JPS6074527A - マスク装着方法及び装置 - Google Patents

マスク装着方法及び装置

Info

Publication number
JPS6074527A
JPS6074527A JP58180686A JP18068683A JPS6074527A JP S6074527 A JPS6074527 A JP S6074527A JP 58180686 A JP58180686 A JP 58180686A JP 18068683 A JP18068683 A JP 18068683A JP S6074527 A JPS6074527 A JP S6074527A
Authority
JP
Japan
Prior art keywords
mask
chuck
wafer
alignment
mounting device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58180686A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6353689B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Motoya Taniguchi
素也 谷口
Mitsuyoshi Koizumi
小泉　光義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58180686A priority Critical patent/JPS6074527A/ja
Publication of JPS6074527A publication Critical patent/JPS6074527A/ja
Publication of JPS6353689B2 publication Critical patent/JPS6353689B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58180686A 1983-09-30 1983-09-30 マスク装着方法及び装置 Granted JPS6074527A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58180686A JPS6074527A (ja) 1983-09-30 1983-09-30 マスク装着方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58180686A JPS6074527A (ja) 1983-09-30 1983-09-30 マスク装着方法及び装置

Publications (2)

Publication Number Publication Date
JPS6074527A true JPS6074527A (ja) 1985-04-26
JPS6353689B2 JPS6353689B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-10-25

Family

ID=16087530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58180686A Granted JPS6074527A (ja) 1983-09-30 1983-09-30 マスク装着方法及び装置

Country Status (1)

Country Link
JP (1) JPS6074527A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62237727A (ja) * 1986-04-09 1987-10-17 Hitachi Ltd Ｘ線露光装置およびその方法
JPH02100311A (ja) * 1988-10-06 1990-04-12 Canon Inc Ｓｏｒ−ｘ線露光装置
JP2007316561A (ja) * 2006-04-24 2007-12-06 Nsk Ltd 露光装置及び露光方法
JP2008304835A (ja) * 2007-06-11 2008-12-18 Nsk Ltd 露光装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62237727A (ja) * 1986-04-09 1987-10-17 Hitachi Ltd Ｘ線露光装置およびその方法
JPH02100311A (ja) * 1988-10-06 1990-04-12 Canon Inc Ｓｏｒ−ｘ線露光装置
JP2007316561A (ja) * 2006-04-24 2007-12-06 Nsk Ltd 露光装置及び露光方法
JP2008304835A (ja) * 2007-06-11 2008-12-18 Nsk Ltd 露光装置

Also Published As

Publication number Publication date
JPS6353689B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-10-25

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