JPS62126362U - - Google Patents
Info
- Publication number
- JPS62126362U JPS62126362U JP16943986U JP16943986U JPS62126362U JP S62126362 U JPS62126362 U JP S62126362U JP 16943986 U JP16943986 U JP 16943986U JP 16943986 U JP16943986 U JP 16943986U JP S62126362 U JPS62126362 U JP S62126362U
- Authority
- JP
- Japan
- Prior art keywords
- support stand
- workpiece
- gas
- chamber
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims 4
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986169439U JPH0111721Y2 (enrdf_load_stackoverflow) | 1986-11-04 | 1986-11-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986169439U JPH0111721Y2 (enrdf_load_stackoverflow) | 1986-11-04 | 1986-11-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62126362U true JPS62126362U (enrdf_load_stackoverflow) | 1987-08-11 |
| JPH0111721Y2 JPH0111721Y2 (enrdf_load_stackoverflow) | 1989-04-06 |
Family
ID=31103250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986169439U Expired JPH0111721Y2 (enrdf_load_stackoverflow) | 1986-11-04 | 1986-11-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0111721Y2 (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006274390A (ja) * | 2005-03-30 | 2006-10-12 | Yamaguchi Prefecture | ＳｉＮｘＯｙＣｚ膜及び薄膜の成膜方法 |
| JP2012152732A (ja) * | 2011-01-26 | 2012-08-16 | 秉豊 ▲頼▼ | プラズマ反応方法及びプラズマ反応装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53144891A (en) * | 1977-05-25 | 1978-12-16 | Nippon Telegr & Teleph Corp <Ntt> | Method and apparatus for production of inorganic compound |
| JPS5488016U (enrdf_load_stackoverflow) * | 1977-11-30 | 1979-06-21 |
-
1986
- 1986-11-04 JP JP1986169439U patent/JPH0111721Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53144891A (en) * | 1977-05-25 | 1978-12-16 | Nippon Telegr & Teleph Corp <Ntt> | Method and apparatus for production of inorganic compound |
| JPS5488016U (enrdf_load_stackoverflow) * | 1977-11-30 | 1979-06-21 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006274390A (ja) * | 2005-03-30 | 2006-10-12 | Yamaguchi Prefecture | ＳｉＮｘＯｙＣｚ膜及び薄膜の成膜方法 |
| JP2012152732A (ja) * | 2011-01-26 | 2012-08-16 | 秉豊 ▲頼▼ | プラズマ反応方法及びプラズマ反応装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0111721Y2 (enrdf_load_stackoverflow) | 1989-04-06 |