layer adhesive glass layer 12. The magnetic head 17 is obtained by heating at the same or lower temperature than the crystallization temperature of both of the two.

次に、前記磁気ヘッド17がCo −Nb −Zr系ア
モルファス合金を用いた場合について述べる。
Next, a case will be described in which the magnetic head 17 uses a Co--Nb--Zr based amorphous alloy.

結晶化ガラス又はセラミックスなどの非磁性材料から成
る平面加工した補助基板10.10’を同一面上に並べ
、前記アモルファスをスパッタリングにより毎分60〜
100人の速度で付着させる。
Flat-processed auxiliary substrates 10 and 10' made of non-magnetic materials such as crystallized glass or ceramics are arranged on the same surface, and the amorphous material is sputtered at a rate of 60 to 100 minutes per minute.
Deposit at a rate of 100 people.

例えば、8+amVTRのLPモード仕様の15μmト
ラック幅であれば、それぞれの補助基板上にそのトラッ
ク幅の半分の厚みを付着させる訳である6次に、少なく
とも一方のアモルファス膜上に、前記アモルファスの結
晶上温度(500〜550°C)以下の温度で結晶化す
る、いわゆる低融点結晶化ガラスをスパッタリングによ
り約100’0人膜付けし、他方のアモルファス面11
′を重ね合わせて、約480℃で約30分間加熱、接着
することによって、補助基板10.10’間に1000
人のガラス絶縁層を持つ15μ−のアモルファス積層体
13ができる。
For example, if the track width is 15 μm according to the LP mode specification of an 8+am VTR, a thickness of half the track width is deposited on each auxiliary substrate. A so-called low melting point crystallized glass, which crystallizes at a temperature below the upper temperature (500 to 550°C), is deposited on the other amorphous surface 11 by sputtering to form a film of about 100'.
10,000 by heating and bonding at about 480°C for about 30 minutes, 10,000
A 15 μm amorphous laminate 13 with a glass insulating layer is produced.

この様な積層体13を切断してコア半体15a、15b
を構成し1両コア半体に必要な形状と寸法加工を行い、
ギャップ材、例えばガラスを介して、左右アモルファス
コアのトラック位置合わせを行い、ヘッドトラック幅W
を構成し、前記、ギャップ面から巻線溝14に設けた結
合ガラス16を、前記アモルファスの結晶化温度よりも
低い480℃で30分間加熱することにより両コア半体
対を一体化させ、磁気ヘッド17を得るものである。
Such a laminate 13 is cut to form core halves 15a and 15b.
, and perform the necessary shape and dimension processing for one core half,
Track alignment of the left and right amorphous cores is performed through a gap material such as glass, and the head track width W is adjusted.
The bonding glass 16 provided in the winding groove 14 from the gap surface is heated at 480° C., which is lower than the crystallization temperature of the amorphous, for 30 minutes to integrate both core halves, and the magnetic A head 17 is obtained.

更に、前記磁気ヘッド17を例えば30μm程度の幅広
のヘッドトラック幅で構成する場合について第1図(e
)を用いて説明する。
Further, FIG. 1 (e
).

即ち、基本的には、前述の15μm仕様と同じであり、
補助基板10.10’上に30μmの半分の15μmの
アモルファスをスパッタリングにより付着する。
That is, it is basically the same as the 15 μm specification mentioned above,
On the auxiliary substrate 10.10', a 15 μm amorphous film, which is half of 30 μm, is deposited by sputtering.

しかしながら、アモルファスコアの高周波特性を高める
ためには、前記15μmの中に絶縁層を入れた積層コア
とすることが好ましいものである。
However, in order to improve the high frequency characteristics of the amorphous core, it is preferable to use a laminated core in which an insulating layer is inserted within the 15 μm.

従って、アモルファスを7.5μmスパッタリングした
時点で、約1ooo人の例えばSiO□絶縁層18.1
8’をスパッタリングにより介在させた後、引き続き残
りのアモルファスをスパッタリングして15μmとする
Therefore, when amorphous is sputtered to a thickness of 7.5 μm, approximately 100 μm of SiO□ insulating layer 18.1
After interposing 8' by sputtering, the remaining amorphous is subsequently sputtered to a thickness of 15 μm.

また、この5102に代えて、前記接着ガラス層12と
同様、低融点結晶化ガラスをスパッタリングしてもよい
Moreover, in place of this 5102, low melting point crystallized glass may be sputtered similarly to the adhesive glass layer 12.

何れにしても、そのヘッドトラック幅Wが厚くなると、
前記の如く、必要な層間絶縁層を介在した積層コアとす
ることが出来、それらを補助基板間で挟持し、アモルフ
ァス上の結晶化ガラスによって接着することにより、以
後の加熱処理に対して積層体は変動しない接着力を有す
ることが出来る。
In any case, when the head track width W becomes thicker,
As mentioned above, it is possible to form a laminated core with the necessary interlayer insulating layer interposed, and by sandwiching them between auxiliary substrates and adhering them with crystallized glass on an amorphous layer, the laminated core can be made to withstand subsequent heat treatment. can have an adhesive force that does not vary.

