JPH0373428U

JPH0373428U -

Info

Publication number: JPH0373428U
Application number: JP13505389U
Authority: JP
Priority date: 1989-11-20
Filing date: 1989-11-20
Publication date: 1991-07-24

Description

[Brief explanation of drawings]

第１図ａとｂは本考案の露光装置に装備される
キヤリブレータの一実施例を示す側断面図と平面
図、第２図は本考案による露光装置の構造上の特
徴を示す要部側断面図、第３図は基板の基本構成
を示す模式的側断面図、第４図は露光装置の従来
構成を示す要部側断面図、第５図ａとｂとｃとｄ
は基板の露光工程を説明するための模式的側断面
図である。図において、１は基板、２はフオトレジスト、
３は盛り上がり部、５と１０はキヤリブレータ、
６はマスクホルダ、７はフオトマスク、８は基板
保持部、８ａは凸部（球形の凸部）、９は昇降台
、９ａは凹部（凸部８ａ対応に形成された凹部）
、１５は突起部、２０は光線、Ｇは露光ギヤツプ
、Ｋは基準面、ｈは盛り上がり部の高さ、Ｈは突
起部１５の高さ、をそれぞれ示す。 Figures 1a and b are side sectional views and plan views showing one embodiment of the calibrator installed in the exposure apparatus of the present invention, and Figure 2 is a side sectional view of essential parts showing the structural features of the exposure apparatus of the present invention. Figure 3 is a schematic side sectional view showing the basic configuration of the substrate, Figure 4 is a side sectional view of main parts showing the conventional configuration of the exposure apparatus, and Figures 5 a, b, c, and d.
FIG. 2 is a schematic side sectional view for explaining a substrate exposure process. In the figure, 1 is a substrate, 2 is a photoresist,
3 is the raised part, 5 and 10 are the calibrators,
6 is a mask holder, 7 is a photomask, 8 is a substrate holding part, 8a is a convex part (spherical convex part), 9 is a lifting platform, 9a is a concave part (a concave part formed to correspond to the convex part 8a)
, 15 is the protrusion, 20 is the light beam, G is the exposure gap, K is the reference plane, h is the height of the raised part, and H is the height of the protrusion 15, respectively.

Claims

[Scope of claim for utility model registration] Photo mask 7 equipped with a mask holder 6
, a substrate holder 8 that holds the substrate 1 coated with the photoresist 2; a lifting table 9 that holds the substrate holder 8 and moves in the vertical direction; The exposure apparatus is equipped with a calibrator 10 that forms a predetermined exposure gap G between the substrates 1 placed on the substrate 1, the exposure gap G being formed on a side of the calibrator 10 facing the substrate 1. An exposure apparatus characterized in that a protrusion 15 is formed for correcting.