JPS6085358A - 感湿素子とその製造方法 - Google Patents
感湿素子とその製造方法Info
- Publication number
- JPS6085358A JPS6085358A JP59166288A JP16628884A JPS6085358A JP S6085358 A JPS6085358 A JP S6085358A JP 59166288 A JP59166288 A JP 59166288A JP 16628884 A JP16628884 A JP 16628884A JP S6085358 A JPS6085358 A JP S6085358A
- Authority
- JP
- Japan
- Prior art keywords
- polyvinyl alcohol
- sensitive element
- layer
- moisture
- water vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 28
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- 239000012212 insulator Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 8
- 230000005669 field effect Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000004528 spin coating Methods 0.000 claims description 6
- 238000010521 absorption reaction Methods 0.000 claims description 5
- 238000000059 patterning Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000000243 solution Substances 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
- H10D64/667—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of alloy material, compound material or organic material contacting the insulator, e.g. TiN workfunction layers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4141—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS specially adapted for gases
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Molecular Biology (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB838322418A GB8322418D0 (en) | 1983-08-19 | 1983-08-19 | Humidity sensor |
GB8322418 | 1983-08-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6085358A true JPS6085358A (ja) | 1985-05-14 |
JPH0240973B2 JPH0240973B2 (en, 2012) | 1990-09-14 |
Family
ID=10547590
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59166288A Granted JPS6085358A (ja) | 1983-08-19 | 1984-08-07 | 感湿素子とその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5004700A (en, 2012) |
JP (1) | JPS6085358A (en, 2012) |
DE (1) | DE3429115C2 (en, 2012) |
GB (2) | GB8322418D0 (en, 2012) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6339667U (en, 2012) * | 1986-09-01 | 1988-03-15 | ||
JPH0210146A (ja) * | 1988-06-28 | 1990-01-12 | Nok Corp | 感湿素子およびその動作回路 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6157847A (ja) * | 1984-08-29 | 1986-03-24 | Sharp Corp | 電界効果型湿度センサ |
US5693545A (en) * | 1996-02-28 | 1997-12-02 | Motorola, Inc. | Method for forming a semiconductor sensor FET device |
DE19828093C2 (de) * | 1998-06-24 | 2003-09-11 | Univ Dresden Tech | Einrichtung zum Messen physikalischer Größen von ein- oder mehrkomponentigen Flüssigkeiten |
US6246118B1 (en) * | 1999-02-18 | 2001-06-12 | Advanced Micro Devices, Inc. | Low dielectric semiconductor device with rigid, conductively lined interconnection system |
DE10036178A1 (de) * | 2000-07-25 | 2002-02-14 | Siemens Ag | Feuchtesensor und Verwendung |
DE10036180A1 (de) * | 2000-07-25 | 2002-02-14 | Siemens Ag | Potentialgesteuerter Gassensor |
US6724612B2 (en) | 2002-07-09 | 2004-04-20 | Honeywell International Inc. | Relative humidity sensor with integrated signal conditioning |
JP3855950B2 (ja) * | 2003-03-19 | 2006-12-13 | 株式会社デンソー | 容量式湿度センサ |
US7112304B2 (en) * | 2003-04-11 | 2006-09-26 | Therm-O-Disc, Incorporated | Robust chemiresistor sensor |
JP4438049B2 (ja) * | 2003-08-11 | 2010-03-24 | キヤノン株式会社 | 電界効果トランジスタ及びそれを用いたセンサ並びにその製造方法 |
DE102005008051A1 (de) * | 2005-02-22 | 2006-08-24 | Siemens Ag | Gassensor und Verfahren zu dessen Betrieb |
WO2006097566A1 (en) * | 2005-03-18 | 2006-09-21 | Avantone Oy | Methods and arrangements for acquiring and utilising enhanced electronic conduction in an organic thin film transistor |
KR101322354B1 (ko) * | 2011-04-07 | 2013-10-25 | 한국과학기술원 | 습도 센서, 습도 센싱 방법 및 이를 위한 트랜지스터 |
US8978452B2 (en) | 2011-08-11 | 2015-03-17 | 3M Innovative Properties Company | Wetness sensor using RF circuit with frangible link |
US9681996B2 (en) | 2011-08-11 | 2017-06-20 | 3M Innovative Properties Company | Wetness sensors |
CN104519846B (zh) * | 2012-06-15 | 2018-03-09 | It健康有限公司 | 利用了导电性纤维状导线的大小便检测传感器及检测装置 |
GB2516247A (en) | 2013-07-16 | 2015-01-21 | Nokia Corp | An apparatus and associated methods |
GB2521193A (en) * | 2013-12-12 | 2015-06-17 | Nokia Technologies Oy | Electronic apparatus and associated methods |
DE102015206631A1 (de) * | 2015-04-14 | 2016-10-20 | Robert Bosch Gmbh | Feldeffekttransistor sowie Verfahren und Steuergerät zum Betreiben eines Feldeffekttransistors |
EP3217167B1 (en) * | 2016-03-11 | 2018-05-16 | Honeywell International Inc. | Humidity sensors with transistor structures and piezoelectric layer |
EP3244201B1 (en) * | 2016-05-13 | 2021-10-27 | Honeywell International Inc. | Fet based humidity sensor with barrier layer protecting gate dielectric |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5251880A (en) * | 1975-10-22 | 1977-04-26 | Matsushita Electric Ind Co Ltd | Moisture sensitive element |
JPS5298993A (en) * | 1976-02-14 | 1977-08-19 | Sony Corp | Humidity sensitive element material |
JPS53132981A (en) * | 1977-04-25 | 1978-11-20 | Massachusetts Inst Technology | Charge flow transistor and machine using same |
JPS582731A (ja) * | 1981-06-30 | 1983-01-08 | Anritsu Corp | 感湿素子 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3715702A (en) * | 1971-06-23 | 1973-02-06 | Honeywell Inc | Relative humidity sensor |
GB1464605A (en) * | 1973-08-14 | 1977-02-16 | Nippon Sheet Glass Co Ltd | Humidity-sensitive sensor |
US3916367A (en) * | 1974-01-22 | 1975-10-28 | Honeywell Inc | Relative humidity sensor |
JPS5287381A (en) * | 1976-01-17 | 1977-07-21 | Matsushita Electric Ind Co Ltd | Humidity sensitive element |
US4273636A (en) * | 1977-05-26 | 1981-06-16 | Kiyoo Shimada | Selective chemical sensitive field effect transistor transducers |
JPS5412893A (en) * | 1977-06-30 | 1979-01-30 | Sony Corp | Dew-sensitive element material |
US4302530A (en) * | 1977-12-08 | 1981-11-24 | University Of Pennsylvania | Method for making substance-sensitive electrical structures by processing substance-sensitive photoresist material |
JPS5529774A (en) * | 1978-08-24 | 1980-03-03 | Shinei Kk | Relative humidity detector |
US4263576A (en) * | 1978-07-10 | 1981-04-21 | Murata Manufacturing Co., Ltd. | Humidity sensitive device |
EP0013022B1 (en) * | 1978-12-26 | 1984-03-28 | Matsushita Electric Industrial Co., Ltd. | Humidity detecting apparatus using a humidity detecting resistor ceramic element |
JPS5814043B2 (ja) * | 1979-06-07 | 1983-03-17 | 秩父セメント株式会社 | 湿度センサ素子 |
US4288775A (en) * | 1979-11-09 | 1981-09-08 | Bennewitz Paul F | Device and method of manufacturing a relative humidity sensor and temperature sensor |
GB2064126A (en) * | 1979-11-22 | 1981-06-10 | Philips Electronic Associated | Method of making humidity sensors |
EP0057728B1 (en) * | 1980-07-21 | 1986-05-28 | Hitachi, Ltd. | Moisture-sensitive element, moisture-sensitive material and manufacturing method for same |
DE3173119D1 (en) * | 1980-08-08 | 1986-01-16 | Toshiba Kk | Moisture sensitive element |
US4337658A (en) * | 1980-10-14 | 1982-07-06 | Honeywell Inc. | Humidity sensor |
US4464647A (en) * | 1981-02-12 | 1984-08-07 | Marcon Electronics Co. Ltd. | Humidity sensor made of metal oxide |
US4486292A (en) * | 1981-09-23 | 1984-12-04 | Critikon, Inc. | Support and anchoring mechanism for membranes in selectively responsive field effect devices |
US4514263A (en) * | 1982-01-12 | 1985-04-30 | University Of Utah | Apparatus and method for measuring the concentration of components in fluids |
US4562725A (en) * | 1982-07-31 | 1986-01-07 | Shimadzu Corporation | Moisture sensor and a process for the production thereof |
US4422129A (en) * | 1982-08-19 | 1983-12-20 | General Electric Company | Humidity sensor |
JPS59173743A (ja) * | 1983-03-23 | 1984-10-01 | Sharp Corp | 感湿素子 |
US4567221A (en) * | 1983-03-31 | 1986-01-28 | Kuraray Co., Ltd. | Water resistant compositions |
GB2138952B (en) * | 1983-04-30 | 1986-07-30 | Sharp Kk | Producing electrical moisture sensors |
JPS60239657A (ja) * | 1984-05-15 | 1985-11-28 | Sharp Corp | 感湿素子及びその製造方法 |
JPS6156952A (ja) * | 1984-08-28 | 1986-03-22 | Sharp Corp | 感湿抵抗素子 |
JPS6157847A (ja) * | 1984-08-29 | 1986-03-24 | Sharp Corp | 電界効果型湿度センサ |
US4784936A (en) * | 1985-10-24 | 1988-11-15 | General Electric Company | Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer |
CA1302675C (en) * | 1986-05-20 | 1992-06-09 | Masakazu Uekita | Thin film and device having the same |
US4943471A (en) * | 1986-05-20 | 1990-07-24 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Patterned thin film and process for preparing the same |
US4900405A (en) * | 1987-07-15 | 1990-02-13 | Sri International | Surface type microelectronic gas and vapor sensor |
-
1983
- 1983-08-19 GB GB838322418A patent/GB8322418D0/en active Pending
-
1984
- 1984-07-13 GB GB08417946A patent/GB2145282B/en not_active Expired
- 1984-08-04 DE DE3429115A patent/DE3429115C2/de not_active Expired - Fee Related
- 1984-08-07 JP JP59166288A patent/JPS6085358A/ja active Granted
-
1990
- 1990-08-01 US US07/561,377 patent/US5004700A/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5251880A (en) * | 1975-10-22 | 1977-04-26 | Matsushita Electric Ind Co Ltd | Moisture sensitive element |
JPS5298993A (en) * | 1976-02-14 | 1977-08-19 | Sony Corp | Humidity sensitive element material |
JPS53132981A (en) * | 1977-04-25 | 1978-11-20 | Massachusetts Inst Technology | Charge flow transistor and machine using same |
JPS582731A (ja) * | 1981-06-30 | 1983-01-08 | Anritsu Corp | 感湿素子 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6339667U (en, 2012) * | 1986-09-01 | 1988-03-15 | ||
JPH0210146A (ja) * | 1988-06-28 | 1990-01-12 | Nok Corp | 感湿素子およびその動作回路 |
Also Published As
Publication number | Publication date |
---|---|
DE3429115A1 (de) | 1985-03-07 |
GB2145282A (en) | 1985-03-20 |
GB2145282B (en) | 1987-05-28 |
GB8417946D0 (en) | 1984-08-15 |
DE3429115C2 (de) | 1996-02-22 |
JPH0240973B2 (en, 2012) | 1990-09-14 |
US5004700A (en) | 1991-04-02 |
GB8322418D0 (en) | 1983-09-21 |
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