JPS6068538A - X線発生装置 - Google Patents
X線発生装置Info
- Publication number
- JPS6068538A JPS6068538A JP58175517A JP17551783A JPS6068538A JP S6068538 A JPS6068538 A JP S6068538A JP 58175517 A JP58175517 A JP 58175517A JP 17551783 A JP17551783 A JP 17551783A JP S6068538 A JPS6068538 A JP S6068538A
- Authority
- JP
- Japan
- Prior art keywords
- electromagnet
- focusing
- lateral
- variable
- vertical direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005469 synchrotron radiation Effects 0.000 claims abstract description 19
- 230000003287 optical effect Effects 0.000 abstract description 7
- 230000004907 flux Effects 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 10
- 241000257465 Echinoidea Species 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 235000018185 Betula X alpestris Nutrition 0.000 description 1
- 235000018212 Betula X uliginosa Nutrition 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Particle Accelerators (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58175517A JPS6068538A (ja) | 1983-09-22 | 1983-09-22 | X線発生装置 |
US06/653,588 US4631743A (en) | 1983-09-22 | 1984-09-24 | X-ray generating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58175517A JPS6068538A (ja) | 1983-09-22 | 1983-09-22 | X線発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6068538A true JPS6068538A (ja) | 1985-04-19 |
JPH0372172B2 JPH0372172B2 (enrdf_load_stackoverflow) | 1991-11-15 |
Family
ID=15997433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58175517A Granted JPS6068538A (ja) | 1983-09-22 | 1983-09-22 | X線発生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6068538A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6220316A (ja) * | 1985-07-18 | 1987-01-28 | Susumu Nanba | 半導体ウエハの露光装置 |
US5923719A (en) * | 1996-07-19 | 1999-07-13 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method using the same |
-
1983
- 1983-09-22 JP JP58175517A patent/JPS6068538A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6220316A (ja) * | 1985-07-18 | 1987-01-28 | Susumu Nanba | 半導体ウエハの露光装置 |
US5923719A (en) * | 1996-07-19 | 1999-07-13 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method using the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0372172B2 (enrdf_load_stackoverflow) | 1991-11-15 |
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