JPS61197638A - プラズマ処理装置及び方法 - Google Patents
プラズマ処理装置及び方法Info
- Publication number
- JPS61197638A JPS61197638A JP60037463A JP3746385A JPS61197638A JP S61197638 A JPS61197638 A JP S61197638A JP 60037463 A JP60037463 A JP 60037463A JP 3746385 A JP3746385 A JP 3746385A JP S61197638 A JPS61197638 A JP S61197638A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plastic tube
- side electrode
- insulating layer
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma Technology (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60037463A JPS61197638A (ja) | 1985-02-28 | 1985-02-28 | プラズマ処理装置及び方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60037463A JPS61197638A (ja) | 1985-02-28 | 1985-02-28 | プラズマ処理装置及び方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61197638A true JPS61197638A (ja) | 1986-09-01 |
| JPH0576759B2 JPH0576759B2 (OSRAM) | 1993-10-25 |
Family
ID=12498216
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60037463A Granted JPS61197638A (ja) | 1985-02-28 | 1985-02-28 | プラズマ処理装置及び方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61197638A (OSRAM) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01296600A (ja) * | 1988-05-23 | 1989-11-29 | Nissin Electric Co Ltd | プラズマ発生源 |
| WO1999036586A1 (en) * | 1998-01-15 | 1999-07-22 | Torrex Equipment Corporation | Apparatus and method for plasma enhanced chemical vapor deposition (pecvd) in a single wafer reactor |
| US6352593B1 (en) | 1997-08-11 | 2002-03-05 | Torrex Equipment Corp. | Mini-batch process chamber |
| US6352594B2 (en) | 1997-08-11 | 2002-03-05 | Torrex | Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
| US6780464B2 (en) | 1997-08-11 | 2004-08-24 | Torrex Equipment | Thermal gradient enhanced CVD deposition at low pressure |
| US7393561B2 (en) | 1997-08-11 | 2008-07-01 | Applied Materials, Inc. | Method and apparatus for layer by layer deposition of thin films |
| JP2019077104A (ja) * | 2017-10-25 | 2019-05-23 | 泉工業株式会社 | チューブの表面処理装置及びプラズマ処理装置 |
-
1985
- 1985-02-28 JP JP60037463A patent/JPS61197638A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01296600A (ja) * | 1988-05-23 | 1989-11-29 | Nissin Electric Co Ltd | プラズマ発生源 |
| US6352593B1 (en) | 1997-08-11 | 2002-03-05 | Torrex Equipment Corp. | Mini-batch process chamber |
| US6352594B2 (en) | 1997-08-11 | 2002-03-05 | Torrex | Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
| US6780464B2 (en) | 1997-08-11 | 2004-08-24 | Torrex Equipment | Thermal gradient enhanced CVD deposition at low pressure |
| US7393561B2 (en) | 1997-08-11 | 2008-07-01 | Applied Materials, Inc. | Method and apparatus for layer by layer deposition of thin films |
| WO1999036586A1 (en) * | 1998-01-15 | 1999-07-22 | Torrex Equipment Corporation | Apparatus and method for plasma enhanced chemical vapor deposition (pecvd) in a single wafer reactor |
| US6167837B1 (en) | 1998-01-15 | 2001-01-02 | Torrex Equipment Corp. | Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor |
| JP2019077104A (ja) * | 2017-10-25 | 2019-05-23 | 泉工業株式会社 | チューブの表面処理装置及びプラズマ処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0576759B2 (OSRAM) | 1993-10-25 |
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