JPS607796A - Copper-lined laminated board for printed circuit and method of producing same - Google Patents

Copper-lined laminated board for printed circuit and method of producing same

Info

Publication number
JPS607796A
JPS607796A JP11511883A JP11511883A JPS607796A JP S607796 A JPS607796 A JP S607796A JP 11511883 A JP11511883 A JP 11511883A JP 11511883 A JP11511883 A JP 11511883A JP S607796 A JPS607796 A JP S607796A
Authority
JP
Japan
Prior art keywords
copper
inorganic filler
clad laminate
epoxy resin
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11511883A
Other languages
Japanese (ja)
Other versions
JPH0221667B2 (en
Inventor
長谷川 謹一
亮二 加藤
池谷 国夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP11511883A priority Critical patent/JPS607796A/en
Publication of JPS607796A publication Critical patent/JPS607796A/en
Publication of JPH0221667B2 publication Critical patent/JPH0221667B2/ja
Granted legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は無機質充填剤を大量(=含有したエポキシ樹脂
含浸プリプレグを用いてなる印刷回路用銅張積層板及び
その製造方法(二関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a copper-clad laminate for printed circuits using an epoxy resin-impregnated prepreg containing a large amount of an inorganic filler, and a method for manufacturing the same.

近年、印刷回路用銅張積層板としてガラス不織布を中間
層基材とし、ガラス織布を表面層基材とした構成で、エ
ポキシ樹脂を含浸させ結合剤とした積層板(以下、コン
ポジット積層板と略称する)が多量(二値用されるよう
(二なった。 −ガラス織布基材のみにエポキシ樹脂を
含浸させた積層板は機械的強度、寸法安定性、耐湿性、
耐熱性(=優れ、スルーホールメッキの信頼性が高いの
で電子計算機、通信機、電子交換機等の産業用電子機器
(二多く使用されている。しかし、基材(ニガラス織布
のみを使用するので、印刷回路板の加工工程の一つであ
る孔あけ工程では打抜加工が不可能であり、ドリル加工
されているのが実状である。
In recent years, laminates (hereinafter referred to as composite laminates) have been developed as copper-clad laminates for printed circuits, which have a structure in which glass nonwoven fabric is used as an intermediate layer base material and glass woven fabric is used as a surface layer base material, and epoxy resin is impregnated and used as a binder. (abbreviation)) is used for binary purposes (2-valued) - Laminated sheets made by impregnating only the woven glass fabric base material with epoxy resin have excellent mechanical strength, dimensional stability, moisture resistance,
Because of its heat resistance (= excellent) and high reliability of through-hole plating, it is widely used in industrial electronic equipment such as electronic computers, communications equipment, and electronic exchanges. Therefore, punching is not possible in the drilling process, which is one of the processing steps for printed circuit boards, and the actual situation is that drilling is performed.

一方、コンポジット積層板はガラス織布基材の積層板よ
り経済的(二安価で且つ、打抜き孔あけ加工が可能な点
で優れており、加工性の良いhラタ基材積層板として注
目をあびたが、スルーホールメッキの信頼性がガラス織
布基材積層板より低いと評価されていた。その理由とし
て、ガラス繊布基材エポキシ積層板の構成は有機物であ
るエポキシ樹脂と無機物であるガラス織布の重量比率が
約40 : 60である。この場合、エポキシ樹脂が主
(二番種電気性能を優れたものC二し、ガラス織布が曲
げ強度、寸法安定性などの機械的性能を良好にしている
と考えられる。
On the other hand, composite laminates are superior to laminates based on woven glass fabric because they are more economical (lower cost) and can be punched and punched, and are attracting attention as laminates based on H-rata substrates with good processability. However, the reliability of through-hole plating was evaluated to be lower than that of glass woven fabric base laminates.The reason for this is that the composition of glass fiber base epoxy laminates is a combination of an organic epoxy resin and an inorganic glass fabric. The weight ratio of the cloth is approximately 40:60.In this case, epoxy resin is the main material (C2, which has excellent electrical performance), and glass woven cloth has good mechanical performance such as bending strength and dimensional stability. It is thought that the

ところで、一般のコンポジット積層板は機械的性能(=
寄与する無機基材、即ちガラス織布とガラス不織布の合
計量がガラス織布積層板より少ない。
By the way, general composite laminates have poor mechanical performance (=
The total amount of contributing inorganic substrates, ie glass woven fabric and glass non-woven fabric, is less than that of the glass woven laminate.

