JPS6398544U - - Google Patents

Info

Publication number
JPS6398544U
JPS6398544U JP1986192663U JP19266386U JPS6398544U JP S6398544 U JPS6398544 U JP S6398544U JP 1986192663 U JP1986192663 U JP 1986192663U JP 19266386 U JP19266386 U JP 19266386U JP S6398544 U JPS6398544 U JP S6398544U
Authority
JP
Japan
Prior art keywords
automatic alignment
alignment marks
shielding
patterns
positions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1986192663U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986192663U priority Critical patent/JPS6398544U/ja
Publication of JPS6398544U publication Critical patent/JPS6398544U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例のレチクルを示し、
aはその平面図、bはその使用方法の一例におけ
る平面図、第2図は従来の自動位置合わせマーク
を含むレチクルの平面図、第3図はその使用方法
の一例における平面図である。 1:レチクル、31,32,41,42:自動
位置合わせマーク、5:X方向レチクルブライン
ド、6:Y方向レチクルブラインド。
FIG. 1 shows a reticle according to an embodiment of the present invention,
FIG. 2 is a plan view of a reticle including a conventional automatic alignment mark, and FIG. 3 is a plan view of an example of its usage. 1: Reticle, 31, 32, 41, 42: Automatic alignment mark, 5: X-direction reticle blind, 6: Y-direction reticle blind.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 複数種類の露光装置用の自動位置合わせマーク
のパターンを他の自動位置合わせマークを遮光し
て選択的に半導体基板上に転写できる位置に備え
たことを特徴とするレチクル。
A reticle characterized in that patterns of automatic alignment marks for multiple types of exposure devices are provided at positions where they can be selectively transferred onto a semiconductor substrate while shielding other automatic alignment marks from light.
JP1986192663U 1986-12-15 1986-12-15 Pending JPS6398544U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986192663U JPS6398544U (en) 1986-12-15 1986-12-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986192663U JPS6398544U (en) 1986-12-15 1986-12-15

Publications (1)

Publication Number Publication Date
JPS6398544U true JPS6398544U (en) 1988-06-25

Family

ID=31147958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986192663U Pending JPS6398544U (en) 1986-12-15 1986-12-15

Country Status (1)

Country Link
JP (1) JPS6398544U (en)

Similar Documents

Publication Publication Date Title
JPS6398544U (en)
JPH0398447U (en)
JPS62158449U (en)
JPS58419U (en) reticle
JPS6088338U (en) photo mask
JPS6449841U (en)
JPS62204324U (en)
JPH0171437U (en)
JPH0169238U (en)
JPH0479358U (en)
JPH0334231U (en)
JPS59109349U (en) photomask substrate
JPH0173848U (en)
JPS6341156U (en)
JPH025754U (en)
JPS60189044U (en) photomask
JPS63200109U (en)
JPS5932893B2 (en) Mask alignment method using special reference marks
JPS62167252U (en)
JPH0247649U (en)
JPS6287338U (en)
JPS60154959U (en) photo mask pattern
JPS6098845U (en) Two hole photo mask
JPS6296642U (en)
JPS6336033U (en)