JPS61166039A - 誘電体絶縁分離基板 - Google Patents

誘電体絶縁分離基板

Info

Publication number
JPS61166039A
JPS61166039A JP20652785A JP20652785A JPS61166039A JP S61166039 A JPS61166039 A JP S61166039A JP 20652785 A JP20652785 A JP 20652785A JP 20652785 A JP20652785 A JP 20652785A JP S61166039 A JPS61166039 A JP S61166039A
Authority
JP
Japan
Prior art keywords
silicon
silicon polycrystalline
oxide film
layers
silicon oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20652785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0342698B2 (enrdf_load_stackoverflow
Inventor
Junichiro Horiuchi
堀内　潤一郎
Hideyuki Yagi
秀幸 八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP20652785A priority Critical patent/JPS61166039A/ja
Publication of JPS61166039A publication Critical patent/JPS61166039A/ja
Publication of JPH0342698B2 publication Critical patent/JPH0342698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
JP20652785A 1985-09-20 1985-09-20 誘電体絶縁分離基板 Granted JPS61166039A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20652785A JPS61166039A (ja) 1985-09-20 1985-09-20 誘電体絶縁分離基板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20652785A JPS61166039A (ja) 1985-09-20 1985-09-20 誘電体絶縁分離基板

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP4436579A Division JPS55138229A (en) 1979-04-13 1979-04-13 Manufacture of dielectric material for insulation- separation substrate

Publications (2)

Publication Number Publication Date
JPS61166039A true JPS61166039A (ja) 1986-07-26
JPH0342698B2 JPH0342698B2 (enrdf_load_stackoverflow) 1991-06-28

Family

ID=16524837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20652785A Granted JPS61166039A (ja) 1985-09-20 1985-09-20 誘電体絶縁分離基板

Country Status (1)

Country Link
JP (1) JPS61166039A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51131280A (en) * 1975-05-12 1976-11-15 Hitachi Ltd Dielectric insulation separation base manufacturing process

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51131280A (en) * 1975-05-12 1976-11-15 Hitachi Ltd Dielectric insulation separation base manufacturing process

Also Published As

Publication number Publication date
JPH0342698B2 (enrdf_load_stackoverflow) 1991-06-28

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