JPS6111223Y2 - - Google Patents

Info

Publication number
JPS6111223Y2
JPS6111223Y2 JP1981029563U JP2956381U JPS6111223Y2 JP S6111223 Y2 JPS6111223 Y2 JP S6111223Y2 JP 1981029563 U JP1981029563 U JP 1981029563U JP 2956381 U JP2956381 U JP 2956381U JP S6111223 Y2 JPS6111223 Y2 JP S6111223Y2
Authority
JP
Japan
Prior art keywords
vapor deposition
mask
deposition mask
evaporation
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1981029563U
Other languages
English (en)
Japanese (ja)
Other versions
JPS57143265U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1981029563U priority Critical patent/JPS6111223Y2/ja
Publication of JPS57143265U publication Critical patent/JPS57143265U/ja
Application granted granted Critical
Publication of JPS6111223Y2 publication Critical patent/JPS6111223Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1981029563U 1981-03-02 1981-03-02 Expired JPS6111223Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1981029563U JPS6111223Y2 (enrdf_load_stackoverflow) 1981-03-02 1981-03-02

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1981029563U JPS6111223Y2 (enrdf_load_stackoverflow) 1981-03-02 1981-03-02

Publications (2)

Publication Number Publication Date
JPS57143265U JPS57143265U (enrdf_load_stackoverflow) 1982-09-08
JPS6111223Y2 true JPS6111223Y2 (enrdf_load_stackoverflow) 1986-04-09

Family

ID=29827139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1981029563U Expired JPS6111223Y2 (enrdf_load_stackoverflow) 1981-03-02 1981-03-02

Country Status (1)

Country Link
JP (1) JPS6111223Y2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6142393B2 (ja) * 2013-09-09 2017-06-07 株式会社ブイ・テクノロジー 成膜マスク、成膜装置及び成膜方法並びにタッチパネル基板

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5514869B2 (enrdf_load_stackoverflow) * 1972-05-01 1980-04-19
JPS5219533B2 (enrdf_load_stackoverflow) * 1972-07-26 1977-05-28
JPS5441159U (enrdf_load_stackoverflow) * 1977-08-26 1979-03-19
JPS5511185A (en) * 1978-07-11 1980-01-25 Mitsubishi Electric Corp Mask jig

Also Published As

Publication number Publication date
JPS57143265U (enrdf_load_stackoverflow) 1982-09-08

Similar Documents

Publication Publication Date Title
US4676193A (en) Stabilized mask assembly for direct deposition of a thin film pattern onto a substrate
KR100276779B1 (ko) 집적회로 제조시 재료를 증착시키는 개선된 방법
US7005782B2 (en) Charged particle beam extraction and formation apparatus
EP0297521B1 (en) High temperature heating sputtering process
JP3333605B2 (ja) 低熱膨張クランプ機構
US5154797A (en) Silicon shadow mask
JPH0375628B2 (enrdf_load_stackoverflow)
CN108385058B (zh) 掩膜板和掩膜板的制造方法
JPS6111223Y2 (enrdf_load_stackoverflow)
JPH0522377B2 (enrdf_load_stackoverflow)
JPH0927454A (ja) 選択蒸着用マスク
JPH06108241A (ja) スパッタリング装置
JPS63118062A (ja) スパツタリング方法
JP2513136Y2 (ja) イオン注入装置
Ohta et al. Focused ion beam lithography using Al2O3 as a resist for fabrication of x‐ray masks
JPH0723535B2 (ja) 複合膜形成装置
JPH04303537A (ja) シャドーマスクのアンチドーミング材の蒸着方法
JPS6033566A (ja) 電子写真用感光体基体
JPH0717148Y2 (ja) 基板装置
JPS5829559Y2 (ja) Ｘ線取り出し窓
JP2001323364A (ja) 真空マスク蒸着装置及び真空マスク蒸着方法
JPS5970774A (ja) 蒸着装置
JPS6083323A (ja) 基板冷却法
JP2557566B2 (ja) 露光用マスクの製造方法
JPS5937494B2 (ja) 薄膜のパタ−ン形成法