JPS61209434A - レジスト用重合体 - Google Patents

レジスト用重合体

Info

Publication number
JPS61209434A
JPS61209434A JP60049233A JP4923385A JPS61209434A JP S61209434 A JPS61209434 A JP S61209434A JP 60049233 A JP60049233 A JP 60049233A JP 4923385 A JP4923385 A JP 4923385A JP S61209434 A JPS61209434 A JP S61209434A
Authority
JP
Japan
Prior art keywords
polymer
units
halogenoisopropenylcumene
resist
alpha
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60049233A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0588469B2 (enExample
Inventor
Tadashi Asanuma
正 浅沼
Junko Takeda
武田　淳子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP60049233A priority Critical patent/JPS61209434A/ja
Publication of JPS61209434A publication Critical patent/JPS61209434A/ja
Publication of JPH0588469B2 publication Critical patent/JPH0588469B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60049233A 1985-03-14 1985-03-14 レジスト用重合体 Granted JPS61209434A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60049233A JPS61209434A (ja) 1985-03-14 1985-03-14 レジスト用重合体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60049233A JPS61209434A (ja) 1985-03-14 1985-03-14 レジスト用重合体

Publications (2)

Publication Number Publication Date
JPS61209434A true JPS61209434A (ja) 1986-09-17
JPH0588469B2 JPH0588469B2 (enExample) 1993-12-22

Family

ID=12825180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60049233A Granted JPS61209434A (ja) 1985-03-14 1985-03-14 レジスト用重合体

Country Status (1)

Country Link
JP (1) JPS61209434A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01261636A (ja) * 1988-04-13 1989-10-18 Canon Inc パターン形成法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01261636A (ja) * 1988-04-13 1989-10-18 Canon Inc パターン形成法

Also Published As

Publication number Publication date
JPH0588469B2 (enExample) 1993-12-22

Similar Documents

Publication Publication Date Title
US6808859B1 (en) ArF photoresist copolymers
JPS61209434A (ja) レジスト用重合体
JP2559588B2 (ja) 気体分離膜
JPS6127537A (ja) レジスト剤
JPS63319A (ja) 二酸化硫黄とビニル化合物から成る多元共重合体
JPH0664343B2 (ja) レジスト用樹脂組成物
JP2537174B2 (ja) 架橋方法
JPS6090205A (ja) 単分散ビニルシリル基含有有機高分子化合物の製造方法
JPS61209435A (ja) レジスト用重合体
JPS6310634A (ja) 二酸化硫黄、アセチレン化合物およびビニル化合物の共重合体
JPH01155336A (ja) 放射線感応性樹脂
JPH0641547B2 (ja) 反応性重合体組成物
JPS61218604A (ja) 反応性重合体およびその製造法
JPH03148659A (ja) 電離放射線感応性ネガ型レジスト材料組成物
JPS6088015A (ja) けい素原子含有有機高分子化合物の製造方法
JPS62253152A (ja) 放射線感応性重合体組成物
JPS61176922A (ja) レジスト用α−メチルスチレン共重合体
JPS61115911A (ja) ジエチニルシラン化合物の重合体及びその製造法
JPH063547B2 (ja) 架橋方法
JPS62930B2 (enExample)
JPS62115442A (ja) レジスト材
JPS601211A (ja) ポリエチニルフエニルアセチレンとその製造法
JPS61254614A (ja) １−クロロ−１−アルキン類の重合体
JPS62260804A (ja) 含フツ素ポリフエニルアセチレン類の製法
JPS6375741A (ja) ケイ素含有レジスト材料