JPS61183470A - 電子ビ−ムデポジシヨン装置 - Google Patents
電子ビ−ムデポジシヨン装置Info
- Publication number
- JPS61183470A JPS61183470A JP2363585A JP2363585A JPS61183470A JP S61183470 A JPS61183470 A JP S61183470A JP 2363585 A JP2363585 A JP 2363585A JP 2363585 A JP2363585 A JP 2363585A JP S61183470 A JPS61183470 A JP S61183470A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- thin film
- substrate
- deposition
- irradiating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000313 electron-beam-induced deposition Methods 0.000 title claims abstract description 10
- 238000010894 electron beam technology Methods 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 33
- 239000010409 thin film Substances 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 9
- 230000001678 irradiating effect Effects 0.000 claims abstract description 7
- 239000000470 constituent Substances 0.000 claims description 7
- 238000000151 deposition Methods 0.000 abstract description 27
- 230000008021 deposition Effects 0.000 abstract description 25
- 238000011156 evaluation Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 21
- 239000010408 film Substances 0.000 description 7
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2363585A JPS61183470A (ja) | 1985-02-12 | 1985-02-12 | 電子ビ−ムデポジシヨン装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2363585A JPS61183470A (ja) | 1985-02-12 | 1985-02-12 | 電子ビ−ムデポジシヨン装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61183470A true JPS61183470A (ja) | 1986-08-16 |
| JPH0547636B2 JPH0547636B2 (enrdf_load_stackoverflow) | 1993-07-19 |
Family
ID=12116035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2363585A Granted JPS61183470A (ja) | 1985-02-12 | 1985-02-12 | 電子ビ−ムデポジシヨン装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61183470A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5413663A (en) * | 1992-06-11 | 1995-05-09 | Tokyo Electron Limited | Plasma processing apparatus |
| US7515133B2 (en) | 2003-07-14 | 2009-04-07 | Denso Corporation | Onboard display device |
-
1985
- 1985-02-12 JP JP2363585A patent/JPS61183470A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5413663A (en) * | 1992-06-11 | 1995-05-09 | Tokyo Electron Limited | Plasma processing apparatus |
| US7515133B2 (en) | 2003-07-14 | 2009-04-07 | Denso Corporation | Onboard display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0547636B2 (enrdf_load_stackoverflow) | 1993-07-19 |
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