有機物と無機物の比率が約60 : 40でありガラス
織布積層板と比率が逆転しているため寸法安定性やスル
ーポールメッキの信頼性が低いと評価されていた。
The ratio of organic matter to inorganic matter is about 60:40, which is the opposite of that of the glass woven fabric laminate, so it was evaluated that the dimensional stability and reliability of through-pole plating were low.

本発明の発明者等はコンポジット積層板の優れた特徴を
活かしながら、これらの欠点を改良すべく検討し、一般
のコンポジット積層板の構成にさら(二無機充填剤を大
量(二配合することにより単一組成では得られない特徴
ある新規コンポジット積層板を得た。
The inventors of the present invention have studied to improve these drawbacks while taking advantage of the excellent features of composite laminates, and have added a large amount of inorganic fillers to the structure of general composite laminates. We obtained a new composite laminate with characteristics that cannot be obtained with a single composition.

本発明のコンポジット積層板(:おいては、エポキシ樹
脂(=無機充填剤を大iC二配合し、コンポジット積層
板の無機物の比率を高めること(二より、スルーホール
メッキの信頼性等をガラス織布積層板と同等又はそれ以
上にまで向上させることができた。
In the composite laminate of the present invention, the epoxy resin (=inorganic filler is blended with large iC2 to increase the ratio of inorganic matter in the composite laminate (2), the reliability of through-hole plating, etc. We were able to improve the performance to the same level or even higher than that of cloth laminates.

本発明はコンポジット積層板(:、おいて、中間層中(
=無機充填剤中中間層のエポキシ樹脂100部(重量部
、以下同じ)(二対し100〜200部炉含まれている
ことを特徴とするものである。
The present invention is a composite laminate (:, in the middle layer (
= 100 parts (parts by weight, the same applies hereinafter) of the epoxy resin of the intermediate layer in the inorganic filler (100 to 200 parts per two furnaces).

本発明(=用いられる無機充填剤として、クレータルク
、マイカ、シリカ粉末、アlレミナ、水酸化アルミニウ
ム、ガラス粉末、チタンホワイト、ワラヌトナイト、三
酸化アンチモン等が用いられる。
The present invention (=Inorganic fillers used include clay talc, mica, silica powder, alumina, aluminum hydroxide, glass powder, titanium white, wallanutonite, antimony trioxide, etc.).

好ましい無機充填剤として、シリカ及び/又はアルミナ
、と、水酸化アルミニウムの混合粉末が用(Xられる。
As a preferable inorganic filler, a mixed powder of silica and/or alumina and aluminum hydroxide is used.

シリカ、アルミナは積層板の耐熱性向上(=効果があり
、水酸化アルミニウムは耐燃性向上ベニ有効である。
Silica and alumina are effective in improving the heat resistance of laminates, and aluminum hydroxide is effective in improving flame resistance.

無機充填剤がエポキシ樹脂中でいわゆるままこ(=なら
ないで均一に分散するため(=は、充填剤の平均粒径゛
が5〜10μであり、最大粒径が40μ以下であること
が好ましい。粒径が40μより太きl、s場合(二は無
機充填剤含有エポキシ樹脂をガラス不織布に含浸させた
時に不織布く=よる濾過作用のため積層板のガラス不織
布中で無機充填剤の分布が不均一;二なる。一方、無機
充填剤の粒子の多くが粒径5μより小さい場合(=は無
機充填剤の微粉末が固まりままこの状態):なりやすく
、やはり無機充填剤の分布が不均一を二なる。
In order for the inorganic filler to be uniformly dispersed in the epoxy resin without forming a so-called lump, it is preferable that the filler has an average particle size of 5 to 10 μm and a maximum particle size of 40 μm or less. When the particle size is larger than 40μ (2) When the glass nonwoven fabric is impregnated with the inorganic filler-containing epoxy resin, the inorganic filler is unevenly distributed in the glass nonwoven fabric of the laminate due to the filtration effect of the nonwoven fabric. Uniform: Two. On the other hand, if most of the particles of the inorganic filler are smaller than 5μ in particle size (= is this state where the fine powder of the inorganic filler remains solidified): This is likely to occur, and the distribution of the inorganic filler is also uneven. Two.

次薯二超微粒子シリカを無機充填剤の中(二全体量の2
〜10%配合すること(二よりエポキシ樹脂ワニス中の
無機充填剤の沈降を防止し、さら(=ガラス不織布に含
浸させた時(=無機充填剤の分布を均一にするのに大き
な効果がある。
Next, add two ultrafine silica particles to the inorganic filler (2 of the total amount).
-10% (2) Prevents the sedimentation of the inorganic filler in the epoxy resin varnish, and (= When impregnated into glass nonwoven fabric (= Great effect on making the distribution of the inorganic filler uniform) .

実施例1 エポキシ樹脂配合ワニスの組成は次の通りである。Example 1 The composition of the epoxy resin-containing varnish is as follows.

(1)臭素化エポキシ樹脂(油化ンエル製、EP−(3
)2エチル4メチルイミダゾール 0.15(4)メチ
ルセロソルブ 36 (5)アセトン 60 上記材料を混合して均一なフェスを作製した。
(1) Brominated epoxy resin (manufactured by Yuka NEL, EP-(3)
)2ethyl4methylimidazole 0.15 (4) Methyl cellosolve 36 (5) Acetone 60 The above materials were mixed to prepare a uniform face.

次(=該ワニスをガラス織布(日東紡製、郁−18KB
Z−2)!二、樹脂含有量が42〜45%(=なるよう
(二含浸乾燥し、ガラス織布プリプレグを得た。
Next (=The varnish is applied to glass woven fabric (manufactured by Nittobo, Iku-18KB)
Z-2)! 2. The resin content was 42 to 45% (2) Impregnated and dried to obtain a glass woven prepreg.

続いて前記エポキシ樹脂配合ワニス(二樹脂分100部
に対し次の配合の無機充填剤を添加し攪拌混合し無機充
填剤含有ワニスを作製した。
Subsequently, the following inorganic filler was added to 100 parts of the epoxy resin-containing varnish (two resins) and mixed with stirring to prepare an inorganic filler-containing varnish.

(1)シリカ (龍森製、クリスタライトVX−3) 
30部(2)水酸化アルミニウム(昭和軽金属製。
(1) Silica (Tatsumori, Crystallite VX-3)
30 parts (2) Aluminum hydroxide (manufactured by Showa Light Metal).

ハイシライトH−42) 7Q (3)超微粉末シリカ(ジオツギ製薬製。Hisilite H-42) 7Q (3) Ultrafine powdered silica (manufactured by Geotsugi Pharmaceutical).

カープレックス) 5 次にこの無機充填剤含有ワニスをガラス不織布(日本バ
イリーン製、BP −4075’) −二樹脂及び無力
\− 機充填剤の含有10%C二なるよう(二含浸乾燥してガ
ラス不織布プリプレグを得た。
Carplex) 5 Next, this varnish containing an inorganic filler was applied to a glass nonwoven fabric (manufactured by Nippon Vilene, BP-4075') - two resins and a non-woven fabric with a filler content of 10% C (two impregnated and dried). A nonwoven fabric prepreg was obtained.

次に前記ガラス不織布プリプレグを中間層とし、表面層
に前記のがラス織布プリプレグを配置し、さらにその上
に銅箔を重ね成形温度165℃、圧力60 K9/cr
Iで90分間積層成形して厚さ1.6闘の銅張積層板を
得た。
Next, the glass nonwoven fabric prepreg was used as an intermediate layer, the glass nonwoven fabric prepreg was placed on the surface layer, and copper foil was further layered on top of the glass nonwoven fabric prepreg at a molding temperature of 165°C and a pressure of 60K9/cr.
A copper-clad laminate having a thickness of 1.6 mm was obtained by lamination molding at I for 90 minutes.

実施例2 実施例1(=おいて、エポキシ樹脂ワニス(二添加(1
)シリカ 5部 (2)水酸化アルミニウム 95 (3)超微粉末シリカ 5 とした以外は実施例1と同様(ニして、銅張積層板を得
た。
Example 2 Example 1 (= epoxy resin varnish (2 additions (1
) 5 parts of silica (2) 95 parts of aluminum hydroxide (3) 5 parts of ultrafine powdered silica (2) A copper-clad laminate was obtained in the same manner as in Example 1, except that 5 parts of ultrafine powdered silica were used.

比較例 ガラス織布プリプレグは実施例と同様にして得た。続い
て、実施例で使用したエポキシ樹脂ワニスをガラス不縁
布(二樹脂含有量が70〜75%(=なるよう含浸乾燥
しガラス不織布プリプレグを得た。
Comparative Example Glass woven prepreg was obtained in the same manner as in the example. Subsequently, a glass nonwoven fabric was impregnated with the epoxy resin varnish used in the example so that the resin content was 70 to 75% and dried to obtain a glass nonwoven fabric prepreg.

その後は実施例と同様にして厚さ1.6 xmの銅張積
層板を得た。
Thereafter, a copper-clad laminate having a thickness of 1.6 x m was obtained in the same manner as in the example.

それぞれ得られた銅張積層板の特性は第1表及び第2表
の通りである。測定方法は耐燃性、収縮率、打抜性以外
C二ついてはJIS C6481i二より行った。
The properties of the copper-clad laminates obtained are shown in Tables 1 and 2. The measurement method was based on JIS C6481i2 except for flame resistance, shrinkage rate, and punchability.

第 1 表 −般 特 外 注(1) 初期寸法をり。とじ、銅箔なエツチングC二
より除去したのち、150℃30分間加熱処理したのち
の寸法をLlとし、次の式で算出し第 2 表 スルー
ホールメッキの密着性スルーホールメッキの密着性の測
定方法は次の通りである(第1図参照)。銅張積層板(
1)(ニトリル加工(:より所定の径のスルーホール(
2)を設け、スルーホールメッキ(3)を行った後、表
面の銅箔を除去する。次にQ、5 mnφの洋白線(4
)をスルーホール内でハンダ(5)で固定する。この洋
白線(4)を入方向(=引抜き、その引抜き強度を測定
する。
Table 1 - General Special Outsourcing (1) Initial dimensions. After removing the copper foil etching from C2 and heat-treating it at 150°C for 30 minutes, the dimensions are Ll and calculated using the following formula. The method is as follows (see Figure 1). Copper-clad laminate (
1) (Nitrile processing (: Through-hole of a specified diameter (
2) is provided, and after performing through-hole plating (3), the copper foil on the surface is removed. Next, Q, nickel silver wire of 5 mnφ (4
) in the through hole with solder (5). This nickel silver wire (4) is pulled out in the input direction (=pulled out) and its pulling strength is measured.

以上のよう(=、本発明は無機充填剤を大量(二含有し
た構成になっているので、従来品(比較例)(=比べて
スルーホールメッキの密着性がすぐれ、スルーホールメ
ッキの信頼性が向上することがわ
As mentioned above (=, since the present invention has a structure containing a large amount of inorganic filler, the adhesion of through-hole plating is excellent compared to the conventional product (comparative example) (=), and the reliability of through-hole plating is improved. can improve

【図面の簡単な説明】[Brief explanation of drawings]

第1図はスルーホールメッキの密着性の測定方法を示す
断面図である。 特許出願−人 住友ベークライト株式会社第1図
FIG. 1 is a sectional view showing a method for measuring adhesion of through-hole plating. Patent Application - Person Sumitomo Bakelite Co., Ltd. Figure 1

Claims (5)

