JPS51117984A - Ionization plating apparatus - Google Patents
Ionization plating apparatusInfo
- Publication number
- JPS51117984A JPS51117984A JP4395875A JP4395875A JPS51117984A JP S51117984 A JPS51117984 A JP S51117984A JP 4395875 A JP4395875 A JP 4395875A JP 4395875 A JP4395875 A JP 4395875A JP S51117984 A JPS51117984 A JP S51117984A
- Authority
- JP
- Japan
- Prior art keywords
- plating apparatus
- high frequency
- ionization plating
- ionization
- aim
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Abstract
PURPOSE:To aim a rational utilization of the high frequency generator by lowering the initiation voltage of the high frequency glow for the high frequency ionization plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4395875A JPS51117984A (en) | 1975-04-10 | 1975-04-10 | Ionization plating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4395875A JPS51117984A (en) | 1975-04-10 | 1975-04-10 | Ionization plating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51117984A true JPS51117984A (en) | 1976-10-16 |
Family
ID=12678202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4395875A Pending JPS51117984A (en) | 1975-04-10 | 1975-04-10 | Ionization plating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51117984A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5385173A (en) * | 1976-12-31 | 1978-07-27 | Youichi Murayama | High vacuum ion implanting method |
JPS55110126A (en) * | 1979-02-16 | 1980-08-25 | Seiko Epson Corp | Preparation of antireflection film |
JPS5842771A (en) * | 1981-09-07 | 1983-03-12 | Sumitomo Electric Ind Ltd | Ion planting device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4954235A (en) * | 1972-09-27 | 1974-05-27 | ||
JPS49113733A (en) * | 1973-03-05 | 1974-10-30 | ||
JPS50152985A (en) * | 1974-05-31 | 1975-12-09 |
-
1975
- 1975-04-10 JP JP4395875A patent/JPS51117984A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4954235A (en) * | 1972-09-27 | 1974-05-27 | ||
JPS49113733A (en) * | 1973-03-05 | 1974-10-30 | ||
JPS50152985A (en) * | 1974-05-31 | 1975-12-09 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5385173A (en) * | 1976-12-31 | 1978-07-27 | Youichi Murayama | High vacuum ion implanting method |
JPS55110126A (en) * | 1979-02-16 | 1980-08-25 | Seiko Epson Corp | Preparation of antireflection film |
JPS6149387B2 (en) * | 1979-02-16 | 1986-10-29 | Suwa Seikosha Kk | |
JPS5842771A (en) * | 1981-09-07 | 1983-03-12 | Sumitomo Electric Ind Ltd | Ion planting device |
JPS6352108B2 (en) * | 1981-09-07 | 1988-10-18 | Sumitomo Electric Industries |
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