JPS6086285A - 銅のドライ・エツチング法 - Google Patents

銅のドライ・エツチング法

Info

Publication number
JPS6086285A
JPS6086285A JP59122158A JP12215884A JPS6086285A JP S6086285 A JPS6086285 A JP S6086285A JP 59122158 A JP59122158 A JP 59122158A JP 12215884 A JP12215884 A JP 12215884A JP S6086285 A JPS6086285 A JP S6086285A
Authority
JP
Japan
Prior art keywords
copper
etching
etched
gas
dry etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59122158A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6140757B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
フランク・ドルシユク
ジエオルク・クラウス
ウルリツヒ・ケンゼル
ヴオルフ・デイーテル・ルウ
ロルフ・シエーフアー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS6086285A publication Critical patent/JPS6086285A/ja
Publication of JPS6140757B2 publication Critical patent/JPS6140757B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/08—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by electric discharge, e.g. by spark erosion
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
    • H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
    • H01L21/32135—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only
    • H01L21/32136—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only using plasmas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0137—Materials
    • H05K2201/0166—Polymeric layer used for special processing, e.g. resist for etching insulating material or photoresist used as a mask during plasma etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/09—Treatments involving charged particles
    • H05K2203/095—Plasma, e.g. for treating a substrate to improve adhesion with a conductor or for cleaning holes

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Materials Engineering (AREA)
  • Power Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP59122158A 1983-08-02 1984-06-15 銅のドライ・エツチング法 Granted JPS6086285A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP83107604A EP0133621B1 (de) 1983-08-02 1983-08-02 Verfahren zum Trockenätzen von Kupfer und seine Verwendung
EP83107604.7 1983-08-02

Publications (2)

Publication Number Publication Date
JPS6086285A true JPS6086285A (ja) 1985-05-15
JPS6140757B2 JPS6140757B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-09-10

Family

ID=8190613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59122158A Granted JPS6086285A (ja) 1983-08-02 1984-06-15 銅のドライ・エツチング法

Country Status (4)

Country Link
US (1) US4557796A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0133621B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS6086285A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3376186D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01308028A (ja) * 1988-06-07 1989-12-12 Fujitsu Ltd 銅もしくは銅合金電極配線の形成方法
JPH04329640A (ja) * 1991-05-01 1992-11-18 Mitsubishi Electric Corp 配線層のドライエッチング方法
JPH05171471A (ja) * 1991-12-17 1993-07-09 Nec Corp ３ｄ遷移金属を含む物質のエッチング方法

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0258698B1 (en) * 1986-09-05 1997-11-12 Hitachi, Ltd. Dry etching method
US5354416A (en) * 1986-09-05 1994-10-11 Sadayuki Okudaira Dry etching method
US4689111A (en) * 1986-10-28 1987-08-25 International Business Machines Corp. Process for promoting the interlaminate adhesion of polymeric materials to metal surfaces
US4838994A (en) * 1987-06-26 1989-06-13 Siemens Aktiengesellschaft Method for structuring a copper and/or permalloy layer by means of dry etching
US4980338A (en) * 1987-11-16 1990-12-25 Semiconductor Energy Laboratory Co., Ltd. Method of producing superconducting ceramic patterns by etching
US5318662A (en) * 1989-12-20 1994-06-07 Texas Instruments Incorporated Copper etch process using halides
US5100499A (en) * 1989-12-20 1992-03-31 Texas Instruments Incorporated Copper dry etch process using organic and amine radicals
EP0436812B1 (en) * 1989-12-20 1994-08-31 Texas Instruments Incorporated Copper etch process and printed circuit formed thereby
US5399239A (en) * 1992-12-18 1995-03-21 Ceridian Corporation Method of fabricating conductive structures on substrates
JPH06326059A (ja) * 1993-05-17 1994-11-25 Fujitsu Ltd 銅薄膜のエッチング方法
US5824604A (en) * 1996-01-23 1998-10-20 Mattson Technology, Inc. Hydrocarbon-enhanced dry stripping of photoresist
US6010603A (en) 1997-07-09 2000-01-04 Applied Materials, Inc. Patterned copper etch for micron and submicron features, using enhanced physical bombardment
US6197267B1 (en) 1997-07-25 2001-03-06 International Business Machines Corporation Catalytic reactor
US6193832B1 (en) 1997-07-25 2001-02-27 International Business Machines Corporation Method of making dielectric catalyst structures
US6130182A (en) * 1997-07-25 2000-10-10 International Business Machines Corporation Dielectric catalyst structures
WO1999009587A2 (en) * 1997-08-13 1999-02-25 Applied Materials, Inc. Method of etching copper for semiconductor devices
US6008140A (en) 1997-08-13 1999-12-28 Applied Materials, Inc. Copper etch using HCI and HBr chemistry
US6033992A (en) * 1997-08-19 2000-03-07 Micron Technology, Inc. Method for etching metals using organohalide compounds
US6379576B2 (en) 1997-11-17 2002-04-30 Mattson Technology, Inc. Systems and methods for variable mode plasma enhanced processing of semiconductor wafers
US6143476A (en) * 1997-12-12 2000-11-07 Applied Materials Inc Method for high temperature etching of patterned layers using an organic mask stack
TW505984B (en) 1997-12-12 2002-10-11 Applied Materials Inc Method of etching patterned layers useful as masking during subsequent etching or for damascene structures
KR100450128B1 (ko) * 2002-06-20 2004-09-30 동부전자 주식회사 반도체 소자의 제조 방법
US20040084407A1 (en) * 2002-10-31 2004-05-06 Nptest, Inc. Method for surface preparation to enable uniform etching of polycrystalline materials
JP4111274B2 (ja) * 2003-07-24 2008-07-02 キヤノンアネルバ株式会社 磁性材料のドライエッチング方法
US8633117B1 (en) 2012-11-07 2014-01-21 International Business Machines Corporation Sputter and surface modification etch processing for metal patterning in integrated circuits
US8871107B2 (en) 2013-03-15 2014-10-28 International Business Machines Corporation Subtractive plasma etching of a blanket layer of metal or metal alloy
JP2017033982A (ja) 2015-07-29 2017-02-09 東京エレクトロン株式会社 多層膜をエッチングする方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS529648A (en) * 1975-07-09 1977-01-25 Ibm Method of selectively ionnetching silicon
JPS5293640A (en) * 1976-02-03 1977-08-06 Mitsubishi Electric Corp Plasm etching method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4352716A (en) * 1980-12-24 1982-10-05 International Business Machines Corporation Dry etching of copper patterns
US4416725A (en) * 1982-12-30 1983-11-22 International Business Machines Corporation Copper texturing process
US4468284A (en) * 1983-07-06 1984-08-28 Psi Star, Inc. Process for etching an aluminum-copper alloy

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS529648A (en) * 1975-07-09 1977-01-25 Ibm Method of selectively ionnetching silicon
JPS5293640A (en) * 1976-02-03 1977-08-06 Mitsubishi Electric Corp Plasm etching method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01308028A (ja) * 1988-06-07 1989-12-12 Fujitsu Ltd 銅もしくは銅合金電極配線の形成方法
JPH04329640A (ja) * 1991-05-01 1992-11-18 Mitsubishi Electric Corp 配線層のドライエッチング方法
JPH05171471A (ja) * 1991-12-17 1993-07-09 Nec Corp ３ｄ遷移金属を含む物質のエッチング方法

Also Published As

Publication number Publication date
EP0133621A1 (de) 1985-03-06
JPS6140757B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-09-10
US4557796A (en) 1985-12-10
DE3376186D1 (en) 1988-05-05
EP0133621B1 (de) 1988-03-30

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