【特許請求の範囲】[Claims] (1)表面層はエポキシ樹脂ガラス織布からなり、中間
層はエポキシ樹脂ガラス不織布からなり、表面層表面の
一方又は両方に銅箔が積層され、これらが加熱加圧(二
より一体化されてなる銅張積層板(−おいて、中間層(
=は中間層のエポキシ樹脂100重量部に対して無機充
填剤100〜200重量部が含まれていることを特徴と
する印刷回路用銅張積層板。
(1) The surface layer is made of epoxy resin glass woven fabric, the middle layer is made of epoxy resin glass nonwoven fabric, copper foil is laminated on one or both of the surfaces of the surface layer, and these are heated and pressed (two pieces are integrated into one). Copper-clad laminate (-, intermediate layer (
= is a copper-clad laminate for printed circuits, characterized in that 100 to 200 parts by weight of an inorganic filler is contained in 100 parts by weight of epoxy resin of the intermediate layer.
(2)無機充填剤がシリカ及び/又はアルミナと水酸化
アルミニウムの混合粉末からなることを特徴とする特許
請求の範囲第1項記載の印刷回路用銅張積層板。
(2) The copper-clad laminate for printed circuits according to claim 1, wherein the inorganic filler is composed of a mixed powder of silica and/or alumina and aluminum hydroxide.
(3)無機充填剤の平均粒径が5〜10μであり最大粒
径が40μ以下であることを特徴とする第1項記載の印
刷回路用銅張積層板。
(3) The copper-clad laminate for printed circuits according to item 1, wherein the inorganic filler has an average particle size of 5 to 10 μm and a maximum particle size of 40 μm or less.
(4)無機充填剤の中のシリカとして平均粒径が10〜
40ff!μの超微粒子シリカが配合されていることを
特徴とする第1項記載の印刷回路用銅張積層板。
(4) As silica in the inorganic filler, the average particle size is 10~
40ff! 2. The copper-clad laminate for printed circuits according to item 1, characterized in that ultrafine silica particles of μ are blended.
(5)エポキシ樹脂100重量部(二対し無機充填剤1
00〜200重量部を配合してなるワニスをガラス不織
布【二含浸乾燥させて得られたプリプレグの一枚又は複
数枚を中間層とし、表面層(=エポキシ樹脂がラス織布
プリプレグを用い、その表面の一方又は両方(二銅箔を
配置し加熱加圧成形することを特徴とする印刷回路用銅
張積層板の製造方法。
(5) 100 parts by weight of epoxy resin (2 parts by weight of inorganic filler
A varnish containing 00 to 200 parts by weight of glass non-woven fabric [2] One or more sheets of prepreg obtained by impregnation and drying is used as an intermediate layer, A method for producing a copper-clad laminate for printed circuits, which comprises disposing a copper foil on one or both surfaces and forming the copper-clad laminate under heat and pressure.
JP11511883A 1983-06-28 1983-06-28 Copper-lined laminated board for printed circuit and method of producing same Granted JPS607796A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11511883A JPS607796A (en) 1983-06-28 1983-06-28 Copper-lined laminated board for printed circuit and method of producing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11511883A JPS607796A (en) 1983-06-28 1983-06-28 Copper-lined laminated board for printed circuit and method of producing same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP4097515A Division JP2568347B2 (en) 1992-03-06 1992-03-06 Copper clad laminate for printed circuit

Publications (2)

Publication Number Publication Date
JPS607796A true JPS607796A (en) 1985-01-16
JPH0221667B2 JPH0221667B2 (en) 1990-05-15

Family

ID=14654690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11511883A Granted JPS607796A (en) 1983-06-28 1983-06-28 Copper-lined laminated board for printed circuit and method of producing same

Country Status (1)

