DE3851122T2 - Maskenkorrektur. - Google Patents

Maskenkorrektur.

Info

Publication number
DE3851122T2
DE3851122T2 DE19883851122 DE3851122T DE3851122T2 DE 3851122 T2 DE3851122 T2 DE 3851122T2 DE 19883851122 DE19883851122 DE 19883851122 DE 3851122 T DE3851122 T DE 3851122T DE 3851122 T2 DE3851122 T2 DE 3851122T2
Authority
DE
Germany
Prior art keywords
mask correction
mask
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE19883851122
Other languages
English (en)
Other versions
DE3851122D1 (de
Inventor
Lloyd Richard Harriott
Michael Joseph Robert Vasile
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Application granted granted Critical
Publication of DE3851122D1 publication Critical patent/DE3851122D1/de
Publication of DE3851122T2 publication Critical patent/DE3851122T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
DE19883851122 1987-11-09 1988-11-03 Maskenkorrektur. Expired - Fee Related DE3851122T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11850887A 1987-11-09 1987-11-09

Publications (2)

Publication Number Publication Date
DE3851122D1 DE3851122D1 (de) 1994-09-22
DE3851122T2 true DE3851122T2 (de) 1994-12-01

Family

ID=22379035

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19883851122 Expired - Fee Related DE3851122T2 (de) 1987-11-09 1988-11-03 Maskenkorrektur.

Country Status (4)

Country Link
EP (1) EP0316111B1 (de)
JP (1) JPH01150139A (de)
CA (1) CA1322684C (de)
DE (1) DE3851122T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368753B1 (en) 1999-08-27 2002-04-09 Agere Systems Guardian Corp. Mask repair
CA2437454A1 (en) 2001-02-01 2002-08-22 Creatv Microtech, Inc. Anti-scatter grids and collimator designs, and their motion, fabrication and assembly
US7922923B2 (en) 2001-02-01 2011-04-12 Creatv Microtech, Inc. Anti-scatter grid and collimator designs, and their motion, fabrication and assembly

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6085525A (ja) * 1983-10-18 1985-05-15 Seiko Instr & Electronics Ltd マスクリペア−方法
JPS6094728A (ja) * 1983-10-27 1985-05-27 Seiko Instr & Electronics Ltd 荷電粒子ビームを用いた加工方法およびその装置
JPS60182726A (ja) * 1984-02-29 1985-09-18 Seiko Instr & Electronics Ltd パタ−ン膜形成方法
JPS60218844A (ja) * 1984-04-13 1985-11-01 Seiko Instr & Electronics Ltd パタ−ン膜形成装置
JPS60218884A (ja) * 1984-04-16 1985-11-01 Canon Inc フオトセンサおよびその製造方法
JPS61110140A (ja) * 1984-11-05 1986-05-28 Seiko Instr & Electronics Ltd マスクリペア装置
WO1986000426A1 (en) * 1984-06-26 1986-01-16 Seiko Instruments & Electronics Ltd. Mask repairing apparatus
EP0198908A4 (de) * 1984-10-26 1987-03-02 Ion Beam Systems Inc Veränderung eines substrats durch einen fokussierten strahl.
JPS61123841A (ja) * 1984-11-20 1986-06-11 Seiko Instr & Electronics Ltd イオンビ−ムマスクリペア−装置
JP2543680B2 (ja) * 1985-10-02 1996-10-16 セイコー電子工業株式会社 マスクリペア装置
JPS62220956A (ja) * 1986-03-24 1987-09-29 Hitachi Ltd パタ−ン作成方法および装置

Also Published As

Publication number Publication date
EP0316111A3 (en) 1989-09-27
CA1322684C (en) 1993-10-05
JPH01150139A (ja) 1989-06-13
EP0316111A2 (de) 1989-05-17
EP0316111B1 (de) 1994-08-17
DE3851122D1 (de) 1994-09-22

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: BLUMBACH, KRAMER & PARTNER, 65193 WIESBADEN

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee