JPS6079728A - 表面処理方法 - Google Patents

表面処理方法

Info

Publication number
JPS6079728A
JPS6079728A JP58188035A JP18803583A JPS6079728A JP S6079728 A JPS6079728 A JP S6079728A JP 58188035 A JP58188035 A JP 58188035A JP 18803583 A JP18803583 A JP 18803583A JP S6079728 A JPS6079728 A JP S6079728A
Authority
JP
Japan
Prior art keywords
surface treatment
target level
level
detected
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58188035A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0142628B2 (enrdf_load_stackoverflow
Inventor
Nobutoshi Ogami
大神 信敏
Masaru Kitagawa
勝 北川
Hisao Nishizawa
西沢 久雄
Masakazu Saida
斎田 政和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP58188035A priority Critical patent/JPS6079728A/ja
Priority to US06/611,420 priority patent/US4569717A/en
Publication of JPS6079728A publication Critical patent/JPS6079728A/ja
Publication of JPH0142628B2 publication Critical patent/JPH0142628B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72Repair or correction of mask defects
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
JP58188035A 1983-05-24 1983-10-06 表面処理方法 Granted JPS6079728A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58188035A JPS6079728A (ja) 1983-10-06 1983-10-06 表面処理方法
US06/611,420 US4569717A (en) 1983-05-24 1984-05-17 Method of surface treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58188035A JPS6079728A (ja) 1983-10-06 1983-10-06 表面処理方法

Publications (2)

Publication Number Publication Date
JPS6079728A true JPS6079728A (ja) 1985-05-07
JPH0142628B2 JPH0142628B2 (enrdf_load_stackoverflow) 1989-09-13

Family

ID=16216524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58188035A Granted JPS6079728A (ja) 1983-05-24 1983-10-06 表面処理方法

Country Status (1)

Country Link
JP (1) JPS6079728A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2598508A1 (fr) * 1986-05-09 1987-11-13 Guillaume Michel Procede et appareil de determination de fin d'attaque d'une surface gravee
JP2007189188A (ja) * 2005-12-13 2007-07-26 Matsushita Electric Ind Co Ltd コンデンサ

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2598508A1 (fr) * 1986-05-09 1987-11-13 Guillaume Michel Procede et appareil de determination de fin d'attaque d'une surface gravee
JP2007189188A (ja) * 2005-12-13 2007-07-26 Matsushita Electric Ind Co Ltd コンデンサ

Also Published As

Publication number Publication date
JPH0142628B2 (enrdf_load_stackoverflow) 1989-09-13

Similar Documents

Publication Publication Date Title
US4660979A (en) Method and apparatus for automatically measuring semiconductor etching process parameters
JPH0257642B2 (enrdf_load_stackoverflow)
JPS60310A (ja) 表面構造、特に、荒さの測定装置
JPS6079728A (ja) 表面処理方法
EP0226905A3 (en) A method for facilitating the alignment of a photomask with individual fields on the surfaces of a number of wafers
JPS6240701B2 (enrdf_load_stackoverflow)
FR2643988A1 (fr) Dispositif de focalisation automatique pour un appareil photographique
JPS6023858A (ja) 表面処理方法
JPS59122933A (ja) 材料識別装置
JPS59215727A (ja) 表面処理方法
JP2709959B2 (ja) イメージセンサ素子の感度補正方法
JPS59120909A (ja) レジスト塗布膜厚測定方法
JPS6131610B2 (enrdf_load_stackoverflow)
JPH0239520A (ja) レジスト膜厚の測定方法
JPS61251747A (ja) 微粒子評価用標準試料
JPS56158872A (en) Method for detecting end point of etching
JPS6365343A (ja) 感光性材料の光学特性測定装置
JPH0554621B2 (enrdf_load_stackoverflow)
JPS6076647A (ja) 塗膜乾燥度検知方法
JPS6216523A (ja) レジストパタ−ンの現像方法および現像装置
JPS6197551A (ja) 管球用拡散被膜の被着強度試験方法
JPH02115704A (ja) 粗面の液膜厚測定方法及びその測定装置
JPS58139034A (ja) ビ−ム強度測定装置
JPS61121339A (ja) エツチング終点検出方法
JPH0498109A (ja) 回転角測定装置