JPS61108628A - 低級アルキルポリシルセスキオキサンの製法 - Google Patents

低級アルキルポリシルセスキオキサンの製法

Info

Publication number
JPS61108628A
JPS61108628A JP59228885A JP22888584A JPS61108628A JP S61108628 A JPS61108628 A JP S61108628A JP 59228885 A JP59228885 A JP 59228885A JP 22888584 A JP22888584 A JP 22888584A JP S61108628 A JPS61108628 A JP S61108628A
Authority
JP
Japan
Prior art keywords
water
prepolymer
molecular weight
organic
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59228885A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6216212B2 (enExample
Inventor
Shunichi Fukuyama
俊一 福山
Yasuhiro Yoneda
泰博 米田
Masashi Miyagawa
昌士 宮川
Kota Nishii
耕太 西井
Azuma Matsuura
東 松浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59228885A priority Critical patent/JPS61108628A/ja
Priority to US06/790,615 priority patent/US4670299A/en
Priority to KR1019850007985A priority patent/KR880000853B1/ko
Priority to EP19850307905 priority patent/EP0198976B1/en
Priority to EP19900114892 priority patent/EP0406911B1/en
Priority to DE90114892T priority patent/DE3587442T2/de
Priority to DE8585307905T priority patent/DE3587041T2/de
Publication of JPS61108628A publication Critical patent/JPS61108628A/ja
Publication of JPS6216212B2 publication Critical patent/JPS6216212B2/ja
Priority to KR1019870014659A priority patent/KR900005894B1/ko
Priority to US07/281,926 priority patent/US4988514A/en
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Polymers (AREA)
JP59228885A 1984-11-01 1984-11-01 低級アルキルポリシルセスキオキサンの製法 Granted JPS61108628A (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP59228885A JPS61108628A (ja) 1984-11-01 1984-11-01 低級アルキルポリシルセスキオキサンの製法
US06/790,615 US4670299A (en) 1984-11-01 1985-10-23 Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board
KR1019850007985A KR880000853B1 (ko) 1984-11-01 1985-10-29 저급알킬 폴리실세스퀴옥산의 제조방법
DE90114892T DE3587442T2 (de) 1984-11-01 1985-10-31 Verfahren zur Herstellung von Polysilsesquioxanen.
EP19900114892 EP0406911B1 (en) 1984-11-01 1985-10-31 Process for preparation of polysilsesquioxane
EP19850307905 EP0198976B1 (en) 1984-11-01 1985-10-31 Process for formation of insulating layer of silylated polysilsesquioxane on electronic circuit board
DE8585307905T DE3587041T2 (de) 1984-11-01 1985-10-31 Verfahren zur herstellung von isolatorschichten aus silylierten polysilsesquioxanen auf elektronischen gedruckten schaltung.
KR1019870014659A KR900005894B1 (ko) 1984-11-01 1987-12-21 표면이 평평한 절연층의 형성방법
US07/281,926 US4988514A (en) 1984-11-01 1988-12-02 Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59228885A JPS61108628A (ja) 1984-11-01 1984-11-01 低級アルキルポリシルセスキオキサンの製法

Publications (2)

Publication Number Publication Date
JPS61108628A true JPS61108628A (ja) 1986-05-27
JPS6216212B2 JPS6216212B2 (enExample) 1987-04-11

Family

ID=16883382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59228885A Granted JPS61108628A (ja) 1984-11-01 1984-11-01 低級アルキルポリシルセスキオキサンの製法

Country Status (1)

Country Link
JP (1) JPS61108628A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6377940A (ja) * 1986-09-19 1988-04-08 Toshiba Silicone Co Ltd 真球状ポリメチルシルセスキオキサン粉末およびその製造方法
US5565540A (en) * 1992-07-29 1996-10-15 Dow Corning Toray Silicon Co., Ltd. Method for the preparation of SiOH-containing organosiloxane oligomer
US6342562B1 (en) 1999-04-23 2002-01-29 Fujitsu Limited Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
KR100361334B1 (ko) * 2000-06-08 2002-11-18 차국헌 폴리알킬실세스퀴옥세인의 분자량 및 말단기의 조절방법
US6787625B2 (en) 2000-02-17 2004-09-07 Intersilicone Ltd. Polyorganosilsesquioxane and process for preparing the same
JP2009068019A (ja) * 2008-11-26 2009-04-02 Takemoto Oil & Fat Co Ltd 球状シルセスキオキサン微粒子及び高分子材料用表面改質剤
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01137334U (enExample) * 1988-03-14 1989-09-20

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5388099A (en) * 1977-01-14 1978-08-03 Japan Synthetic Rubber Co Ltd Methylpolysiloxane

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5388099A (en) * 1977-01-14 1978-08-03 Japan Synthetic Rubber Co Ltd Methylpolysiloxane

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6377940A (ja) * 1986-09-19 1988-04-08 Toshiba Silicone Co Ltd 真球状ポリメチルシルセスキオキサン粉末およびその製造方法
US5565540A (en) * 1992-07-29 1996-10-15 Dow Corning Toray Silicon Co., Ltd. Method for the preparation of SiOH-containing organosiloxane oligomer
US6342562B1 (en) 1999-04-23 2002-01-29 Fujitsu Limited Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
US6541077B1 (en) 1999-04-23 2003-04-01 Fujitsu Limited Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
US7144968B2 (en) 1999-04-23 2006-12-05 Fujitsu Limited Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
US6787625B2 (en) 2000-02-17 2004-09-07 Intersilicone Ltd. Polyorganosilsesquioxane and process for preparing the same
KR100361334B1 (ko) * 2000-06-08 2002-11-18 차국헌 폴리알킬실세스퀴옥세인의 분자량 및 말단기의 조절방법
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2009068019A (ja) * 2008-11-26 2009-04-02 Takemoto Oil & Fat Co Ltd 球状シルセスキオキサン微粒子及び高分子材料用表面改質剤

Also Published As

Publication number Publication date
JPS6216212B2 (enExample) 1987-04-11

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