以上の通り1本発明の製造法は、その1−ラック幅Wが
厚い程そのスパッタ時間の短縮効果が現われ、かつ、積
層による高周波損失の防止効果と、コア内部ストレスの
減少などの効果が高まるものである。
As described above, the manufacturing method of the present invention has the effect of shortening the sputtering time as the rack width W becomes thicker, and the effect of preventing high frequency loss due to lamination and reducing internal stress of the core increases. It is something.

従って、今後の超高周波域対応(MUSE)ヘッドなど
に最大の効果が発揮できるものである。
Therefore, the maximum effect can be exerted on future ultra-high frequency compatible (MUSE) heads.

前記説明において、その磁気コアをスパッタリングによ
り形成する方法について述べたが、蒸着法やイオンブレ
ーティング法等の薄膜形成技術で同様に実現できる。
In the above description, the method of forming the magnetic core by sputtering has been described, but it can also be similarly realized by thin film forming techniques such as vapor deposition and ion blasting.

更に、接着ガラスについてもスパッタリングで介在させ
たが、蒸着法やガラス微粉を溶剤に混在させ塗布させる
方法や、ガラス薄板を直接介在させ加熱接着することも
出来る。
Furthermore, the bonding glass was also interposed by sputtering, but it is also possible to use a vapor deposition method, a method in which fine glass powder is mixed with a solvent and applied, or a thin glass plate can be directly interposed and heat bonded.

また、前記説明において、磁気コアがアモルファスであ
る場合について述べたが、他にセンダストなどの高飽和
磁束密度を有する金属材料も適用できるし、センダスト
の場合を考えると、その結晶化温度に相当する処理温度
が少なくとも800℃以上でも許容できるため、接着ガ
ラスや結合ガラスの選択が広く有効である。
In addition, in the above explanation, the case where the magnetic core is amorphous has been described, but other metal materials with high saturation magnetic flux density such as sendust can also be applied. Since a processing temperature of at least 800° C. or higher is acceptable, adhesive glass or bonded glass is widely effective.

(発明の効果) 以上の通り、本発明の製造工程により構成した磁気ヘッ
ドは、必要なヘッドトラック幅Wを形成するコアが半分
のスパッタ時間で出来るため、製造時間が短縮でき、ヘ
ッドのコストダウンができる。
(Effects of the Invention) As described above, in the magnetic head constructed by the manufacturing process of the present invention, the core forming the necessary head track width W can be formed in half the sputtering time, so the manufacturing time can be shortened and the cost of the head can be reduced. I can do it.

また、スパッタリングしたアモルファス間を結晶化ガラ
スで接着するため積層構造となり、渦電流損を防止でき
る効果を発揮すると共に、ギャップ形成などの後工程の
熱処理に対しても、コア積層が変動せず、高寸法精度の
トラック幅Wと磁気ギャップgが得られ、従って、高信
頼度の磁気ヘッド17が製造できる効果がある。
In addition, since the sputtered amorphous layers are bonded with crystallized glass, a laminated structure is created, which is effective in preventing eddy current loss, and the core lamination does not change even during post-process heat treatment such as gap formation. It is possible to obtain a track width W and a magnetic gap g with high dimensional accuracy, and therefore, there is an effect that a highly reliable magnetic head 17 can be manufactured.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による磁気ヘッドとその製造工程を示す
一実施例図、第2図は従来の金属ヘッドとその製造法の
一例を示す図である。 10、10’  ・・・補助基板、 11.11’ ・
・・磁性層、12・・・接着ガラス層、13・・・積層
体。 14・・・巻線溝、15a、15b・・・コア半体、1
6・・・結合ガラス、17・・・磁気ヘッド、18.1
8’ ・・・絶縁層。 第1図 to、to’省劾省線 1鑞、11′9I1 12潰S力゛今久1 14玲轢っ4 15a、15b  づアキ入も 第1図 日
FIG. 1 is a diagram showing an example of a magnetic head according to the present invention and its manufacturing process, and FIG. 2 is a diagram showing an example of a conventional metal head and its manufacturing method. 10, 10'... Auxiliary board, 11.11' ・
...Magnetic layer, 12...Adhesive glass layer, 13...Laminated body. 14... Winding groove, 15a, 15b... Core half, 1
6... Bonding glass, 17... Magnetic head, 18.1
8'...Insulating layer. Figure 1 to, to' Province line 1, 11'9I1 12 S force゛imakyu 1 14 Ling 4 15a, 15b Zuaki entry is also Figure 1 day

Claims (3)

