JPS61207572A - 薄膜成膜装置 - Google Patents

薄膜成膜装置

Info

Publication number
JPS61207572A
JPS61207572A JP4657385A JP4657385A JPS61207572A JP S61207572 A JPS61207572 A JP S61207572A JP 4657385 A JP4657385 A JP 4657385A JP 4657385 A JP4657385 A JP 4657385A JP S61207572 A JPS61207572 A JP S61207572A
Authority
JP
Japan
Prior art keywords
thin film
substrate
plasma
cluster
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4657385A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0535219B2 (forum.php
Inventor
Yasuo Iwabori
岩堀　泰雄
Hide Kobayashi
秀 小林
Tsuneaki Kamei
亀井　常彰
Katsuo Abe
勝男 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4657385A priority Critical patent/JPS61207572A/ja
Publication of JPS61207572A publication Critical patent/JPS61207572A/ja
Publication of JPH0535219B2 publication Critical patent/JPH0535219B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP4657385A 1985-03-11 1985-03-11 薄膜成膜装置 Granted JPS61207572A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4657385A JPS61207572A (ja) 1985-03-11 1985-03-11 薄膜成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4657385A JPS61207572A (ja) 1985-03-11 1985-03-11 薄膜成膜装置

Publications (2)

Publication Number Publication Date
JPS61207572A true JPS61207572A (ja) 1986-09-13
JPH0535219B2 JPH0535219B2 (forum.php) 1993-05-26

Family

ID=12751050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4657385A Granted JPS61207572A (ja) 1985-03-11 1985-03-11 薄膜成膜装置

Country Status (1)

Country Link
JP (1) JPS61207572A (forum.php)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0297664A (ja) * 1988-09-30 1990-04-10 Res Dev Corp Of Japan 超高純度成膜装置
WO2006115236A1 (ja) * 2005-04-21 2006-11-02 Futaba Corporation 蒸着装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0297664A (ja) * 1988-09-30 1990-04-10 Res Dev Corp Of Japan 超高純度成膜装置
WO2006115236A1 (ja) * 2005-04-21 2006-11-02 Futaba Corporation 蒸着装置
JP2008063590A (ja) * 2005-04-21 2008-03-21 Futaba Corp 蒸着装置

Also Published As

Publication number Publication date
JPH0535219B2 (forum.php) 1993-05-26

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