JPS61192446U - - Google Patents
Info
- Publication number
- JPS61192446U JPS61192446U JP7620385U JP7620385U JPS61192446U JP S61192446 U JPS61192446 U JP S61192446U JP 7620385 U JP7620385 U JP 7620385U JP 7620385 U JP7620385 U JP 7620385U JP S61192446 U JPS61192446 U JP S61192446U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- gas
- etched
- introduction pipe
- entrance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000006185 dispersion Substances 0.000 claims description 5
- 238000001312 dry etching Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 230000005284 excitation Effects 0.000 claims 1
- 238000005192 partition Methods 0.000 claims 1
- 238000009423 ventilation Methods 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985076203U JPH051071Y2 (enrdf_load_stackoverflow) | 1985-05-22 | 1985-05-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985076203U JPH051071Y2 (enrdf_load_stackoverflow) | 1985-05-22 | 1985-05-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61192446U true JPS61192446U (enrdf_load_stackoverflow) | 1986-11-29 |
| JPH051071Y2 JPH051071Y2 (enrdf_load_stackoverflow) | 1993-01-12 |
Family
ID=30618132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985076203U Expired - Lifetime JPH051071Y2 (enrdf_load_stackoverflow) | 1985-05-22 | 1985-05-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH051071Y2 (enrdf_load_stackoverflow) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5317077A (en) * | 1976-07-30 | 1978-02-16 | Nec Corp | Production of semiconductor device |
| JPS5748226A (en) * | 1980-09-05 | 1982-03-19 | Matsushita Electronics Corp | Plasma processing method and device for the same |
| JPS5831532A (ja) * | 1981-08-18 | 1983-02-24 | Nec Corp | プラズマ処理装置 |
-
1985
- 1985-05-22 JP JP1985076203U patent/JPH051071Y2/ja not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5317077A (en) * | 1976-07-30 | 1978-02-16 | Nec Corp | Production of semiconductor device |
| JPS5748226A (en) * | 1980-09-05 | 1982-03-19 | Matsushita Electronics Corp | Plasma processing method and device for the same |
| JPS5831532A (ja) * | 1981-08-18 | 1983-02-24 | Nec Corp | プラズマ処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH051071Y2 (enrdf_load_stackoverflow) | 1993-01-12 |