JPS62158449U - - Google Patents
Info
- Publication number
- JPS62158449U JPS62158449U JP1986047300U JP4730086U JPS62158449U JP S62158449 U JPS62158449 U JP S62158449U JP 1986047300 U JP1986047300 U JP 1986047300U JP 4730086 U JP4730086 U JP 4730086U JP S62158449 U JPS62158449 U JP S62158449U
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- marks
- pattern
- projection exposure
- reduction projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 1
Description
第１図ないし第５図は本考案の一実施例を示す
図で、第１図ａはレテイクルの平面図、同図ｂは
レテイクル支持台の平面図、第２図は縮小投影露
光装置の構成図、第３図および第４図はレテイク
ルの位置合せ角度と形成されるパターンとの関係
を示す平面図、第５図は形成可能なパターンを示
す平面図、第６図は本考案の他の実施例により形
成可能なパターンを示す平面図、第７図は本考案
の他の実施例を示すレテイクルおよびレテイクル
支持台の平面図、第８図および第９図は従来例を
示す平面図である。
１ａ，１ｂ…レテイクル、３ａ，３ｂ…レテイ
クル支持台、５…被転写基板、１１…ガラス基板
、１２…遮光性膜、１３ａ〜１３ｄ，１４ａ〜１
４ｄ，１５ａ〜１５ｆ…位置合せ用マーク、３１
，３２，３４，３５…マーク。
1 to 5 are views showing an embodiment of the present invention, in which FIG. 1a is a plan view of a reticle, FIG. 1b is a plan view of a reticle support, and FIG. 2 is a configuration of a reduction projection exposure apparatus. 3 and 4 are plan views showing the relationship between the alignment angle of the reticle and the pattern to be formed, FIG. 5 is a plan view showing patterns that can be formed, and FIG. FIG. 7 is a plan view showing a reticle and a reticle support base showing another embodiment of the present invention, and FIGS. 8 and 9 are plan views showing a conventional example. . 1a, 1b... Reticle, 3a, 3b... Reticle support base, 5... Transferred substrate, 11... Glass substrate, 12... Light shielding film, 13a to 13d, 14a to 1
4d, 15a to 15f...alignment mark, 31
, 32, 34, 35...mark.
Claims (1)
上記パターンを被転写物に転写するためのレテイ
クルにおいて、縮小投影露光装置のレテイクル支
持台上に設けた１組のマークをそれぞれに対応す
る位置合せ用マークを、上記パターンのまわりに
相互に角度θ（θ〓〓 〓０°）だけ回転させて
複数組配置したことを特徴とするレテイクル。 In a reticle that has a predetermined pattern and is used to transfer the pattern onto an object by a reduction projection exposure method, a set of marks provided on the reticle support of the reduction projection exposure apparatus is used for positioning the respective marks. A reticle characterized in that a plurality of sets of marks are arranged around the pattern by rotating each other by an angle θ (θ〓〓 〓0°).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986047300U JPH0132045Y2 (en) | 1986-03-31 | 1986-03-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986047300U JPH0132045Y2 (en) | 1986-03-31 | 1986-03-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62158449U true JPS62158449U (en) | 1987-10-08 |
| JPH0132045Y2 JPH0132045Y2 (en) | 1989-10-02 |
Family
ID=30867775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986047300U Expired JPH0132045Y2 (en) | 1986-03-31 | 1986-03-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0132045Y2 (en) |
-
1986
- 1986-03-31 JP JP1986047300U patent/JPH0132045Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0132045Y2 (en) | 1989-10-02 |
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