【特許請求の範囲】[Claims] (1)補助基板上に金属磁性層をスパッタリングや蒸着
等により付着させたコア素子の一対を用い、それらコア
素子の金属磁性層間に結晶化ガラス組成の接着層を介し
て重ね合わせ、第1の熱処理により前記結晶化ガラスで
接着合体して複合コア素子を構成し、 更に、前記複合コア素子を用い両補助基板間を横断する
端面をギャップ形成面として一対の磁気ヘッドコア半体
を構成し、 少なくとも片方のコア半体には、前記、接着層を通り巻
線溝を設けた後、前記、ギャップ形成面を平滑仕上げを
行い、必要なギャップ幅のガラスあるいは酸化物金属層
を所望のヘッドトラック幅になる様対向させた後、 巻線溝あるいは補助基板等の適当なる個所から非結晶化
ガラスを第2の熱処理により熔融結合させ、両コア半体
を一体結合させたことを特徴とする磁気ヘッドの製造法
(1) A pair of core elements each having a metal magnetic layer deposited on an auxiliary substrate by sputtering, vapor deposition, etc. are used, and the metal magnetic layers of the core elements are overlapped with an adhesive layer of crystallized glass composition interposed therebetween, and the first The crystallized glass is bonded and bonded by heat treatment to form a composite core element, and the composite core element is further used to form a pair of magnetic head core halves with an end surface crossing between both auxiliary substrates as a gap forming surface, and at least After forming a winding groove through the adhesive layer on one of the core halves, the gap forming surface is smoothed and the glass or oxide metal layer with the required gap width is formed into the desired head track width. A magnetic head characterized in that both core halves are integrally joined by melting and bonding amorphous glass from an appropriate location such as a winding groove or an auxiliary substrate through a second heat treatment. manufacturing method.
(2)金属磁性層にアモルファス合金を用い、第1と第
2の熱処理温度を、前記アモルファス合金の結晶温度よ
りも低い温度で行うことを特徴とする特許請求の範囲第
(1)項記載の磁気ヘッドの製造法。
(2) The metal magnetic layer is made of an amorphous alloy, and the first and second heat treatments are performed at a temperature lower than the crystallization temperature of the amorphous alloy. Manufacturing method for magnetic heads.
(3)金属磁性層にセンダスト合金を用い、第1の熱処
理温度より第2の熱処理温度を高い温度で行うことを特
徴とする特許請求の範囲第(1)項記載の磁気ヘッドの
製造法。
(3) A method for manufacturing a magnetic head according to claim (1), characterized in that a sendust alloy is used for the metal magnetic layer, and the second heat treatment temperature is performed at a higher temperature than the first heat treatment temperature.
JP60282086A 1985-12-17 1985-12-17 Magnetic head manufacturing method Expired - Fee Related JPH0792900B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60282086A JPH0792900B2 (en) 1985-12-17 1985-12-17 Magnetic head manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60282086A JPH0792900B2 (en) 1985-12-17 1985-12-17 Magnetic head manufacturing method

Publications (2)

Publication Number Publication Date
JPS62141609A true JPS62141609A (en) 1987-06-25
JPH0792900B2 JPH0792900B2 (en) 1995-10-09

Family

ID=17647942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60282086A Expired - Fee Related JPH0792900B2 (en) 1985-12-17 1985-12-17 Magnetic head manufacturing method

Country Status (1)

Country Link
JP (1) JPH0792900B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0253216A (en) * 1988-08-17 1990-02-22 Matsushita Electric Ind Co Ltd Formation of magnetic path for magnetic head

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6047215A (en) * 1983-08-24 1985-03-14 Canon Inc Magnetic head and its manufacture

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6047215A (en) * 1983-08-24 1985-03-14 Canon Inc Magnetic head and its manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0253216A (en) * 1988-08-17 1990-02-22 Matsushita Electric Ind Co Ltd Formation of magnetic path for magnetic head

Also Published As

Publication number Publication date
JPH0792900B2 (en) 1995-10-09

Similar Documents

Publication Publication Date Title
US5001590A (en) Magnetic head having core halves with a barrier layer therebetween
JP2554041B2 (en) Method of manufacturing magnetic head core
JPS62141609A (en) Manufacture of magnetic head
JPS60201509A (en) Manufacture of magnetic head
JPS6214313A (en) Magnetic head
JPS60231903A (en) Composite type magnetic head and its production
JPS63102007A (en) Magnetic head
JPS62183012A (en) Magnetic head and its manufacture
JPS6148114A (en) Magnetic head
JPS59203210A (en) Magnetic core and its production
JPH0386905A (en) Magnetic head and production of magnetic head
JPS59139118A (en) Magnetic head
JPH01109504A (en) Magnetic head
JPS58199425A (en) Manufacture of thin-film magnetic head
JPS6280808A (en) Magnetic head and its manufacture
JPS62146413A (en) Production of magnetic head
JPH0447367B2 (en)
JPS6038714A (en) Thin film video head and its production
JPS61123006A (en) Magnetic head
JPH06338020A (en) Production of magnetic head
JPS63304414A (en) Magnetic head
JPH04117606A (en) Magnetic head device
JPH06223315A (en) Magnetic head
JPH0145138B2 (en)
JPS62273613A (en) Manufacture of magnetic head

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees