JPS61101944A - 荷電粒子ビ−ム用集束装置 - Google Patents

荷電粒子ビ−ム用集束装置

Info

Publication number
JPS61101944A
JPS61101944A JP59222893A JP22289384A JPS61101944A JP S61101944 A JPS61101944 A JP S61101944A JP 59222893 A JP59222893 A JP 59222893A JP 22289384 A JP22289384 A JP 22289384A JP S61101944 A JPS61101944 A JP S61101944A
Authority
JP
Japan
Prior art keywords
lens
magnetic field
focus correction
focusing
charged particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59222893A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0447944B2 (enrdf_load_stackoverflow
Inventor
Hirobumi Morita
博文 森田
Teruo Hosokawa
細川　照夫
Akira Shimizu
彰 清水
Akihira Fujinami
藤波　明平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59222893A priority Critical patent/JPS61101944A/ja
Publication of JPS61101944A publication Critical patent/JPS61101944A/ja
Publication of JPH0447944B2 publication Critical patent/JPH0447944B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/145—Combinations of electrostatic and magnetic lenses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP59222893A 1984-10-25 1984-10-25 荷電粒子ビ−ム用集束装置 Granted JPS61101944A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59222893A JPS61101944A (ja) 1984-10-25 1984-10-25 荷電粒子ビ−ム用集束装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59222893A JPS61101944A (ja) 1984-10-25 1984-10-25 荷電粒子ビ−ム用集束装置

Publications (2)

Publication Number Publication Date
JPS61101944A true JPS61101944A (ja) 1986-05-20
JPH0447944B2 JPH0447944B2 (enrdf_load_stackoverflow) 1992-08-05

Family

ID=16789514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59222893A Granted JPS61101944A (ja) 1984-10-25 1984-10-25 荷電粒子ビ−ム用集束装置

Country Status (1)

Country Link
JP (1) JPS61101944A (enrdf_load_stackoverflow)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115715A (ja) * 1985-07-22 1987-05-27 Toshiba Mach Co Ltd 電子ビ−ム露光装置
JPS62219445A (ja) * 1986-03-20 1987-09-26 Jeol Ltd 電子線装置
EP0952606A1 (en) * 1998-04-24 1999-10-27 Advantest Corporation Dynamically compensated objective lens-detection device and method
EP0989583A1 (en) * 1998-09-25 2000-03-29 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method and device for focusing a charged particle beam
JP2004327439A (ja) * 2003-04-24 2004-11-18 Fei Co 永久磁気レンズおよび静電レンズを備える粒子光学装置
JP2005310778A (ja) * 2004-04-22 2005-11-04 Fei Co 永久磁石の材料を備えたレンズが設けられた粒子光学装置
JP2007095576A (ja) * 2005-09-29 2007-04-12 Horon:Kk 荷電粒子線装置および荷電粒子線フォーカス制御方法
JP2009065193A (ja) * 1997-12-19 2009-03-26 Toshiba Corp 電子ビーム描画方法及びその装置
JP2009199904A (ja) * 2008-02-22 2009-09-03 Hitachi High-Technologies Corp 収差補正器を備えた荷電粒子線装置
JP2012222223A (ja) * 2011-04-12 2012-11-12 Jeol Ltd 電子ビーム描画装置
JP2014049545A (ja) * 2012-08-30 2014-03-17 Nuflare Technology Inc 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置
JP2014521193A (ja) * 2011-06-29 2014-08-25 ケーエルエー−テンカー コーポレイション マルチコラム電子ビーム装置および方法
JP2019200983A (ja) * 2018-05-18 2019-11-21 株式会社ニューフレアテクノロジー マルチ電子ビーム照射装置、マルチ電子ビーム検査装置及びマルチ電子ビーム照射方法
US10950410B2 (en) 2018-12-04 2021-03-16 Nuflare Technology, Inc. Multiple electron beam inspection apparatus with through-hole with spiral shape
US10998164B2 (en) 2018-06-05 2021-05-04 Nuflare Technology, Inc. Charged particle beam writing apparatus and charged particle beam writing method

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115715A (ja) * 1985-07-22 1987-05-27 Toshiba Mach Co Ltd 電子ビ−ム露光装置
JPS62219445A (ja) * 1986-03-20 1987-09-26 Jeol Ltd 電子線装置
JP2009065193A (ja) * 1997-12-19 2009-03-26 Toshiba Corp 電子ビーム描画方法及びその装置
EP0952606A1 (en) * 1998-04-24 1999-10-27 Advantest Corporation Dynamically compensated objective lens-detection device and method
US6555824B1 (en) 1998-09-25 2003-04-29 Applied Materials, Inc. Method and device for focusing a charged particle beam
EP0989583A1 (en) * 1998-09-25 2000-03-29 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method and device for focusing a charged particle beam
JP2004327439A (ja) * 2003-04-24 2004-11-18 Fei Co 永久磁気レンズおよび静電レンズを備える粒子光学装置
JP2005310778A (ja) * 2004-04-22 2005-11-04 Fei Co 永久磁石の材料を備えたレンズが設けられた粒子光学装置
JP2007095576A (ja) * 2005-09-29 2007-04-12 Horon:Kk 荷電粒子線装置および荷電粒子線フォーカス制御方法
JP2009199904A (ja) * 2008-02-22 2009-09-03 Hitachi High-Technologies Corp 収差補正器を備えた荷電粒子線装置
JP2012222223A (ja) * 2011-04-12 2012-11-12 Jeol Ltd 電子ビーム描画装置
JP2014521193A (ja) * 2011-06-29 2014-08-25 ケーエルエー−テンカー コーポレイション マルチコラム電子ビーム装置および方法
JP2014049545A (ja) * 2012-08-30 2014-03-17 Nuflare Technology Inc 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置
JP2019200983A (ja) * 2018-05-18 2019-11-21 株式会社ニューフレアテクノロジー マルチ電子ビーム照射装置、マルチ電子ビーム検査装置及びマルチ電子ビーム照射方法
US10998164B2 (en) 2018-06-05 2021-05-04 Nuflare Technology, Inc. Charged particle beam writing apparatus and charged particle beam writing method
JP2023160972A (ja) * 2018-06-05 2023-11-02 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
US10950410B2 (en) 2018-12-04 2021-03-16 Nuflare Technology, Inc. Multiple electron beam inspection apparatus with through-hole with spiral shape

Also Published As

Publication number Publication date
JPH0447944B2 (enrdf_load_stackoverflow) 1992-08-05

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Legal Events

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