JPS53144891A - Method and apparatus for production of inorganic compound - Google Patents
Method and apparatus for production of inorganic compoundInfo
- Publication number
- JPS53144891A JPS53144891A JP5988277A JP5988277A JPS53144891A JP S53144891 A JPS53144891 A JP S53144891A JP 5988277 A JP5988277 A JP 5988277A JP 5988277 A JP5988277 A JP 5988277A JP S53144891 A JPS53144891 A JP S53144891A
- Authority
- JP
- Japan
- Prior art keywords
- production
- inorganic compound
- cpds
- inorg
- cpd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5988277A JPS53144891A (en) | 1977-05-25 | 1977-05-25 | Method and apparatus for production of inorganic compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5988277A JPS53144891A (en) | 1977-05-25 | 1977-05-25 | Method and apparatus for production of inorganic compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53144891A true JPS53144891A (en) | 1978-12-16 |
JPS5538425B2 JPS5538425B2 (ja) | 1980-10-03 |
Family
ID=13125948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5988277A Granted JPS53144891A (en) | 1977-05-25 | 1977-05-25 | Method and apparatus for production of inorganic compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53144891A (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5773175A (en) * | 1980-10-23 | 1982-05-07 | Kobe Steel Ltd | Chemical vapor deposition device |
EP0095384A2 (en) * | 1982-05-26 | 1983-11-30 | Konica Corporation | Vacuum deposition apparatus |
JPS61194809A (ja) * | 1985-02-25 | 1986-08-29 | Toshiba Corp | 薄膜形成方法 |
JPS62126362U (ja) * | 1986-11-04 | 1987-08-11 | ||
US4704339A (en) * | 1982-10-12 | 1987-11-03 | The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland | Infra-red transparent optical components |
WO1990010728A1 (en) * | 1989-03-06 | 1990-09-20 | Osaka Gas Company Limited | Method of producing thin film |
CN113213579A (zh) * | 2021-05-25 | 2021-08-06 | 贵州省材料产业技术研究院 | 一种光催化生物炭复合材料在催化降解印染废水中的应用 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61154101A (ja) * | 1984-12-27 | 1986-07-12 | 松下電器産業株式会社 | 電子部品のリ−ド取付方法 |
-
1977
- 1977-05-25 JP JP5988277A patent/JPS53144891A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5773175A (en) * | 1980-10-23 | 1982-05-07 | Kobe Steel Ltd | Chemical vapor deposition device |
EP0095384A2 (en) * | 1982-05-26 | 1983-11-30 | Konica Corporation | Vacuum deposition apparatus |
US4704339A (en) * | 1982-10-12 | 1987-11-03 | The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland | Infra-red transparent optical components |
JPS61194809A (ja) * | 1985-02-25 | 1986-08-29 | Toshiba Corp | 薄膜形成方法 |
JPS62126362U (ja) * | 1986-11-04 | 1987-08-11 | ||
JPH0111721Y2 (ja) * | 1986-11-04 | 1989-04-06 | ||
WO1990010728A1 (en) * | 1989-03-06 | 1990-09-20 | Osaka Gas Company Limited | Method of producing thin film |
CN113213579A (zh) * | 2021-05-25 | 2021-08-06 | 贵州省材料产业技术研究院 | 一种光催化生物炭复合材料在催化降解印染废水中的应用 |
Also Published As
Publication number | Publication date |
---|---|
JPS5538425B2 (ja) | 1980-10-03 |
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