JPS6116285B2 - - Google Patents

Info

Publication number
JPS6116285B2
JPS6116285B2 JP56179097A JP17909781A JPS6116285B2 JP S6116285 B2 JPS6116285 B2 JP S6116285B2 JP 56179097 A JP56179097 A JP 56179097A JP 17909781 A JP17909781 A JP 17909781A JP S6116285 B2 JPS6116285 B2 JP S6116285B2
Authority
JP
Japan
Prior art keywords
plasma
polymer
silicon
aromatic
phenylsilane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56179097A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57117531A (en
Inventor
Hooraa Aiban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS57117531A publication Critical patent/JPS57117531A/ja
Publication of JPS6116285B2 publication Critical patent/JPS6116285B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/284—Applying non-metallic protective coatings for encapsulating mounted components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
JP17909781A 1980-12-31 1981-11-10 Aromatic polymer Granted JPS57117531A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22160580A 1980-12-31 1980-12-31

Publications (2)

Publication Number Publication Date
JPS57117531A JPS57117531A (en) 1982-07-22
JPS6116285B2 true JPS6116285B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-04-30

Family

ID=22828508

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17909781A Granted JPS57117531A (en) 1980-12-31 1981-11-10 Aromatic polymer

Country Status (3)

Country Link
EP (1) EP0055800B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS57117531A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3169573D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0593072A (ja) * 1991-10-01 1993-04-16 Hitachi Ltd ポリシラン及びその合成方法
JP2655821B2 (ja) * 1994-11-16 1997-09-24 工業技術院長 一方向電気伝導性ケイ素系プラズマ重合膜及びその製造方法
US5804487A (en) * 1996-07-10 1998-09-08 Trw Inc. Method of fabricating high βHBT devices
JP4540961B2 (ja) * 2003-10-10 2010-09-08 Ａｚエレクトロニックマテリアルズ株式会社 エッチングストッパー層形成用組成物
CN107001820A (zh) * 2014-10-21 2017-08-01 奥雷尔科技有限公司 用于在基底上形成图案化的金属膜的组合物
CN115400930A (zh) * 2021-05-26 2022-11-29 江苏菲沃泰纳米科技股份有限公司 一种等离子体聚合涂层、制备方法及器件

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1077787A (en) * 1975-11-21 1980-05-20 National Aeronautics And Space Administration Abrasion resistant coatings for plastic surfaces
US4054680A (en) * 1976-06-28 1977-10-18 General Electric Company Method of fabricating improved capacitors and transformers
JPS538669A (en) * 1976-07-13 1978-01-26 Kogyo Gijutsuin Method of prevention of dissolving of additive agents contained in polyvinyl chloride resin
JPS5356177A (en) * 1976-11-02 1978-05-22 Asahi Glass Co Ltd Forming method for anti-foggig film on transparent body
US4096315A (en) * 1976-12-15 1978-06-20 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Process for producing a well-adhered durable optical coating on an optical plastic substrate

Also Published As

Publication number Publication date
JPS57117531A (en) 1982-07-22
EP0055800B1 (en) 1985-03-27
EP0055800A3 (en) 1983-01-26
DE3169573D1 (en) 1985-05-02
EP0055800A2 (en) 1982-07-14

Similar Documents

Publication Publication Date Title
US4397722A (en) Polymers from aromatic silanes and process for their preparation
KR950007667B1 (ko) 무정형 탄화규소를 함유하는 피막을 형성시키는 방법
JP3726226B2 (ja) 絶縁膜及びその製造方法
US5447799A (en) Polymerization process
KR100250421B1 (ko) 저온 플라스마 공정을 이용한 금형의 이형성 향상 방법
KR100298100B1 (ko) 층간절연도포막형성용의 폴리실라잔계 도포액 및 이를 이용한 이산화규소계 층간절연도포막의 형성방법
JP3476876B2 (ja) ケイ素及び酸素含有被覆の堆積方法
Li et al. Fourier transform infrared spectroscopy study of molecular structure formation in thin films during hexamethyldisiloxane decomposition in low pressure rf discharge
JPS6116285B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
López et al. Substrate temperature effects on film chemistry in plasma depositions of organics. II. Polymerizable precursors
Baxamusa et al. Photo‐oxidation of polymers synthesized by plasma and initiated CVD
US5061514A (en) Chemical vapor deposition (CVD) process for plasma depositing silicon carbide films onto a substrate
US5053255A (en) Chemical vapor deposition (CVD) process for the thermally depositing silicon carbide films onto a substrate
Sachdev et al. Characterization of plasma-deposited organosilicon thin films
JPH10242137A (ja) 基材上に不溶性コーティングを形成する方法
JP2850834B2 (ja) 非晶質炭素膜の製造方法及び半導体装置
JPS63221840A (ja) 非晶質水素化炭素膜の製造方法
Sahli et al. Growth, composition and structure of plasma-deposited siloxane and silazane
Enlow et al. Plasma polymerized ferrocene films
Chowdhury et al. An investigation of the optical properties of plasma-polymerized diphenyl thin films
Chen et al. Fabrication and characterization of fluorine-containing films using plasma polymerization of octafluorotoluene
Hays A mass spectrometric investigation of the plasma polymerization of methyltrimethoxysilane in an rf discharge
Haller Polymerization of aromatic silanes in rf plasmas
Sahli et al. Properties of plasma-polysiloxane deposited by PECVD
FR2512434A1 (fr) Depot d'email sur des objets en verre