JPS61140104A - 薄膜抵抗装置の製造方法 - Google Patents
薄膜抵抗装置の製造方法Info
- Publication number
- JPS61140104A JPS61140104A JP59263357A JP26335784A JPS61140104A JP S61140104 A JPS61140104 A JP S61140104A JP 59263357 A JP59263357 A JP 59263357A JP 26335784 A JP26335784 A JP 26335784A JP S61140104 A JPS61140104 A JP S61140104A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film resistor
- manufacture
- melting point
- point metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000002844 melting Methods 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000010408 film Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910001069 Ti alloy Inorganic materials 0.000 claims 1
- 229910001080 W alloy Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59263357A JPS61140104A (ja) | 1984-12-13 | 1984-12-13 | 薄膜抵抗装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59263357A JPS61140104A (ja) | 1984-12-13 | 1984-12-13 | 薄膜抵抗装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61140104A true JPS61140104A (ja) | 1986-06-27 |
| JPH0133923B2 JPH0133923B2 (enrdf_load_stackoverflow) | 1989-07-17 |
Family
ID=17388357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59263357A Granted JPS61140104A (ja) | 1984-12-13 | 1984-12-13 | 薄膜抵抗装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61140104A (enrdf_load_stackoverflow) |
-
1984
- 1984-12-13 JP JP59263357A patent/JPS61140104A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0133923B2 (enrdf_load_stackoverflow) | 1989-07-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6329961A (ja) | 薄膜受動回路の製造方法とその方法によって製造される薄膜受動回路 | |
| US4870033A (en) | Method of manufacturing a multilayer electrode containing silicide for a semiconductor device | |
| JP3312752B2 (ja) | 薄膜サーミスタ | |
| JPS61140104A (ja) | 薄膜抵抗装置の製造方法 | |
| JP2615608B2 (ja) | 半導体装置の製造方法 | |
| JP2848694B2 (ja) | 半導体装置 | |
| JPH02172261A (ja) | 半導体装置の製造方法 | |
| JPH03101233A (ja) | 電極構造及びその製造方法 | |
| JPS5833833A (ja) | 半導体装置の電極形成法 | |
| JPS6151918A (ja) | 半導体装置の製造方法 | |
| JPS60186030A (ja) | ボンデイング方法 | |
| JPH01268150A (ja) | 半導体装置 | |
| JPS60105263A (ja) | 半導体装置 | |
| JP2803188B2 (ja) | 半導体装置の製造方法および半導体装置 | |
| JPH01255235A (ja) | 半導体装置 | |
| JPH0311736A (ja) | 集積回路の配線電極 | |
| JPS61295629A (ja) | コンタクトホ−ルへのバリアメタルの形成方法 | |
| JPH0442537A (ja) | 半導体装置及びその製造方法 | |
| JPS59213165A (ja) | 半導体装置 | |
| JPS5812441Y2 (ja) | 半導体装置電極構造 | |
| JPS60103668A (ja) | 半導体装置 | |
| JPS5821338A (ja) | 半導体装置の製造方法 | |
| JPH0342823A (ja) | 半導体装置とその製造方法 | |
| JPS5835986A (ja) | シヨツトキバリアダイオ−ドおよびその製造法 | |
| JPH0114709B2 (enrdf_load_stackoverflow) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |