JPS61210677A - 化合物半導体装置 - Google Patents

化合物半導体装置

Info

Publication number
JPS61210677A
JPS61210677A JP60052023A JP5202385A JPS61210677A JP S61210677 A JPS61210677 A JP S61210677A JP 60052023 A JP60052023 A JP 60052023A JP 5202385 A JP5202385 A JP 5202385A JP S61210677 A JPS61210677 A JP S61210677A
Authority
JP
Japan
Prior art keywords
compound semiconductor
layer
thin film
semiconductor device
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60052023A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0354853B2 (enrdf_load_stackoverflow
Inventor
Yuichi Matsui
松居　祐一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP60052023A priority Critical patent/JPS61210677A/ja
Priority to CA000504069A priority patent/CA1256590A/en
Priority to DE8686103425T priority patent/DE3672360D1/de
Priority to AU54742/86A priority patent/AU577934B2/en
Priority to EP86103425A priority patent/EP0196517B1/en
Priority to KR1019860001897A priority patent/KR860007745A/ko
Publication of JPS61210677A publication Critical patent/JPS61210677A/ja
Publication of JPH0354853B2 publication Critical patent/JPH0354853B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
    • H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
    • H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
    • H10D30/473—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT
    • H10D30/4732—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT using Group III-V semiconductor material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213—Channel regions of field-effect devices
    • H10D62/221—Channel regions of field-effect devices of FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213—Channel regions of field-effect devices
    • H10D62/221—Channel regions of field-effect devices of FETs
    • H10D62/235—Channel regions of field-effect devices of FETs of IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
    • H10D62/815—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW]
    • H10D62/8161—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices
    • H10D62/8162—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation
    • H10D62/8164—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation comprising only semiconductor materials 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/82—Heterojunctions
    • H10D62/824—Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions

Landscapes

  • Junction Field-Effect Transistors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP60052023A 1985-03-15 1985-03-15 化合物半導体装置 Granted JPS61210677A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP60052023A JPS61210677A (ja) 1985-03-15 1985-03-15 化合物半導体装置
CA000504069A CA1256590A (en) 1985-03-15 1986-03-13 Compound semiconductor device with layers having different lattice constants
DE8686103425T DE3672360D1 (de) 1985-03-15 1986-03-14 Verbindungshalbleiterbauelement.
AU54742/86A AU577934B2 (en) 1985-03-15 1986-03-14 Compound semiconductor device
EP86103425A EP0196517B1 (en) 1985-03-15 1986-03-14 Compound semiconductor device
KR1019860001897A KR860007745A (ko) 1985-03-15 1986-03-15 화합물 반도체장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60052023A JPS61210677A (ja) 1985-03-15 1985-03-15 化合物半導体装置

Publications (2)

Publication Number Publication Date
JPS61210677A true JPS61210677A (ja) 1986-09-18
JPH0354853B2 JPH0354853B2 (enrdf_load_stackoverflow) 1991-08-21

Family

ID=12903214

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60052023A Granted JPS61210677A (ja) 1985-03-15 1985-03-15 化合物半導体装置

Country Status (1)

Country Link
JP (1) JPS61210677A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63144579A (ja) * 1986-12-08 1988-06-16 Nec Corp 電界効果素子
US5206528A (en) * 1990-11-30 1993-04-27 Nec Corporation Compound semiconductor field effect transistor having a gate insulator formed of insulative superlattice layer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607121A (ja) * 1983-06-24 1985-01-14 Nec Corp 超格子の構造
JPS6028273A (ja) * 1983-07-26 1985-02-13 Nec Corp 半導体装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607121A (ja) * 1983-06-24 1985-01-14 Nec Corp 超格子の構造
JPS6028273A (ja) * 1983-07-26 1985-02-13 Nec Corp 半導体装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63144579A (ja) * 1986-12-08 1988-06-16 Nec Corp 電界効果素子
US5206528A (en) * 1990-11-30 1993-04-27 Nec Corporation Compound semiconductor field effect transistor having a gate insulator formed of insulative superlattice layer

Also Published As

Publication number Publication date
JPH0354853B2 (enrdf_load_stackoverflow) 1991-08-21

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