JPS61223186A - 炭素薄膜の製造方法 - Google Patents
炭素薄膜の製造方法Info
- Publication number
- JPS61223186A JPS61223186A JP60059275A JP5927585A JPS61223186A JP S61223186 A JPS61223186 A JP S61223186A JP 60059275 A JP60059275 A JP 60059275A JP 5927585 A JP5927585 A JP 5927585A JP S61223186 A JPS61223186 A JP S61223186A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- carbon thin
- carbon
- reaction tube
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemically Coating (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60059275A JPS61223186A (ja) | 1985-03-22 | 1985-03-22 | 炭素薄膜の製造方法 |
EP88113145A EP0305790B1 (en) | 1985-03-20 | 1986-03-20 | Production of graphite intercalation compound and doped carbon films |
EP86103833A EP0201696B1 (en) | 1985-03-20 | 1986-03-20 | Production of carbon films |
DE8686103833T DE3678030D1 (de) | 1985-03-20 | 1986-03-20 | Herstellung von kohlenstoffschichten. |
DE8888113145T DE3687529T2 (de) | 1985-03-20 | 1986-03-20 | Herstellung von graphiteinlagerungsverbindung und gedopte carbonfilme. |
US07/190,353 US4946370A (en) | 1985-03-20 | 1988-05-05 | Method for the production of carbon films having an oriented graphite structure |
US07/344,961 US5049409A (en) | 1985-03-20 | 1989-04-28 | Method for metal or metal compounds inserted between adjacent graphite layers |
US07/706,006 US5273778A (en) | 1985-03-20 | 1991-05-28 | Method for producing graphite intercalation compound |
US08/051,441 US5404837A (en) | 1985-03-20 | 1993-04-22 | Method for preparing a graphite intercalation compound having a metal or metal compounds inserted between adjacent graphite layers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60059275A JPS61223186A (ja) | 1985-03-22 | 1985-03-22 | 炭素薄膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61223186A true JPS61223186A (ja) | 1986-10-03 |
JPH0510425B2 JPH0510425B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-02-09 |
Family
ID=13108665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60059275A Granted JPS61223186A (ja) | 1985-03-20 | 1985-03-22 | 炭素薄膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61223186A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010056560A (ja) * | 2007-08-10 | 2010-03-11 | Mitsubishi Electric Corp | カーボン膜成膜装置 |
JP2011187675A (ja) * | 2010-03-09 | 2011-09-22 | Mitsubishi Electric Corp | 炭化珪素半導体装置の製造方法 |
JP2013028493A (ja) * | 2011-07-28 | 2013-02-07 | Sumitomo Electric Ind Ltd | 黒鉛およびその製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5848428A (ja) * | 1981-09-17 | 1983-03-22 | Semiconductor Energy Lab Co Ltd | 炭素被膜を有する複合体およびその作製方法 |
-
1985
- 1985-03-22 JP JP60059275A patent/JPS61223186A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5848428A (ja) * | 1981-09-17 | 1983-03-22 | Semiconductor Energy Lab Co Ltd | 炭素被膜を有する複合体およびその作製方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010056560A (ja) * | 2007-08-10 | 2010-03-11 | Mitsubishi Electric Corp | カーボン膜成膜装置 |
JP2011187675A (ja) * | 2010-03-09 | 2011-09-22 | Mitsubishi Electric Corp | 炭化珪素半導体装置の製造方法 |
JP2013028493A (ja) * | 2011-07-28 | 2013-02-07 | Sumitomo Electric Ind Ltd | 黒鉛およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0510425B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-02-09 |
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