JPH0588469B2 - - Google Patents

Info

Publication number
JPH0588469B2
JPH0588469B2 JP60049233A JP4923385A JPH0588469B2 JP H0588469 B2 JPH0588469 B2 JP H0588469B2 JP 60049233 A JP60049233 A JP 60049233A JP 4923385 A JP4923385 A JP 4923385A JP H0588469 B2 JPH0588469 B2 JP H0588469B2
Authority
JP
Japan
Prior art keywords
polymer
chloroform
copolymer
diisopropenylbenzene
units
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60049233A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61209434A (ja
Inventor
Tadashi Asanuma
Junko Takeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP60049233A priority Critical patent/JPS61209434A/ja
Publication of JPS61209434A publication Critical patent/JPS61209434A/ja
Publication of JPH0588469B2 publication Critical patent/JPH0588469B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60049233A 1985-03-14 1985-03-14 レジスト用重合体 Granted JPS61209434A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60049233A JPS61209434A (ja) 1985-03-14 1985-03-14 レジスト用重合体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60049233A JPS61209434A (ja) 1985-03-14 1985-03-14 レジスト用重合体

Publications (2)

Publication Number Publication Date
JPS61209434A JPS61209434A (ja) 1986-09-17
JPH0588469B2 true JPH0588469B2 (enExample) 1993-12-22

Family

ID=12825180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60049233A Granted JPS61209434A (ja) 1985-03-14 1985-03-14 レジスト用重合体

Country Status (1)

Country Link
JP (1) JPS61209434A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2570803B2 (ja) * 1988-04-13 1997-01-16 キヤノン株式会社 パターン形成法

Also Published As

Publication number Publication date
JPS61209434A (ja) 1986-09-17

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