JPS61214420A - 電解コンデンサ用陰極材料 - Google Patents
電解コンデンサ用陰極材料Info
- Publication number
- JPS61214420A JPS61214420A JP60055543A JP5554385A JPS61214420A JP S61214420 A JPS61214420 A JP S61214420A JP 60055543 A JP60055543 A JP 60055543A JP 5554385 A JP5554385 A JP 5554385A JP S61214420 A JPS61214420 A JP S61214420A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- film
- capacitance
- average
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010406 cathode material Substances 0.000 title claims description 15
- 239000003990 capacitor Substances 0.000 title claims description 10
- 239000000463 material Substances 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
- 239000011888 foil Substances 0.000 claims description 11
- 230000000694 effects Effects 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 229910052719 titanium Inorganic materials 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000010405 anode material Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- -1 3 i Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000004955 epithelial membrane Anatomy 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Physical Vapour Deposition (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
- Primary Cells (AREA)
- Secondary Cells (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60055543A JPS61214420A (ja) | 1985-03-19 | 1985-03-19 | 電解コンデンサ用陰極材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60055543A JPS61214420A (ja) | 1985-03-19 | 1985-03-19 | 電解コンデンサ用陰極材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61214420A true JPS61214420A (ja) | 1986-09-24 |
| JPH0263284B2 JPH0263284B2 (OSRAM) | 1990-12-27 |
Family
ID=13001624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60055543A Granted JPS61214420A (ja) | 1985-03-19 | 1985-03-19 | 電解コンデンサ用陰極材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61214420A (OSRAM) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63160322A (ja) * | 1986-12-24 | 1988-07-04 | 昭和アルミニウム株式会社 | 電解コンデンサ用アルミニウム電極材料 |
| JPS63160323A (ja) * | 1986-12-24 | 1988-07-04 | 昭和アルミニウム株式会社 | 電解コンデンサ用アルミニウム電極材料の製造方法 |
| US4970626A (en) * | 1987-07-30 | 1990-11-13 | Matsushita Electric Industrial Co., Ltd. | Electrolytic capacitor and method of preparing it |
| JP2000012400A (ja) * | 1998-06-19 | 2000-01-14 | Nichicon Corp | アルミニウム電解コンデンサ用電極箔 |
| JPWO2016174806A1 (ja) * | 2015-04-28 | 2018-02-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| JPWO2016174807A1 (ja) * | 2015-04-28 | 2018-02-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| JPWO2016189779A1 (ja) * | 2015-05-28 | 2018-03-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1993786B (zh) * | 2004-08-05 | 2010-06-16 | 松下电器产业株式会社 | 电容器用铝电极箔的制造方法以及蚀刻用铝箔 |
-
1985
- 1985-03-19 JP JP60055543A patent/JPS61214420A/ja active Granted
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63160322A (ja) * | 1986-12-24 | 1988-07-04 | 昭和アルミニウム株式会社 | 電解コンデンサ用アルミニウム電極材料 |
| JPS63160323A (ja) * | 1986-12-24 | 1988-07-04 | 昭和アルミニウム株式会社 | 電解コンデンサ用アルミニウム電極材料の製造方法 |
| US4970626A (en) * | 1987-07-30 | 1990-11-13 | Matsushita Electric Industrial Co., Ltd. | Electrolytic capacitor and method of preparing it |
| JP2000012400A (ja) * | 1998-06-19 | 2000-01-14 | Nichicon Corp | アルミニウム電解コンデンサ用電極箔 |
| JP2021121037A (ja) * | 2015-04-28 | 2021-08-19 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサおよびその製造方法 |
| JPWO2016174807A1 (ja) * | 2015-04-28 | 2018-02-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| US10896783B2 (en) | 2015-04-28 | 2021-01-19 | Panasonic Intellectual Property Management Co., Ltd. | Electrolytic capacitor |
| JPWO2016174806A1 (ja) * | 2015-04-28 | 2018-02-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| JP2021145135A (ja) * | 2015-04-28 | 2021-09-24 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサおよびその製造方法 |
| US11348739B2 (en) | 2015-04-28 | 2022-05-31 | Panasonic Intellectual Property Management Co., Ltd. | Electrolytic capacitor |
| JP2023053035A (ja) * | 2015-04-28 | 2023-04-12 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| JPWO2016189779A1 (ja) * | 2015-05-28 | 2018-03-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| US10790098B2 (en) | 2015-05-28 | 2020-09-29 | Panasonic Intellectual Property Management Co., Ltd. | Electrolytic capacitor |
| JP2021145136A (ja) * | 2015-05-28 | 2021-09-24 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサおよびその製造方法 |
| JP2023053037A (ja) * | 2015-05-28 | 2023-04-12 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0263284B2 (OSRAM) | 1990-12-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |