JPS6120323A - 水銀灯による半導体ウエハ−材料の露光方法 - Google Patents

水銀灯による半導体ウエハ−材料の露光方法

Info

Publication number
JPS6120323A
JPS6120323A JP59139774A JP13977484A JPS6120323A JP S6120323 A JPS6120323 A JP S6120323A JP 59139774 A JP59139774 A JP 59139774A JP 13977484 A JP13977484 A JP 13977484A JP S6120323 A JPS6120323 A JP S6120323A
Authority
JP
Japan
Prior art keywords
mercury lamp
exposure
shutter
power consumption
condition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59139774A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0254653B2 (cg-RX-API-DMAC7.html
Inventor
Takehiro Kira
健裕 吉良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP59139774A priority Critical patent/JPS6120323A/ja
Priority to US06/705,646 priority patent/US4605301A/en
Priority to FR8502942A priority patent/FR2567280B1/fr
Priority to GB8506123A priority patent/GB2161284B/en
Priority to DE3510478A priority patent/DE3510478C2/de
Priority to NLAANVRAGE8501933,A priority patent/NL190495C/xx
Publication of JPS6120323A publication Critical patent/JPS6120323A/ja
Publication of JPH0254653B2 publication Critical patent/JPH0254653B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y02B20/202—

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Discharge-Lamp Control Circuits And Pulse- Feed Circuits (AREA)
JP59139774A 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法 Granted JPS6120323A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP59139774A JPS6120323A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法
US06/705,646 US4605301A (en) 1984-07-07 1985-02-26 Exposure method of semiconductor wafer by mercury-vapor lamp
FR8502942A FR2567280B1 (fr) 1984-07-07 1985-02-28 Procede d'exposition d'une pastille de semi-conducteur par une lampe a vapeur de mercure
GB8506123A GB2161284B (en) 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor lamp
DE3510478A DE3510478C2 (de) 1984-07-07 1985-03-22 Verfahren zur aufeinanderfolgenden Belichtung kleiner Abschnitte eines Halbleiterwafers
NLAANVRAGE8501933,A NL190495C (nl) 1984-07-07 1985-07-05 Belichtingsstelsel voor het achtereenvolgens belichten van halfgeleiderplakken.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59139774A JPS6120323A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法

Publications (2)

Publication Number Publication Date
JPS6120323A true JPS6120323A (ja) 1986-01-29
JPH0254653B2 JPH0254653B2 (cg-RX-API-DMAC7.html) 1990-11-22

Family

ID=15253098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59139774A Granted JPS6120323A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法

Country Status (1)

Country Link
JP (1) JPS6120323A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022224576A1 (ja) * 2021-04-23 2022-10-27 株式会社ブイ・テクノロジー 照明装置の制御方法及び露光装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022224576A1 (ja) * 2021-04-23 2022-10-27 株式会社ブイ・テクノロジー 照明装置の制御方法及び露光装置

Also Published As

Publication number Publication date
JPH0254653B2 (cg-RX-API-DMAC7.html) 1990-11-22

Similar Documents

Publication Publication Date Title
GB2171214A (en) Projection printing
US6540898B2 (en) Method and system for manufacture of field emission display
GB2070327A (en) Method and apparatus for annealing semiconductors
US4954717A (en) Photoelectron mask and photo cathode image projection method using the same
KR20000057050A (ko) 노광장치에서의 램프점등 제어방법
JPS6120323A (ja) 水銀灯による半導体ウエハ−材料の露光方法
JPS6120324A (ja) 水銀灯による半導体ウエハ−材料の露光方法
JPH0892765A (ja) エッチング方法
US20250299954A1 (en) Mask, lithographing apparatus and method for manufacturing mask
US4605301A (en) Exposure method of semiconductor wafer by mercury-vapor lamp
JPS6120326A (ja) 水銀灯による半導体ウエハ−材料の露光方法
JPS622428B2 (cg-RX-API-DMAC7.html)
JPS6120322A (ja) 水銀灯による半導体ウエハ−材料の露光方法
JPS6059733A (ja) 半導体露光装置
JP4570379B2 (ja) ナノシリコン発光素子の製造法
JPS6254440A (ja) 半導体ウエハの露光方法
JPS6254439A (ja) 半導体ウエハの露光方法
JPS6120328A (ja) 超高圧水銀灯による半導体ウエハ−材料の露光方法
JPS6120325A (ja) 水銀灯による半導体ウエハ−材料の露光方法
KR100464653B1 (ko) 유전장벽 방전 플라즈마 소오스를 이용한 전자빔 큐어링장비
JPH0797575B2 (ja) プラズマエツチング方法
JP2842908B2 (ja) プラズマプロセス装置
JP2002298753A (ja) 薄膜状発光素子の製造方法
JPS6320828A (ja) 半導体ウエハの露光方法
JPS5885298A (ja) 水銀ランプの点灯方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees