JPS6067845A - 異物検査装置 - Google Patents

異物検査装置

Info

Publication number
JPS6067845A
JPS6067845A JP58176302A JP17630283A JPS6067845A JP S6067845 A JPS6067845 A JP S6067845A JP 58176302 A JP58176302 A JP 58176302A JP 17630283 A JP17630283 A JP 17630283A JP S6067845 A JPS6067845 A JP S6067845A
Authority
JP
Japan
Prior art keywords
light
foreign object
foreign
thin film
image sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58176302A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0410582B2 (OSRAM
Inventor
Kazunori Imamura
今村　和則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58176302A priority Critical patent/JPS6067845A/ja
Publication of JPS6067845A publication Critical patent/JPS6067845A/ja
Publication of JPH0410582B2 publication Critical patent/JPH0410582B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP58176302A 1983-09-26 1983-09-26 異物検査装置 Granted JPS6067845A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58176302A JPS6067845A (ja) 1983-09-26 1983-09-26 異物検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58176302A JPS6067845A (ja) 1983-09-26 1983-09-26 異物検査装置

Publications (2)

Publication Number Publication Date
JPS6067845A true JPS6067845A (ja) 1985-04-18
JPH0410582B2 JPH0410582B2 (OSRAM) 1992-02-25

Family

ID=16011207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58176302A Granted JPS6067845A (ja) 1983-09-26 1983-09-26 異物検査装置

Country Status (1)

Country Link
JP (1) JPS6067845A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0250313A (ja) * 1988-08-12 1990-02-20 Hitachi Ltd 外観検査方法
US5343290A (en) * 1992-06-11 1994-08-30 International Business Machines Corporation Surface particle detection using heterodyne interferometer
WO2020170389A1 (ja) * 2019-02-21 2020-08-27 株式会社エフケー光学研究所 異物検査装置及び異物検査方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0250313A (ja) * 1988-08-12 1990-02-20 Hitachi Ltd 外観検査方法
US5343290A (en) * 1992-06-11 1994-08-30 International Business Machines Corporation Surface particle detection using heterodyne interferometer
WO2020170389A1 (ja) * 2019-02-21 2020-08-27 株式会社エフケー光学研究所 異物検査装置及び異物検査方法
JPWO2020170389A1 (ja) * 2019-02-21 2021-03-11 株式会社 エフケー光学研究所 異物検査装置及び異物検査方法
CN113490844A (zh) * 2019-02-21 2021-10-08 Fk光学研究所股份有限公司 异物检查装置及异物检查方法
CN113490844B (zh) * 2019-02-21 2024-08-16 Fk光学研究所股份有限公司 异物检查装置及异物检查方法

Also Published As

Publication number Publication date
JPH0410582B2 (OSRAM) 1992-02-25

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