JPS61173941U - - Google Patents
Info
- Publication number
- JPS61173941U JPS61173941U JP5544085U JP5544085U JPS61173941U JP S61173941 U JPS61173941 U JP S61173941U JP 5544085 U JP5544085 U JP 5544085U JP 5544085 U JP5544085 U JP 5544085U JP S61173941 U JPS61173941 U JP S61173941U
- Authority
- JP
- Japan
- Prior art keywords
- head
- mask substrate
- resist
- resist coating
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Coating Apparatus (AREA)
Description
第１図はこの考案の実施例を示すレジスト塗布
装置の概略図、第２図はヘツドベースの拡大平面
図、第３図は従来のレジスト塗布装置の概略図、
第４図はヘツドベースの拡大平面図である。
１…ヘツドベース、３…マスク基板、４…Ｏリ
ング、７…レジスト跳返り物。
FIG. 1 is a schematic diagram of a resist coating device showing an embodiment of this invention, FIG. 2 is an enlarged plan view of a head base, and FIG. 3 is a schematic diagram of a conventional resist coating device.
FIG. 4 is an enlarged plan view of the head base. 1...Head base, 3...Mask substrate, 4...O ring, 7...Resist rebound object.
Claims (1)
ツドを回転駆動する駆動装置と、前記マスク基板
上にレジストを供給するレジスト供給装置を具備
したレジスト塗布装置において、前記マスク基板
を載置固定するヘツドがマスク基板より大きく、
ヘツド上面周辺部にマスク基板をバキユーム保持
するＯリングを設けたことを特徴とするフオトマ
スク用レジスト塗布装置。 (2) ヘツドおよびＯリングの形状が角形である
ことを特徴とする実用新案登録請求の範囲第１項
記載のフオトマスク用レジスト塗布装置。[Claims for Utility Model Registration] (1) A resist coating device comprising a head for mounting and supporting a mask substrate, a drive device for rotationally driving the head, and a resist supply device for supplying resist onto the mask substrate. , the head for mounting and fixing the mask substrate is larger than the mask substrate;
A resist coating device for a photomask, characterized in that an O-ring for vacuum-holding a mask substrate is provided at the periphery of the upper surface of the head. (2) The photomask resist coating apparatus according to claim 1, wherein the head and the O-ring have a rectangular shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5544085U JPS61173941U (en) | 1985-04-16 | 1985-04-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5544085U JPS61173941U (en) | 1985-04-16 | 1985-04-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61173941U true JPS61173941U (en) | 1986-10-29 |
Family
ID=30578117
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5544085U Pending JPS61173941U (en) | 1985-04-16 | 1985-04-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61173941U (en) |
-
1985
- 1985-04-16 JP JP5544085U patent/JPS61173941U/ja active Pending
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