Country Link
JP (1) JPS607796A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61274931A (en) * 1985-05-31 1986-12-05 東芝ケミカル株式会社 Copper lined laminated board
JPS61284989A (en) * 1985-06-11 1986-12-15 住友ベークライト株式会社 Laminate board for printed circuit
JPS6260877A (en) * 1985-09-11 1987-03-17 Toshiba Chem Corp Laminated sheet for chemical plating
JPS62156953U (en) * 1986-03-27 1987-10-05
JPS62270333A (en) * 1986-05-20 1987-11-24 東芝ケミカル株式会社 Copper-lined laminated board
JPS62292428A (en) * 1986-06-13 1987-12-19 東芝ケミカル株式会社 Copper-lined laminated board
JPH0192237A (en) * 1987-10-02 1989-04-11 Toshiba Chem Corp Production of copper-clad laminated sheet
JPH0197634A (en) * 1987-10-09 1989-04-17 Kanegafuchi Chem Ind Co Ltd Continuous manufacture of laminated plate for glass fiber reinforcing electricity
JPH02286238A (en) * 1989-04-27 1990-11-26 Sumitomo Bakelite Co Ltd Laminated board for printed circuit
JPH04290744A (en) * 1991-03-20 1992-10-15 Shin Kobe Electric Mach Co Ltd Composite laminated sheet
US5177399A (en) * 1988-06-27 1993-01-05 Kabushiki Kaisha Toshiba Color cathode ray tube apparatus
US5206559A (en) * 1989-08-04 1993-04-27 Kabushiki Kaisha Toshiba Cathode ray tube which improves deflection aberration
JP2002353377A (en) * 2001-05-28 2002-12-06 Matsushita Electric Works Ltd Semiconductor device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136377A (en) * 1974-04-17 1975-10-29
JPS5236904A (en) * 1975-09-19 1977-03-22 Hitachi Ltd Signal transmission circuit
JPS5530315A (en) * 1978-08-22 1980-03-04 Ishikawajima Harima Heavy Ind Co Ltd Distributing and generating device for pressure fluid to reforming tool
JPS5540424A (en) * 1978-09-14 1980-03-21 Canon Inc Processor camera

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136377A (en) * 1974-04-17 1975-10-29
JPS5236904A (en) * 1975-09-19 1977-03-22 Hitachi Ltd Signal transmission circuit
JPS5530315A (en) * 1978-08-22 1980-03-04 Ishikawajima Harima Heavy Ind Co Ltd Distributing and generating device for pressure fluid to reforming tool
JPS5540424A (en) * 1978-09-14 1980-03-21 Canon Inc Processor camera

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61274931A (en) * 1985-05-31 1986-12-05 東芝ケミカル株式会社 Copper lined laminated board
JPS61284989A (en) * 1985-06-11 1986-12-15 住友ベークライト株式会社 Laminate board for printed circuit
JPH0571157B2 (en) * 1985-06-11 1993-10-06 Sumitomo Bakelite Co
JPS6260877A (en) * 1985-09-11 1987-03-17 Toshiba Chem Corp Laminated sheet for chemical plating
JPS62156953U (en) * 1986-03-27 1987-10-05
JPS62270333A (en) * 1986-05-20 1987-11-24 東芝ケミカル株式会社 Copper-lined laminated board
JPS62292428A (en) * 1986-06-13 1987-12-19 東芝ケミカル株式会社 Copper-lined laminated board
JPH0192237A (en) * 1987-10-02 1989-04-11 Toshiba Chem Corp Production of copper-clad laminated sheet
JPH0511759B2 (en) * 1987-10-09 1993-02-16 Kanegafuchi Chemical Ind
JPH0197634A (en) * 1987-10-09 1989-04-17 Kanegafuchi Chem Ind Co Ltd Continuous manufacture of laminated plate for glass fiber reinforcing electricity
US5177399A (en) * 1988-06-27 1993-01-05 Kabushiki Kaisha Toshiba Color cathode ray tube apparatus
JPH02286238A (en) * 1989-04-27 1990-11-26 Sumitomo Bakelite Co Ltd Laminated board for printed circuit
US5206559A (en) * 1989-08-04 1993-04-27 Kabushiki Kaisha Toshiba Cathode ray tube which improves deflection aberration
JPH04290744A (en) * 1991-03-20 1992-10-15 Shin Kobe Electric Mach Co Ltd Composite laminated sheet
JP2002353377A (en) * 2001-05-28 2002-12-06 Matsushita Electric Works Ltd Semiconductor device
JP4715035B2 (en) * 2001-05-28 2011-07-06 パナソニック電工株式会社 Semiconductor device

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