JPS53144891A - Method and apparatus for production of inorganic compound - Google Patents
Method and apparatus for production of inorganic compoundInfo
- Publication number
- JPS53144891A JPS53144891A JP5988277A JP5988277A JPS53144891A JP S53144891 A JPS53144891 A JP S53144891A JP 5988277 A JP5988277 A JP 5988277A JP 5988277 A JP5988277 A JP 5988277A JP S53144891 A JPS53144891 A JP S53144891A
- Authority
- JP
- Japan
- Prior art keywords
- production
- inorganic compound
- cpds
- inorg
- cpd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
Abstract
PURPOSE:To obtain thin film of an inorg. cpd. which is difficult to be formed because of its high m.p. and high hardness, by forming plasma through application of high frequency wave to two kinds or more of cpds. or elements which are fed as gas or vapor, and by irradiation of a substrate with electrons having high kinetic energy.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5988277A JPS53144891A (en) | 1977-05-25 | 1977-05-25 | Method and apparatus for production of inorganic compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5988277A JPS53144891A (en) | 1977-05-25 | 1977-05-25 | Method and apparatus for production of inorganic compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53144891A true JPS53144891A (en) | 1978-12-16 |
JPS5538425B2 JPS5538425B2 (en) | 1980-10-03 |
Family
ID=13125948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5988277A Granted JPS53144891A (en) | 1977-05-25 | 1977-05-25 | Method and apparatus for production of inorganic compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53144891A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5773175A (en) * | 1980-10-23 | 1982-05-07 | Kobe Steel Ltd | Chemical vapor deposition device |
EP0095384A2 (en) * | 1982-05-26 | 1983-11-30 | Konica Corporation | Vacuum deposition apparatus |
JPS61194809A (en) * | 1985-02-25 | 1986-08-29 | Toshiba Corp | Thin film forming apparatus |
JPS62126362U (en) * | 1986-11-04 | 1987-08-11 | ||
US4704339A (en) * | 1982-10-12 | 1987-11-03 | The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland | Infra-red transparent optical components |
WO1990010728A1 (en) * | 1989-03-06 | 1990-09-20 | Osaka Gas Company Limited | Method of producing thin film |
CN113213579A (en) * | 2021-05-25 | 2021-08-06 | 贵州省材料产业技术研究院 | Application of photocatalytic biochar composite material in catalytic degradation of printing and dyeing wastewater |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61154101A (en) * | 1984-12-27 | 1986-07-12 | 松下電器産業株式会社 | Lead mounting of electronic component |
-
1977
- 1977-05-25 JP JP5988277A patent/JPS53144891A/en active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5773175A (en) * | 1980-10-23 | 1982-05-07 | Kobe Steel Ltd | Chemical vapor deposition device |
EP0095384A2 (en) * | 1982-05-26 | 1983-11-30 | Konica Corporation | Vacuum deposition apparatus |
US4704339A (en) * | 1982-10-12 | 1987-11-03 | The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland | Infra-red transparent optical components |
JPS61194809A (en) * | 1985-02-25 | 1986-08-29 | Toshiba Corp | Thin film forming apparatus |
JPS62126362U (en) * | 1986-11-04 | 1987-08-11 | ||
JPH0111721Y2 (en) * | 1986-11-04 | 1989-04-06 | ||
WO1990010728A1 (en) * | 1989-03-06 | 1990-09-20 | Osaka Gas Company Limited | Method of producing thin film |
CN113213579A (en) * | 2021-05-25 | 2021-08-06 | 贵州省材料产业技术研究院 | Application of photocatalytic biochar composite material in catalytic degradation of printing and dyeing wastewater |
Also Published As
Publication number | Publication date |
---|---|
JPS5538425B2 (en) | 1980-10-03 |
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