JPS61105846A - 清浄表面の形成方法 - Google Patents

清浄表面の形成方法

Info

Publication number
JPS61105846A
JPS61105846A JP59226770A JP22677084A JPS61105846A JP S61105846 A JPS61105846 A JP S61105846A JP 59226770 A JP59226770 A JP 59226770A JP 22677084 A JP22677084 A JP 22677084A JP S61105846 A JPS61105846 A JP S61105846A
Authority
JP
Japan
Prior art keywords
substrate
molecular beam
contaminants
nisi2
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59226770A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0481857B2 (cg-RX-API-DMAC7.html
Inventor
Akitoshi Ishizaka
彰利 石坂
Yasuhiro Shiraki
靖寛 白木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP59226770A priority Critical patent/JPS61105846A/ja
Publication of JPS61105846A publication Critical patent/JPS61105846A/ja
Publication of JPH0481857B2 publication Critical patent/JPH0481857B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • ing And Chemical Polishing (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP59226770A 1984-10-30 1984-10-30 清浄表面の形成方法 Granted JPS61105846A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59226770A JPS61105846A (ja) 1984-10-30 1984-10-30 清浄表面の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59226770A JPS61105846A (ja) 1984-10-30 1984-10-30 清浄表面の形成方法

Publications (2)

Publication Number Publication Date
JPS61105846A true JPS61105846A (ja) 1986-05-23
JPH0481857B2 JPH0481857B2 (cg-RX-API-DMAC7.html) 1992-12-25

Family

ID=16850335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59226770A Granted JPS61105846A (ja) 1984-10-30 1984-10-30 清浄表面の形成方法

Country Status (1)

Country Link
JP (1) JPS61105846A (cg-RX-API-DMAC7.html)

Also Published As

Publication number Publication date
JPH0481857B2 (cg-RX-API-DMAC7.html) 1992-12-25

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Legal Events

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EXPY Cancellation because of completion of term