JPS61110428A - 半導体焼付装置 - Google Patents

半導体焼付装置

Info

Publication number
JPS61110428A
JPS61110428A JP59230355A JP23035584A JPS61110428A JP S61110428 A JPS61110428 A JP S61110428A JP 59230355 A JP59230355 A JP 59230355A JP 23035584 A JP23035584 A JP 23035584A JP S61110428 A JPS61110428 A JP S61110428A
Authority
JP
Japan
Prior art keywords
alignment
manual
mask
wafer
ttl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59230355A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0560252B2 (enExample
Inventor
Tadashi Konuki
小貫　忠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59230355A priority Critical patent/JPS61110428A/ja
Publication of JPS61110428A publication Critical patent/JPS61110428A/ja
Publication of JPH0560252B2 publication Critical patent/JPH0560252B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59230355A 1984-11-02 1984-11-02 半導体焼付装置 Granted JPS61110428A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59230355A JPS61110428A (ja) 1984-11-02 1984-11-02 半導体焼付装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59230355A JPS61110428A (ja) 1984-11-02 1984-11-02 半導体焼付装置

Publications (2)

Publication Number Publication Date
JPS61110428A true JPS61110428A (ja) 1986-05-28
JPH0560252B2 JPH0560252B2 (enExample) 1993-09-01

Family

ID=16906558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59230355A Granted JPS61110428A (ja) 1984-11-02 1984-11-02 半導体焼付装置

Country Status (1)

Country Link
JP (1) JPS61110428A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947709A (en) * 1987-11-04 1990-08-14 Kubota, Ltd. Propeller shaft transmission structure for a tractor
JPH02270317A (ja) * 1989-04-12 1990-11-05 Canon Inc 半導体露光装置
JPH05172191A (ja) * 1991-12-19 1993-07-09 Mitsubishi Motors Corp スライディングギア
CN109870885A (zh) * 2017-12-05 2019-06-11 山东华光光电子股份有限公司 一种手动光刻机的预对准方法及预对准装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101830A (ja) * 1982-12-01 1984-06-12 Canon Inc 転写装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101830A (ja) * 1982-12-01 1984-06-12 Canon Inc 転写装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947709A (en) * 1987-11-04 1990-08-14 Kubota, Ltd. Propeller shaft transmission structure for a tractor
JPH02270317A (ja) * 1989-04-12 1990-11-05 Canon Inc 半導体露光装置
JPH05172191A (ja) * 1991-12-19 1993-07-09 Mitsubishi Motors Corp スライディングギア
CN109870885A (zh) * 2017-12-05 2019-06-11 山东华光光电子股份有限公司 一种手动光刻机的预对准方法及预对准装置

Also Published As

Publication number Publication date
JPH0560252B2 (enExample) 1993-09-01

Similar Documents

Publication Publication Date Title
JPS61143820A (ja) 自動精密位置合せシステム
KR101368167B1 (ko) 리페어 장치 및 리페어 방법
JPH0327043B2 (enExample)
JPS59101830A (ja) 転写装置
JP2011257303A (ja) 画像取得装置、欠陥修正装置および画像取得方法
JP2013091068A (ja) リペア装置、およびリペア方法
KR20090024076A (ko) 레이저 가공 장치
JPS61110428A (ja) 半導体焼付装置
JP3316676B2 (ja) ワークとマスクの整合機構および整合方法
JP3646716B2 (ja) 光変調装置の位置調整装置および光変調装置の位置調整方法
JP2000155430A (ja) 両面露光装置における自動アライメント方法
JP2869826B2 (ja) 半導体製造方法
JPH02290040A (ja) アライメントシステム
JP3450752B2 (ja) 矩形ビーム用マスクアライメント方法
JPH08213310A (ja) 半導体露光装置および異物検出方法
US6603606B2 (en) System and methods for position-control of light modulation device
JPH1116806A (ja) プリアライメントサーチを含む位置合わせ方法
JPS62271430A (ja) ウエハ−処理方法
JPH04326507A (ja) 半導体露光方法
JP2562936B2 (ja) キーパターン自動設定手段を備えた自動精密位置合せシステム
KR100778138B1 (ko) 평판디스플레이 패널의 검사 장치
JP2005021916A (ja) 欠陥修正機能付き顕微鏡装置
JPS61204716A (ja) キーパターン自動設定手段を備えた自動精密位置合せ装置
JPH06244078A (ja) 露光装置
JP2000088525A (ja) アライメント検出方法

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term