JPS61140942A - リソグラフイ−用マスク構造体 - Google Patents

リソグラフイ−用マスク構造体

Info

Publication number
JPS61140942A
JPS61140942A JP59261838A JP26183884A JPS61140942A JP S61140942 A JPS61140942 A JP S61140942A JP 59261838 A JP59261838 A JP 59261838A JP 26183884 A JP26183884 A JP 26183884A JP S61140942 A JPS61140942 A JP S61140942A
Authority
JP
Japan
Prior art keywords
mask
lithography
holder
ray
aluminum nitride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59261838A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0481856B2 (enrdf_load_stackoverflow
Inventor
Keiko Matsuda
啓子 松田
Hideo Kato
日出夫 加藤
Hirofumi Shibata
浩文 柴田
Masaaki Matsushima
正明 松島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59261838A priority Critical patent/JPS61140942A/ja
Priority to US06/794,180 priority patent/US4677042A/en
Priority to DE19853539201 priority patent/DE3539201A1/de
Publication of JPS61140942A publication Critical patent/JPS61140942A/ja
Publication of JPH0481856B2 publication Critical patent/JPH0481856B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59261838A 1984-11-05 1984-12-13 リソグラフイ−用マスク構造体 Granted JPS61140942A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59261838A JPS61140942A (ja) 1984-12-13 1984-12-13 リソグラフイ−用マスク構造体
US06/794,180 US4677042A (en) 1984-11-05 1985-11-01 Mask structure for lithography, method for preparation thereof and lithographic method
DE19853539201 DE3539201A1 (de) 1984-11-05 1985-11-05 Maskenstruktur fuer die lithografie, verfahren zu ihrer herstellung und lithografieverfahren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59261838A JPS61140942A (ja) 1984-12-13 1984-12-13 リソグラフイ−用マスク構造体

Publications (2)

Publication Number Publication Date
JPS61140942A true JPS61140942A (ja) 1986-06-28
JPH0481856B2 JPH0481856B2 (enrdf_load_stackoverflow) 1992-12-25

Family

ID=17367442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59261838A Granted JPS61140942A (ja) 1984-11-05 1984-12-13 リソグラフイ−用マスク構造体

Country Status (1)

Country Link
JP (1) JPS61140942A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6249623A (ja) * 1985-07-19 1987-03-04 Nec Corp Ｘ線露光マスク
JPH01304396A (ja) * 1988-05-31 1989-12-07 Nissin Electric Co Ltd Ｘ線露光用マスク素材の製造方法
JPH0316116A (ja) * 1989-03-09 1991-01-24 Canon Inc Ｘ線リソグラフィー用マスク構造体及びそれを用いたｘ線露光方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6249623A (ja) * 1985-07-19 1987-03-04 Nec Corp Ｘ線露光マスク
JPH01304396A (ja) * 1988-05-31 1989-12-07 Nissin Electric Co Ltd Ｘ線露光用マスク素材の製造方法
JPH0316116A (ja) * 1989-03-09 1991-01-24 Canon Inc Ｘ線リソグラフィー用マスク構造体及びそれを用いたｘ線露光方法

Also Published As

Publication number Publication date
JPH0481856B2 (enrdf_load_stackoverflow) 1992-12-25

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