JPH0312245U - - Google Patents
Info
- Publication number
- JPH0312245U JPH0312245U JP7241789U JP7241789U JPH0312245U JP H0312245 U JPH0312245 U JP H0312245U JP 7241789 U JP7241789 U JP 7241789U JP 7241789 U JP7241789 U JP 7241789U JP H0312245 U JPH0312245 U JP H0312245U
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- frame
- pellicle membrane
- membrane
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012528 membrane Substances 0.000 claims description 4
- 239000000428 dust Substances 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 1
- 229910001285 shape-memory alloy Inorganic materials 0.000 description 1
Description
第１図ａは、本考案による上部からの平面図、
同図ｂはその上部縦断面の一部であり、同図ｃ，
ｄ，ｅおよびｆはｂの実施例拡大図で、ｆは枠に
形状記憶合金を用いた例を示す図、第２図は、ペ
リクルの従来の模型的な構造図である。
１……ペリクル膜、２……フレーム、３……溝
、４……枠、５……接着剤、６……粘着材、７…
…フオトマスク（レチクル）。
FIG. 1a is a plan view from above according to the present invention;
Figure b is a part of the upper vertical section, Figure c,
d, e, and f are enlarged views of an embodiment of b, f is a view showing an example in which a shape memory alloy is used for the frame, and FIG. 2 is a schematic structural view of a conventional pellicle. DESCRIPTION OF SYMBOLS 1... Pellicle membrane, 2... Frame, 3... Groove, 4... Frame, 5... Adhesive, 6... Adhesive material, 7...
...Photomask (reticle).
Claims (1)
時のゴミよけカバーとして用いられるペリクルに
おいて、ペリクル膜の周縁部を固定するフレーム
に固定部溝を設け、該溝にペリクル膜上から嵌合
部材を嵌合して、ペリクル膜を前記フレームに固
定したことを特徴とするペリクル。 In a pellicle used as a dust cover during exposure in the lithography process of semiconductor manufacturing, a fixing groove is provided in the frame that fixes the peripheral edge of the pellicle membrane, and a fitting member is fitted into the groove from above the pellicle membrane. A pellicle, characterized in that a pellicle membrane is fixed to the frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7241789U JPH0312245U (en) | 1989-06-22 | 1989-06-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7241789U JPH0312245U (en) | 1989-06-22 | 1989-06-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0312245U true JPH0312245U (en) | 1991-02-07 |
Family
ID=31610332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7241789U Pending JPH0312245U (en) | 1989-06-22 | 1989-06-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0312245U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012058400A (en) * | 2010-09-07 | 2012-03-22 | Asahi Kasei E-Materials Corp | Manufacturing method of pellicle |
| JP2013195852A (en) * | 2012-03-21 | 2013-09-30 | Asahi Kasei E-Materials Corp | Method of manufacturing pellicle, and pellicle |
-
1989
- 1989-06-22 JP JP7241789U patent/JPH0312245U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012058400A (en) * | 2010-09-07 | 2012-03-22 | Asahi Kasei E-Materials Corp | Manufacturing method of pellicle |
| JP2013195852A (en) * | 2012-03-21 | 2013-09-30 | Asahi Kasei E-Materials Corp | Method of manufacturing pellicle, and pellicle |