JPS61180235A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS61180235A
JPS61180235A JP60021044A JP2104485A JPS61180235A JP S61180235 A JPS61180235 A JP S61180235A JP 60021044 A JP60021044 A JP 60021044A JP 2104485 A JP2104485 A JP 2104485A JP S61180235 A JPS61180235 A JP S61180235A
Authority
JP
Japan
Prior art keywords
layer
dyed
sensitizer
polymer
dye
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60021044A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0535422B2 (enExample
Inventor
Konoe Miura
三浦 近衛
Tameichi Ochiai
落合 為一
Mika Shinozaki
篠崎 美香
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP60021044A priority Critical patent/JPS61180235A/ja
Publication of JPS61180235A publication Critical patent/JPS61180235A/ja
Publication of JPH0535422B2 publication Critical patent/JPH0535422B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Filters (AREA)
JP60021044A 1985-02-06 1985-02-06 感光性組成物 Granted JPS61180235A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60021044A JPS61180235A (ja) 1985-02-06 1985-02-06 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60021044A JPS61180235A (ja) 1985-02-06 1985-02-06 感光性組成物

Publications (2)

Publication Number Publication Date
JPS61180235A true JPS61180235A (ja) 1986-08-12
JPH0535422B2 JPH0535422B2 (enExample) 1993-05-26

Family

ID=12043930

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60021044A Granted JPS61180235A (ja) 1985-02-06 1985-02-06 感光性組成物

Country Status (1)

Country Link
JP (1) JPS61180235A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS626254A (ja) * 1985-07-02 1987-01-13 Mitsubishi Chem Ind Ltd 感光性組成物
JPS63295614A (ja) * 1987-05-28 1988-12-02 Tokyo Ohka Kogyo Co Ltd カラーフィルター形成用有機ガラス組成物およびカラーフィルター形成用有機ガラス層を形成する方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156941A (en) * 1979-05-24 1980-12-06 Tokyo Ohka Kogyo Co Ltd Micropattern forming method
JPS5764229A (en) * 1980-10-06 1982-04-19 Tatatomi Nishikubo Self-sensitizig type photosensitive material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156941A (en) * 1979-05-24 1980-12-06 Tokyo Ohka Kogyo Co Ltd Micropattern forming method
JPS5764229A (en) * 1980-10-06 1982-04-19 Tatatomi Nishikubo Self-sensitizig type photosensitive material

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS626254A (ja) * 1985-07-02 1987-01-13 Mitsubishi Chem Ind Ltd 感光性組成物
JPS63295614A (ja) * 1987-05-28 1988-12-02 Tokyo Ohka Kogyo Co Ltd カラーフィルター形成用有機ガラス組成物およびカラーフィルター形成用有機ガラス層を形成する方法
DE3818101A1 (de) * 1987-05-28 1988-12-15 Tokyo Ohka Kogyo Co Ltd Gegen anfaerbung resistenter isolierfilm hoher qualitaet zur herstellung eines farbfilters fuer ein festkoerper-bildaufnahmeelement sowie eine loesung zur herstellung des isolierfilms und ein diesen isolierfilm enthaltender farbfilter
US4983020A (en) * 1987-05-28 1991-01-08 Tokyo Ohka Kogyo Co., Ltd. Dyeing resistant insulation film of high quality for a color filter for use in a solid-state image pickup element

Also Published As

Publication number Publication date
JPH0535422B2 (enExample) 1993-05-26

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