JPS6093305A - マスク検査方法 - Google Patents

マスク検査方法

Info

Publication number
JPS6093305A
JPS6093305A JP58201474A JP20147483A JPS6093305A JP S6093305 A JPS6093305 A JP S6093305A JP 58201474 A JP58201474 A JP 58201474A JP 20147483 A JP20147483 A JP 20147483A JP S6093305 A JPS6093305 A JP S6093305A
Authority
JP
Japan
Prior art keywords
pattern
chip area
reticle
patterns
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58201474A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0417361B2 (enrdf_load_html_response
Inventor
Atsushi Miyahara
宮原　温
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58201474A priority Critical patent/JPS6093305A/ja
Publication of JPS6093305A publication Critical patent/JPS6093305A/ja
Publication of JPH0417361B2 publication Critical patent/JPH0417361B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP58201474A 1983-10-27 1983-10-27 マスク検査方法 Granted JPS6093305A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58201474A JPS6093305A (ja) 1983-10-27 1983-10-27 マスク検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58201474A JPS6093305A (ja) 1983-10-27 1983-10-27 マスク検査方法

Publications (2)

Publication Number Publication Date
JPS6093305A true JPS6093305A (ja) 1985-05-25
JPH0417361B2 JPH0417361B2 (enrdf_load_html_response) 1992-03-25

Family

ID=16441676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58201474A Granted JPS6093305A (ja) 1983-10-27 1983-10-27 マスク検査方法

Country Status (1)

Country Link
JP (1) JPS6093305A (enrdf_load_html_response)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103630547A (zh) * 2013-11-26 2014-03-12 明基材料有限公司 具有周期性结构的光学薄膜的瑕疵检测方法及其检测装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54111774A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Inspection method of mask and its unit
JPS5574409A (en) * 1978-11-30 1980-06-05 Fujitsu Ltd Defect inspection system of repetitive pattern
JPS5734402A (en) * 1980-08-11 1982-02-24 Hitachi Ltd Inspecting method for defect in circuit pattern
JPS5796206A (en) * 1980-12-08 1982-06-15 Fujitsu Ltd Graphic inspection
JPS57130423A (en) * 1981-02-06 1982-08-12 Hitachi Ltd Apparatus for pattern inspection
JPS57187606A (en) * 1981-05-11 1982-11-18 Leitz Ernst Gmbh Method and device for automatically discovering error of flat figure
JPS58100438A (ja) * 1981-12-11 1983-06-15 Hitachi Ltd パタ−ン検査装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54111774A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Inspection method of mask and its unit
JPS5574409A (en) * 1978-11-30 1980-06-05 Fujitsu Ltd Defect inspection system of repetitive pattern
JPS5734402A (en) * 1980-08-11 1982-02-24 Hitachi Ltd Inspecting method for defect in circuit pattern
JPS5796206A (en) * 1980-12-08 1982-06-15 Fujitsu Ltd Graphic inspection
JPS57130423A (en) * 1981-02-06 1982-08-12 Hitachi Ltd Apparatus for pattern inspection
JPS57187606A (en) * 1981-05-11 1982-11-18 Leitz Ernst Gmbh Method and device for automatically discovering error of flat figure
JPS58100438A (ja) * 1981-12-11 1983-06-15 Hitachi Ltd パタ−ン検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103630547A (zh) * 2013-11-26 2014-03-12 明基材料有限公司 具有周期性结构的光学薄膜的瑕疵检测方法及其检测装置

Also Published As

Publication number Publication date
JPH0417361B2 (enrdf_load_html_response) 1992-03-25

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