JPS61183965U - - Google Patents
Info
- Publication number
- JPS61183965U JPS61183965U JP6506286U JP6506286U JPS61183965U JP S61183965 U JPS61183965 U JP S61183965U JP 6506286 U JP6506286 U JP 6506286U JP 6506286 U JP6506286 U JP 6506286U JP S61183965 U JPS61183965 U JP S61183965U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- discharge device
- discharge
- space
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986065062U JPH0243867Y2 (enrdf_load_stackoverflow) | 1986-05-01 | 1986-05-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986065062U JPH0243867Y2 (enrdf_load_stackoverflow) | 1986-05-01 | 1986-05-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61183965U true JPS61183965U (enrdf_load_stackoverflow) | 1986-11-17 |
| JPH0243867Y2 JPH0243867Y2 (enrdf_load_stackoverflow) | 1990-11-21 |
Family
ID=30596712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986065062U Expired JPH0243867Y2 (enrdf_load_stackoverflow) | 1986-05-01 | 1986-05-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0243867Y2 (enrdf_load_stackoverflow) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52104476A (en) * | 1976-03-01 | 1977-09-01 | Hitachi Ltd | Ion spattering apparatus |
| JPS56152973A (en) * | 1980-04-30 | 1981-11-26 | Tokuda Seisakusho Ltd | Sputter etching device |
-
1986
- 1986-05-01 JP JP1986065062U patent/JPH0243867Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52104476A (en) * | 1976-03-01 | 1977-09-01 | Hitachi Ltd | Ion spattering apparatus |
| JPS56152973A (en) * | 1980-04-30 | 1981-11-26 | Tokuda Seisakusho Ltd | Sputter etching device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0243867Y2 (enrdf_load_stackoverflow) | 1990-11-21 |
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