JPH0342153U - - Google Patents

Info

Publication number
JPH0342153U
JPH0342153U JP10281789U JP10281789U JPH0342153U JP H0342153 U JPH0342153 U JP H0342153U JP 10281789 U JP10281789 U JP 10281789U JP 10281789 U JP10281789 U JP 10281789U JP H0342153 U JPH0342153 U JP H0342153U
Authority
JP
Japan
Prior art keywords
support frame
pellicle
attached
mask
supports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10281789U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10281789U priority Critical patent/JPH0342153U/ja
Publication of JPH0342153U publication Critical patent/JPH0342153U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は一実施例を示す端面図、第２図は同実
施例の支持枠部分を示す拡大端面図、第３図は他
の実施例における支持枠部分の端面図、第４図は
ペリクルを示す外観斜視図、第５図は従来のペリ
クルを示す端面図である。 ２ａ……第２の支持枠、２ｂ……第１の支持枠
、４……ペリクル膜、６……粘着剤、１０ａ，１
０ｂ……突条。 Fig. 1 is an end view showing one embodiment, Fig. 2 is an enlarged end view showing the support frame portion of the same embodiment, Fig. 3 is an end view of the support frame portion in another embodiment, and Fig. 4 is a pellicle. FIG. 5 is an end view showing a conventional pellicle. 2a... Second support frame, 2b... First support frame, 4... Pellicle membrane, 6... Adhesive, 10a, 1
0b...Protrusion.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体製造方法の露光工程で用いられるマスク
に貼りつけられるペリクルにおいて、ペリクル膜
を支持する支持枠が、マスクに貼りつけられる第
１の支持枠と、ペリクルが貼りつけられた第２の
支持枠とからなり、第１の支持枠と第２の支持枠
は着脱可能に組み合わされているペリクル。 In a pellicle that is attached to a mask used in the exposure process of a semiconductor manufacturing method, the support frame that supports the pellicle film includes a first support frame that is attached to the mask, and a second support frame that has the pellicle attached to it. A pellicle consisting of a first support frame and a second support frame that are removably combined.
JP10281789U 1989-08-31 1989-08-31 Pending JPH0342153U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10281789U JPH0342153U (en) 1989-08-31 1989-08-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10281789U JPH0342153U (en) 1989-08-31 1989-08-31

Publications (1)

Publication Number Publication Date
JPH0342153U true JPH0342153U (en) 1991-04-22

Family

ID=31651692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10281789U Pending JPH0342153U (en) 1989-08-31 1989-08-31

Country Status (1)

Country Link
JP (1) JPH0342153U (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007047238A (en) * 2005-08-08 2007-02-22 Shin Etsu Polymer Co Ltd Housing container for pellicle
JP2009083539A (en) * 2007-09-27 2009-04-23 Land Walker Ltd Rear-wheel drive four-wheel bicycle
JP2011209344A (en) * 2010-03-29 2011-10-20 Shin-Etsu Chemical Co Ltd Pellicle, mounting method therefor, pellicle-equipped mask, and mask
JP2014228868A (en) * 2013-05-21 2014-12-08 上海和輝光電有限公司Ｅｖｅｒｄｉｓｐｌａｙ Ｏｐｔｒｏｎｉｃｓ （Ｓｈａｎｇｈａｉ） Ｌｉｍｉｔｅｄ Pellicle frame, photomask and method of attaching the pellicle frame
WO2016043292A1 (en) * 2014-09-19 2016-03-24 三井化学株式会社 Pellicle, production method thereof, exposure method
WO2016043301A1 (en) * 2014-09-19 2016-03-24 三井化学株式会社 Pellicle, pellicle production method and exposure method using pellicle
JP2017534077A (en) * 2014-11-17 2017-11-16 エーエスエムエル ネザーランズ ビー．ブイ． Mask assembly
WO2018003603A1 (en) * 2016-06-28 2018-01-04 三井化学株式会社 Pellicle film, pellicle frame body, pellicle, and method for manufacturing pellicle
JP2018194841A (en) * 2017-05-15 2018-12-06 アイメック・ヴェーゼットウェーＩｍｅｃ Ｖｚｗ Lithographic reticle system

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007047238A (en) * 2005-08-08 2007-02-22 Shin Etsu Polymer Co Ltd Housing container for pellicle
JP2009083539A (en) * 2007-09-27 2009-04-23 Land Walker Ltd Rear-wheel drive four-wheel bicycle
JP2011209344A (en) * 2010-03-29 2011-10-20 Shin-Etsu Chemical Co Ltd Pellicle, mounting method therefor, pellicle-equipped mask, and mask
JP2014228868A (en) * 2013-05-21 2014-12-08 上海和輝光電有限公司Ｅｖｅｒｄｉｓｐｌａｙ Ｏｐｔｒｏｎｉｃｓ （Ｓｈａｎｇｈａｉ） Ｌｉｍｉｔｅｄ Pellicle frame, photomask and method of attaching the pellicle frame
US10488751B2 (en) * 2014-09-19 2019-11-26 Mitsui Chemicals, Inc. Pellicle, production method thereof, exposure method
WO2016043292A1 (en) * 2014-09-19 2016-03-24 三井化学株式会社 Pellicle, production method thereof, exposure method
JPWO2016043301A1 (en) * 2014-09-19 2017-06-29 三井化学株式会社 Pellicle, pellicle manufacturing method, and exposure method using pellicle
JPWO2016043292A1 (en) * 2014-09-19 2017-06-29 三井化学株式会社 Pellicle, manufacturing method thereof and exposure method
TWI693467B (en) * 2014-09-19 2020-05-11 日商三井化學股份有限公司 Dustproof film and its manufacturing method and exposure method
WO2016043301A1 (en) * 2014-09-19 2016-03-24 三井化学株式会社 Pellicle, pellicle production method and exposure method using pellicle
US10558129B2 (en) 2014-11-17 2020-02-11 Asml Netherlands B.V. Mask assembly
US10539886B2 (en) 2014-11-17 2020-01-21 Asml Netherlands B.V. Pellicle attachment apparatus
JP2017534077A (en) * 2014-11-17 2017-11-16 エーエスエムエル ネザーランズ ビー．ブイ． Mask assembly
US10969701B2 (en) 2014-11-17 2021-04-06 Asml Netherlands B.V. Pellicle attachment apparatus
US11003098B2 (en) 2014-11-17 2021-05-11 Asml Netherlands B.V Pellicle attachment apparatus
US11009803B2 (en) 2014-11-17 2021-05-18 Asml Netherlands B.V. Mask assembly
JPWO2018003603A1 (en) * 2016-06-28 2019-03-28 三井化学株式会社 Pellicle film, pellicle frame, pellicle, and manufacturing method thereof
WO2018003603A1 (en) * 2016-06-28 2018-01-04 三井化学株式会社 Pellicle film, pellicle frame body, pellicle, and method for manufacturing pellicle
JP2018194841A (en) * 2017-05-15 2018-12-06 アイメック・ヴェーゼットウェーＩｍｅｃ Ｖｚｗ Lithographic reticle system

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